JP4138050B2 - ポリマー組成物及びそのポリマーの製造方法 - Google Patents
ポリマー組成物及びそのポリマーの製造方法 Download PDFInfo
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- JP4138050B2 JP4138050B2 JP23381597A JP23381597A JP4138050B2 JP 4138050 B2 JP4138050 B2 JP 4138050B2 JP 23381597 A JP23381597 A JP 23381597A JP 23381597 A JP23381597 A JP 23381597A JP 4138050 B2 JP4138050 B2 JP 4138050B2
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- 239000000178 monomer Substances 0.000 claims description 76
- 125000001424 substituent group Chemical group 0.000 claims description 56
- 238000010438 heat treatment Methods 0.000 claims description 48
- 125000004185 ester group Chemical group 0.000 claims description 42
- 238000000034 method Methods 0.000 claims description 40
- -1 ester salts Chemical class 0.000 claims description 39
- 125000001033 ether group Chemical group 0.000 claims description 36
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 33
- 125000000547 substituted alkyl group Chemical group 0.000 claims description 29
- 239000000758 substrate Substances 0.000 claims description 26
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- 238000004132 cross linking Methods 0.000 claims description 24
- 125000005843 halogen group Chemical group 0.000 claims description 22
- 230000005855 radiation Effects 0.000 claims description 18
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- 125000001188 haloalkyl group Chemical group 0.000 claims description 14
- 125000000524 functional group Chemical group 0.000 claims description 13
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- 230000008569 process Effects 0.000 claims description 11
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- 150000003839 salts Chemical class 0.000 claims description 5
- 206010034972 Photosensitivity reaction Diseases 0.000 claims description 4
- 230000036211 photosensitivity Effects 0.000 claims description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 177
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- 239000010410 layer Substances 0.000 description 73
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- 239000000243 solution Substances 0.000 description 62
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- 238000006243 chemical reaction Methods 0.000 description 55
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- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 28
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- 0 CC(C)c(cc1)ccc1C(c(cc1)ccc1Oc1ccc(C(C)(*)c(cc2)ccc2O*(C)C)cc1)=O Chemical compound CC(C)c(cc1)ccc1C(c(cc1)ccc1Oc1ccc(C(C)(*)c(cc2)ccc2O*(C)C)cc1)=O 0.000 description 18
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- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 15
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- XYFCBTPGUUZFHI-UHFFFAOYSA-N phosphine group Chemical group P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 15
- 125000005496 phosphonium group Chemical group 0.000 description 15
- 125000001174 sulfone group Chemical group 0.000 description 15
- 125000002813 thiocarbonyl group Chemical group *C(*)=S 0.000 description 15
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- 229910000027 potassium carbonate Inorganic materials 0.000 description 14
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- 125000003375 sulfoxide group Chemical group 0.000 description 14
- 239000002861 polymer material Substances 0.000 description 13
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 12
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- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 12
- 125000006165 cyclic alkyl group Chemical group 0.000 description 12
- 238000003786 synthesis reaction Methods 0.000 description 12
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 11
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- RNAMYOYQYRYFQY-UHFFFAOYSA-N 2-(4,4-difluoropiperidin-1-yl)-6-methoxy-n-(1-propan-2-ylpiperidin-4-yl)-7-(3-pyrrolidin-1-ylpropoxy)quinazolin-4-amine Chemical compound N1=C(N2CCC(F)(F)CC2)N=C2C=C(OCCCN3CCCC3)C(OC)=CC2=C1NC1CCN(C(C)C)CC1 RNAMYOYQYRYFQY-UHFFFAOYSA-N 0.000 description 9
- OKISUZLXOYGIFP-UHFFFAOYSA-N 4,4'-dichlorobenzophenone Chemical compound C1=CC(Cl)=CC=C1C(=O)C1=CC=C(Cl)C=C1 OKISUZLXOYGIFP-UHFFFAOYSA-N 0.000 description 9
- 125000003172 aldehyde group Chemical group 0.000 description 9
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- 125000004093 cyano group Chemical group *C#N 0.000 description 9
- 125000000468 ketone group Chemical group 0.000 description 9
- 125000002560 nitrile group Chemical group 0.000 description 9
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 9
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 9
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- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 8
- 239000004593 Epoxy Substances 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 8
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 8
- 229910052799 carbon Inorganic materials 0.000 description 8
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 8
- NKDDWNXOKDWJAK-UHFFFAOYSA-N dimethoxymethane Chemical compound COCOC NKDDWNXOKDWJAK-UHFFFAOYSA-N 0.000 description 8
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- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 8
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 7
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- 238000004377 microelectronic Methods 0.000 description 7
- 125000004417 unsaturated alkyl group Chemical group 0.000 description 7
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- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 6
- 239000002253 acid Substances 0.000 description 6
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 6
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- 125000004429 atom Chemical group 0.000 description 6
- 239000012156 elution solvent Substances 0.000 description 6
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- 230000035484 reaction time Effects 0.000 description 6
- 125000005415 substituted alkoxy group Chemical group 0.000 description 6
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 6
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 description 6
- 239000004793 Polystyrene Substances 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 5
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- 238000012512 characterization method Methods 0.000 description 5
- 239000000460 chlorine Substances 0.000 description 5
- 125000001309 chloro group Chemical group Cl* 0.000 description 5
- 125000004122 cyclic group Chemical group 0.000 description 5
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- 229910052736 halogen Inorganic materials 0.000 description 5
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- 150000002500 ions Chemical class 0.000 description 5
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- VLTYTTRXESKBKI-UHFFFAOYSA-N (2,4-dichlorophenyl)-phenylmethanone Chemical compound ClC1=CC(Cl)=CC=C1C(=O)C1=CC=CC=C1 VLTYTTRXESKBKI-UHFFFAOYSA-N 0.000 description 4
- PQUXFUBNSYCQAL-UHFFFAOYSA-N 1-(2,3-difluorophenyl)ethanone Chemical compound CC(=O)C1=CC=CC(F)=C1F PQUXFUBNSYCQAL-UHFFFAOYSA-N 0.000 description 4
- LSQARZALBDFYQZ-UHFFFAOYSA-N 4,4'-difluorobenzophenone Chemical compound C1=CC(F)=CC=C1C(=O)C1=CC=C(F)C=C1 LSQARZALBDFYQZ-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
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- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 4
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 4
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
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- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 4
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 4
- 229920003060 Poly(vinyl benzyl chloride) Polymers 0.000 description 4
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 4
- 229910052581 Si3N4 Inorganic materials 0.000 description 4
- 229910021627 Tin(IV) chloride Inorganic materials 0.000 description 4
- 229960000583 acetic acid Drugs 0.000 description 4
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 4
- WETWJCDKMRHUPV-UHFFFAOYSA-N acetyl chloride Chemical compound CC(Cl)=O WETWJCDKMRHUPV-UHFFFAOYSA-N 0.000 description 4
- 239000012346 acetyl chloride Substances 0.000 description 4
- 125000003545 alkoxy group Chemical group 0.000 description 4
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- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 4
- 229910052794 bromium Inorganic materials 0.000 description 4
- 239000003054 catalyst Substances 0.000 description 4
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- 238000002844 melting Methods 0.000 description 4
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- 239000012528 membrane Substances 0.000 description 4
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 4
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- 239000000376 reactant Substances 0.000 description 4
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- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 4
- 239000011734 sodium Substances 0.000 description 4
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- SLBOQBILGNEPEB-UHFFFAOYSA-N 1-chloroprop-2-enylbenzene Chemical compound C=CC(Cl)C1=CC=CC=C1 SLBOQBILGNEPEB-UHFFFAOYSA-N 0.000 description 3
- RSINFFVFOTUDEC-UHFFFAOYSA-N 2,5-dichlorobenzoyl chloride Chemical compound ClC(=O)C1=CC(Cl)=CC=C1Cl RSINFFVFOTUDEC-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 3
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- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
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- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 239000011591 potassium Substances 0.000 description 3
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- 239000004208 shellac Substances 0.000 description 3
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- ZLGIYFNHBLSMPS-ATJNOEHPSA-N shellac Chemical compound OCCCCCC(O)C(O)CCCCCCCC(O)=O.C1C23[C@H](C(O)=O)CCC2[C@](C)(CO)[C@@H]1C(C(O)=O)=C[C@@H]3O ZLGIYFNHBLSMPS-ATJNOEHPSA-N 0.000 description 3
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- 235000017557 sodium bicarbonate Nutrition 0.000 description 3
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- FAVKIHMGRWRACA-UHFFFAOYSA-N (2,5-dichlorophenyl)-phenylmethanone Chemical compound ClC1=CC=C(Cl)C(C(=O)C=2C=CC=CC=2)=C1 FAVKIHMGRWRACA-UHFFFAOYSA-N 0.000 description 2
- 238000005160 1H NMR spectroscopy Methods 0.000 description 2
- CEOCVKWBUWKBKA-UHFFFAOYSA-N 2,4-dichlorobenzoyl chloride Chemical compound ClC(=O)C1=CC=C(Cl)C=C1Cl CEOCVKWBUWKBKA-UHFFFAOYSA-N 0.000 description 2
- YXBUUDRNUBLZLP-UHFFFAOYSA-N 2-(4-hydroxyphenyl)fluoren-1-one Chemical compound C1=CC(O)=CC=C1C1=CC=C2C3=CC=CC=C3C=C2C1=O YXBUUDRNUBLZLP-UHFFFAOYSA-N 0.000 description 2
- 235000005336 Allium ursinum Nutrition 0.000 description 2
- 244000003363 Allium ursinum Species 0.000 description 2
- 229930185605 Bisphenol Natural products 0.000 description 2
- XJUZRXYOEPSWMB-UHFFFAOYSA-N Chloromethyl methyl ether Chemical compound COCCl XJUZRXYOEPSWMB-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
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Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
- B41J2/1628—Manufacturing processes etching dry etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
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- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
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-
- B—PERFORMING OPERATIONS; TRANSPORTING
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- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
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- B41J2/16—Production of nozzles
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
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- B41J2/1626—Manufacturing processes etching
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-
- B—PERFORMING OPERATIONS; TRANSPORTING
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- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
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- B41J2/16—Production of nozzles
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-
- B—PERFORMING OPERATIONS; TRANSPORTING
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- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
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-
- B—PERFORMING OPERATIONS; TRANSPORTING
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- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
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- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1642—Manufacturing processes thin film formation thin film formation by CVD [chemical vapor deposition]
-
- B—PERFORMING OPERATIONS; TRANSPORTING
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- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
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- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1645—Manufacturing processes thin film formation thin film formation by spincoating
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/34—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives
- C08G65/48—Polymers modified by chemical after-treatment
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49401—Fluid pattern dispersing device making, e.g., ink jet
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31551—Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31786—Of polyester [e.g., alkyd, etc.]
- Y10T428/31794—Of cross-linked polyester
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Polyethers (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US08/705,479 US5761809A (en) | 1996-08-29 | 1996-08-29 | Process for substituting haloalkylated polymers with unsaturated ester, ether, and alkylcarboxymethylene groups |
| US705479 | 1996-08-29 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH1090896A JPH1090896A (ja) | 1998-04-10 |
| JPH1090896A5 JPH1090896A5 (OSRAM) | 2005-06-16 |
| JP4138050B2 true JP4138050B2 (ja) | 2008-08-20 |
Family
ID=24833647
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP23381597A Expired - Fee Related JP4138050B2 (ja) | 1996-08-29 | 1997-08-29 | ポリマー組成物及びそのポリマーの製造方法 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US5761809A (OSRAM) |
| EP (1) | EP0827026A3 (OSRAM) |
| JP (1) | JP4138050B2 (OSRAM) |
Families Citing this family (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6124372A (en) * | 1996-08-29 | 2000-09-26 | Xerox Corporation | High performance polymer compositions having photosensitivity-imparting substituents and thermal sensitivity-imparting substituents |
| US5863963A (en) * | 1996-08-29 | 1999-01-26 | Xerox Corporation | Halomethylated high performance curable polymers |
| US6007877A (en) * | 1996-08-29 | 1999-12-28 | Xerox Corporation | Aqueous developable high performance photosensitive curable aromatic ether polymers |
| US5994425A (en) * | 1996-08-29 | 1999-11-30 | Xerox Corporation | Curable compositions containing photosensitive high performance aromatic ether polymers |
| US5958995A (en) * | 1996-08-29 | 1999-09-28 | Xerox Corporation | Blends containing photosensitive high performance aromatic ether curable polymers |
| US5889077A (en) * | 1996-08-29 | 1999-03-30 | Xerox Corporation | Process for direct substitution of high performance polymers with unsaturated ester groups |
| NL1004016C2 (nl) * | 1996-09-12 | 1998-03-13 | Oce Tech Bv | Inktstraal-drukkop. |
| US5907001A (en) * | 1997-09-24 | 1999-05-25 | Xerox Corporation | Process for the preparation of photopatternable polymers |
| US6273985B1 (en) | 1998-06-26 | 2001-08-14 | Xerox Corporation | Bonding process |
| US6260956B1 (en) | 1998-07-23 | 2001-07-17 | Xerox Corporation | Thermal ink jet printhead and process for the preparation thereof |
| US6139920A (en) * | 1998-12-21 | 2000-10-31 | Xerox Corporation | Photoresist compositions |
| US6020119A (en) * | 1999-05-17 | 2000-02-01 | Xerox Corporation | Process for halomethylation of high performance polymers |
| US6187512B1 (en) | 1999-05-17 | 2001-02-13 | Xerox Corporation | Process for halomethylation of high performance polymers |
| US6200715B1 (en) | 1999-06-04 | 2001-03-13 | Xerox Corporation | Imaging members containing arylene ether alcohol polymers |
| US20040091645A1 (en) * | 2001-02-05 | 2004-05-13 | Heederik Peter Johannes | Topcoat compositions, substrates containing a topcoat derived therefrom, and methods of preparing the same |
| US6716956B2 (en) | 2002-01-09 | 2004-04-06 | Xerox Corporation | Process for preparing polyarylene ethers |
| US7152958B2 (en) * | 2002-11-23 | 2006-12-26 | Silverbrook Research Pty Ltd | Thermal ink jet with chemical vapor deposited nozzle plate |
| US6927273B2 (en) | 2002-12-17 | 2005-08-09 | Xerox Corporation | Process for preparing substituted polyarylene ethers |
| US7001978B2 (en) * | 2003-11-19 | 2006-02-21 | Xerox Corporation | Unsaturated ester substituted polymers with reduced halogen content |
| US7396895B2 (en) * | 2003-11-25 | 2008-07-08 | Xerox Corporation | Branched polyarylene ethers and processes for the preparation thereof |
| US7067608B2 (en) * | 2003-11-25 | 2006-06-27 | Xerox Corporation | Process for preparing branched polyarylene ethers |
| KR100660182B1 (ko) * | 2005-03-25 | 2006-12-21 | 한국화학연구원 | 아믹산 또는 이미드 측쇄기로 가교된 방향족 폴리에테르계수지 |
| US20080159114A1 (en) | 2007-01-02 | 2008-07-03 | Dipietro Richard Anthony | High density data storage medium, method and device |
| US7558186B2 (en) * | 2007-01-02 | 2009-07-07 | International Business Machines Corporation | High density data storage medium, method and device |
| US8889824B2 (en) | 2010-07-16 | 2014-11-18 | X-Flow Bv | Grafted poly(arylsulfone) and a process for grafting a poly(arylsulfone) |
| US9027247B2 (en) * | 2012-10-22 | 2015-05-12 | Xerox Corporation | Liquid adhesive application by contact printing |
| US9801277B1 (en) | 2013-08-27 | 2017-10-24 | Flextronics Ap, Llc | Bellows interconnect |
| US10466118B1 (en) | 2015-08-28 | 2019-11-05 | Multek Technologies, Ltd. | Stretchable flexible durable pressure sensor |
| US10881001B2 (en) * | 2017-03-02 | 2020-12-29 | Flex Ltd. | Micro conductive thread interconnect component to make an interconnect between conductive threads in fabrics to PCB, FPC, and rigid-flex circuits |
| US10426029B1 (en) | 2018-01-18 | 2019-09-24 | Flex Ltd. | Micro-pad array to thread flexible attachment |
| US10687421B1 (en) | 2018-04-04 | 2020-06-16 | Flex Ltd. | Fabric with woven wire braid |
| US10575381B1 (en) | 2018-06-01 | 2020-02-25 | Flex Ltd. | Electroluminescent display on smart textile and interconnect methods |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2125968A (en) * | 1935-08-21 | 1938-08-09 | Ernst T Theimer | Manufacture of aromatic alcohols |
| US3367914A (en) * | 1964-06-29 | 1968-02-06 | Dow Chemical Co | Poly(aminomethyl)diphenyl ether-aldehyde thermoset resin and process of making same |
| US3914194A (en) * | 1973-04-02 | 1975-10-21 | Dow Chemical Co | Unsaturated formaldehyde copolymer resins derived from diaryl oxides, sulfides, dibenzofuran or dibenzothiophene |
| US4110279A (en) * | 1974-02-25 | 1978-08-29 | The Dow Chemical Company | High temperature polymers from methoxy functional ether aromatic monomers |
| JPS6026130B2 (ja) * | 1976-12-24 | 1985-06-21 | 株式会社クラレ | 新規重合体の製造法 |
| JPS5650928A (en) * | 1979-10-03 | 1981-05-08 | Teijin Ltd | Polysulfone having (meth)acrylate group on its side chain and its manufacture |
| US4435496A (en) * | 1982-09-22 | 1984-03-06 | American Hoechst Corporation | Photopolymer cleavage imaging system |
| DE3563057D1 (en) * | 1984-03-07 | 1988-07-07 | Ciba Geigy Ag | Crosslinkable linear polyether resins |
| DE3500180A1 (de) * | 1985-01-04 | 1986-07-10 | Ernst Prof. Dr. 7400 Tübingen Bayer | Pfropfcopolymerisate aus vernetzten polymeren und polyoxyethylen, verfahren zu ihrer herstellung und ihre verwendung |
| US4601777A (en) * | 1985-04-03 | 1986-07-22 | Xerox Corporation | Thermal ink jet printhead and process therefor |
| US4623558A (en) * | 1985-05-29 | 1986-11-18 | W. R. Grace & Co. | Reactive plastisol dispersion |
| JPH0311350A (ja) * | 1989-06-09 | 1991-01-18 | Tosoh Corp | ネガ型感光性塗膜材 |
| JPH04294148A (ja) * | 1991-03-25 | 1992-10-19 | Canon Inc | 液体噴射記録ヘッド |
| EP0574791B1 (de) * | 1992-06-13 | 1999-12-22 | Aventis Research & Technologies GmbH & Co. KG | Polymerelektrolyt-Membran und Verfahren zu ihrer Herstellung |
| US5268444A (en) * | 1993-04-02 | 1993-12-07 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Phenylethynyl-terminated poly(arylene ethers) |
| US5607824A (en) * | 1994-07-27 | 1997-03-04 | International Business Machines Corporation | Antireflective coating for microlithography |
-
1996
- 1996-08-29 US US08/705,479 patent/US5761809A/en not_active Expired - Fee Related
-
1997
- 1997-08-15 EP EP97306196A patent/EP0827026A3/en not_active Withdrawn
- 1997-08-29 JP JP23381597A patent/JP4138050B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| EP0827026A2 (en) | 1998-03-04 |
| JPH1090896A (ja) | 1998-04-10 |
| US5761809A (en) | 1998-06-09 |
| EP0827026A3 (en) | 1998-06-17 |
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