JP4073255B2 - ポジ型レジスト組成物 - Google Patents

ポジ型レジスト組成物 Download PDF

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Publication number
JP4073255B2
JP4073255B2 JP2002161617A JP2002161617A JP4073255B2 JP 4073255 B2 JP4073255 B2 JP 4073255B2 JP 2002161617 A JP2002161617 A JP 2002161617A JP 2002161617 A JP2002161617 A JP 2002161617A JP 4073255 B2 JP4073255 B2 JP 4073255B2
Authority
JP
Japan
Prior art keywords
group
general formula
atom
acid
resist composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2002161617A
Other languages
English (en)
Japanese (ja)
Other versions
JP2004012510A (ja
JP2004012510A5 (enExample
Inventor
知也 佐々木
一良 水谷
慎一 漢那
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP2002161617A priority Critical patent/JP4073255B2/ja
Priority to US10/448,041 priority patent/US6939662B2/en
Priority to KR1020030034881A priority patent/KR100955454B1/ko
Priority to EP03012142A priority patent/EP1367440B1/en
Priority to AT03012142T priority patent/ATE525676T1/de
Priority to EP10188666A priority patent/EP2278398A3/en
Priority to EP10188668A priority patent/EP2278400A3/en
Priority to EP10188665A priority patent/EP2278397A3/en
Priority to EP10188667.9A priority patent/EP2278399B1/en
Publication of JP2004012510A publication Critical patent/JP2004012510A/ja
Publication of JP2004012510A5 publication Critical patent/JP2004012510A5/ja
Application granted granted Critical
Publication of JP4073255B2 publication Critical patent/JP4073255B2/ja
Priority to KR1020090108795A priority patent/KR100947853B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2002161617A 2002-05-31 2002-06-03 ポジ型レジスト組成物 Expired - Fee Related JP4073255B2 (ja)

Priority Applications (10)

Application Number Priority Date Filing Date Title
JP2002161617A JP4073255B2 (ja) 2002-06-03 2002-06-03 ポジ型レジスト組成物
KR1020030034881A KR100955454B1 (ko) 2002-05-31 2003-05-30 포지티브 레지스트 조성물
US10/448,041 US6939662B2 (en) 2002-05-31 2003-05-30 Positive-working resist composition
AT03012142T ATE525676T1 (de) 2002-05-31 2003-06-02 Positiv arbeitende resistzusammensetzung
EP10188666A EP2278398A3 (en) 2002-05-31 2003-06-02 Positive-working resist composition
EP10188668A EP2278400A3 (en) 2002-05-31 2003-06-02 Positive-working resist composition
EP03012142A EP1367440B1 (en) 2002-05-31 2003-06-02 Positive-working resist composition
EP10188665A EP2278397A3 (en) 2002-05-31 2003-06-02 Positive-working resist composition
EP10188667.9A EP2278399B1 (en) 2002-05-31 2003-06-02 Positive-working resist composition
KR1020090108795A KR100947853B1 (ko) 2002-05-31 2009-11-11 포지티브 레지스트 조성물 및 이를 이용한 패턴형성방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002161617A JP4073255B2 (ja) 2002-06-03 2002-06-03 ポジ型レジスト組成物

Publications (3)

Publication Number Publication Date
JP2004012510A JP2004012510A (ja) 2004-01-15
JP2004012510A5 JP2004012510A5 (enExample) 2005-09-22
JP4073255B2 true JP4073255B2 (ja) 2008-04-09

Family

ID=30430639

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002161617A Expired - Fee Related JP4073255B2 (ja) 2002-05-31 2002-06-03 ポジ型レジスト組成物

Country Status (1)

Country Link
JP (1) JP4073255B2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102333797B (zh) 2009-02-23 2014-08-13 Jsr株式会社 化合物、含氟原子聚合物和放射线敏感性树脂组合物
JP5617810B2 (ja) * 2011-10-04 2014-11-05 信越化学工業株式会社 レジスト保護膜材料及びパターン形成方法
JP5825248B2 (ja) 2012-12-12 2015-12-02 信越化学工業株式会社 ポジ型レジスト材料並びにこれを用いたパターン形成方法
JP5825252B2 (ja) * 2012-12-26 2015-12-02 信越化学工業株式会社 レジスト材料及びこれを用いたパターン形成方法
JP5821862B2 (ja) * 2013-01-29 2015-11-24 信越化学工業株式会社 ネガ型レジスト材料並びにこれを用いたパターン形成方法
JP6065942B2 (ja) * 2015-06-12 2017-01-25 信越化学工業株式会社 高分子化合物
JP7459636B2 (ja) 2019-06-14 2024-04-02 Jsr株式会社 感放射線性樹脂組成物及びレジストパターン形成方法

Also Published As

Publication number Publication date
JP2004012510A (ja) 2004-01-15

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