JP2004012510A5 - - Google Patents
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- Publication number
- JP2004012510A5 JP2004012510A5 JP2002161617A JP2002161617A JP2004012510A5 JP 2004012510 A5 JP2004012510 A5 JP 2004012510A5 JP 2002161617 A JP2002161617 A JP 2002161617A JP 2002161617 A JP2002161617 A JP 2002161617A JP 2004012510 A5 JP2004012510 A5 JP 2004012510A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- atom
- hydrogen atom
- bonded
- organic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 3
- 125000000962 organic group Chemical group 0.000 claims 3
- 229910052731 fluorine Inorganic materials 0.000 claims 2
- 125000001153 fluoro group Chemical group F* 0.000 claims 2
- 125000005647 linker group Chemical group 0.000 claims 2
- 125000000217 alkyl group Chemical group 0.000 claims 1
- 125000002947 alkylene group Chemical group 0.000 claims 1
- 125000003710 aryl alkyl group Chemical group 0.000 claims 1
- 125000003118 aryl group Chemical group 0.000 claims 1
- 125000000732 arylene group Chemical group 0.000 claims 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims 1
- 125000002993 cycloalkylene group Chemical group 0.000 claims 1
- 125000005843 halogen group Chemical group 0.000 claims 1
- 125000005842 heteroatom Chemical group 0.000 claims 1
- 125000001820 oxy group Chemical group [*:1]O[*:2] 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
Priority Applications (10)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002161617A JP4073255B2 (ja) | 2002-06-03 | 2002-06-03 | ポジ型レジスト組成物 |
| KR1020030034881A KR100955454B1 (ko) | 2002-05-31 | 2003-05-30 | 포지티브 레지스트 조성물 |
| US10/448,041 US6939662B2 (en) | 2002-05-31 | 2003-05-30 | Positive-working resist composition |
| AT03012142T ATE525676T1 (de) | 2002-05-31 | 2003-06-02 | Positiv arbeitende resistzusammensetzung |
| EP10188666A EP2278398A3 (en) | 2002-05-31 | 2003-06-02 | Positive-working resist composition |
| EP10188668A EP2278400A3 (en) | 2002-05-31 | 2003-06-02 | Positive-working resist composition |
| EP03012142A EP1367440B1 (en) | 2002-05-31 | 2003-06-02 | Positive-working resist composition |
| EP10188665A EP2278397A3 (en) | 2002-05-31 | 2003-06-02 | Positive-working resist composition |
| EP10188667.9A EP2278399B1 (en) | 2002-05-31 | 2003-06-02 | Positive-working resist composition |
| KR1020090108795A KR100947853B1 (ko) | 2002-05-31 | 2009-11-11 | 포지티브 레지스트 조성물 및 이를 이용한 패턴형성방법 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002161617A JP4073255B2 (ja) | 2002-06-03 | 2002-06-03 | ポジ型レジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004012510A JP2004012510A (ja) | 2004-01-15 |
| JP2004012510A5 true JP2004012510A5 (enExample) | 2005-09-22 |
| JP4073255B2 JP4073255B2 (ja) | 2008-04-09 |
Family
ID=30430639
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002161617A Expired - Fee Related JP4073255B2 (ja) | 2002-05-31 | 2002-06-03 | ポジ型レジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4073255B2 (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102333797B (zh) | 2009-02-23 | 2014-08-13 | Jsr株式会社 | 化合物、含氟原子聚合物和放射线敏感性树脂组合物 |
| JP5617810B2 (ja) * | 2011-10-04 | 2014-11-05 | 信越化学工業株式会社 | レジスト保護膜材料及びパターン形成方法 |
| JP5825248B2 (ja) | 2012-12-12 | 2015-12-02 | 信越化学工業株式会社 | ポジ型レジスト材料並びにこれを用いたパターン形成方法 |
| JP5825252B2 (ja) * | 2012-12-26 | 2015-12-02 | 信越化学工業株式会社 | レジスト材料及びこれを用いたパターン形成方法 |
| JP5821862B2 (ja) * | 2013-01-29 | 2015-11-24 | 信越化学工業株式会社 | ネガ型レジスト材料並びにこれを用いたパターン形成方法 |
| JP6065942B2 (ja) * | 2015-06-12 | 2017-01-25 | 信越化学工業株式会社 | 高分子化合物 |
| JP7459636B2 (ja) | 2019-06-14 | 2024-04-02 | Jsr株式会社 | 感放射線性樹脂組成物及びレジストパターン形成方法 |
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2002
- 2002-06-03 JP JP2002161617A patent/JP4073255B2/ja not_active Expired - Fee Related