JP2004012510A5 - - Google Patents
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- JP2004012510A5 JP2004012510A5 JP2002161617A JP2002161617A JP2004012510A5 JP 2004012510 A5 JP2004012510 A5 JP 2004012510A5 JP 2002161617 A JP2002161617 A JP 2002161617A JP 2002161617 A JP2002161617 A JP 2002161617A JP 2004012510 A5 JP2004012510 A5 JP 2004012510A5
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Claims (2)
Ｘは、ヘテロ原子を有する２価の連結基、−Ｏ−、−Ｓ−、−ＳＯ2−又は−ＮＲa−を表す。式中、Ｒaは、水素原子、アルキル基、アリール基又はアラルキル基を表す。
Ｌは、単結合又はアルキレン基、シクロアルキレン基、アリーレン基、これらの基を結合した基及びこれらの基とオキシ基及び／又はカルボニル基とを結合した基から選ばれる２価の連結基を表す。
Ｒ1〜Ｒ6は、各々独立に、水素原子、ハロゲン原子又は有機基を表す。但し、Ｒ1〜Ｒ6の内の少なくとも１つは、フッ素原子又は少なくとも１つのフッ素原子を有する有機基を表す。
Ｒは、水素原子又は有機基を表す。(A) A positive resist composition comprising a resin having at least one repeating unit having at least one group represented by the following general formula (Z).
X represents a divalent linking group having a hetero atom, —O—, —S—, —SO 2 — or —NR a —. In the formula, R a represents a hydrogen atom, an alkyl group, an aryl group or an aralkyl group.
L represents a single bond or a divalent linking group selected from an alkylene group, a cycloalkylene group, an arylene group, a group in which these groups are bonded, and a group in which these groups are bonded to an oxy group and / or a carbonyl group. .
R 1 to R 6 each independently represents a hydrogen atom, a halogen atom or an organic group. However, at least one of R 1 to R 6 represents a fluorine atom or an organic group having at least one fluorine atom.
R represents a hydrogen atom or an organic group.
Priority Applications (10)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002161617A JP4073255B2 (en) | 2002-06-03 | 2002-06-03 | Positive resist composition |
| KR1020030034881A KR100955454B1 (en) | 2002-05-31 | 2003-05-30 | Positive-working resist composition |
| US10/448,041 US6939662B2 (en) | 2002-05-31 | 2003-05-30 | Positive-working resist composition |
| AT03012142T ATE525676T1 (en) | 2002-05-31 | 2003-06-02 | POSITIVE WORKING RESISTANT COMPOSITION |
| EP10188665A EP2278397A3 (en) | 2002-05-31 | 2003-06-02 | Positive-working resist composition |
| EP10188668A EP2278400A3 (en) | 2002-05-31 | 2003-06-02 | Positive-working resist composition |
| EP10188667.9A EP2278399B1 (en) | 2002-05-31 | 2003-06-02 | Positive-working resist composition |
| EP03012142A EP1367440B1 (en) | 2002-05-31 | 2003-06-02 | Positive-working resist composition |
| EP10188666A EP2278398A3 (en) | 2002-05-31 | 2003-06-02 | Positive-working resist composition |
| KR1020090108795A KR100947853B1 (en) | 2002-05-31 | 2009-11-11 | Positive-working resist composition and pattern forming method using thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002161617A JP4073255B2 (en) | 2002-06-03 | 2002-06-03 | Positive resist composition |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004012510A JP2004012510A (en) | 2004-01-15 |
| JP2004012510A5 true JP2004012510A5 (en) | 2005-09-22 |
| JP4073255B2 JP4073255B2 (en) | 2008-04-09 |
Family
ID=30430639
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002161617A Expired - Fee Related JP4073255B2 (en) | 2002-05-31 | 2002-06-03 | Positive resist composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4073255B2 (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101729792B1 (en) | 2009-02-23 | 2017-04-24 | 제이에스알 가부시끼가이샤 | Compounds, fluorine-containing polymers, and radiation-sensitive resin compositions |
| JP5617810B2 (en) * | 2011-10-04 | 2014-11-05 | 信越化学工業株式会社 | Resist protective film material and pattern forming method |
| JP5825248B2 (en) | 2012-12-12 | 2015-12-02 | 信越化学工業株式会社 | Positive resist material and pattern forming method using the same |
| JP5825252B2 (en) * | 2012-12-26 | 2015-12-02 | 信越化学工業株式会社 | Resist material and pattern forming method using the same |
| JP5821862B2 (en) * | 2013-01-29 | 2015-11-24 | 信越化学工業株式会社 | Negative resist material and pattern forming method using the same |
| JP6065942B2 (en) * | 2015-06-12 | 2017-01-25 | 信越化学工業株式会社 | High molecular compound |
| JP7459636B2 (en) | 2019-06-14 | 2024-04-02 | Jsr株式会社 | Radiation-sensitive resin composition and method for forming resist pattern |
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2002
- 2002-06-03 JP JP2002161617A patent/JP4073255B2/en not_active Expired - Fee Related