JP4070896B2 - 電気光学素子および該電気光学素子の製造方法 - Google Patents

電気光学素子および該電気光学素子の製造方法 Download PDF

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Publication number
JP4070896B2
JP4070896B2 JP28520698A JP28520698A JP4070896B2 JP 4070896 B2 JP4070896 B2 JP 4070896B2 JP 28520698 A JP28520698 A JP 28520698A JP 28520698 A JP28520698 A JP 28520698A JP 4070896 B2 JP4070896 B2 JP 4070896B2
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Japan
Prior art keywords
wiring
gate
substrate
insulating layer
film
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Expired - Lifetime
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JP28520698A
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English (en)
Japanese (ja)
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JP2000111937A5 (enExample
JP2000111937A (ja
Inventor
伸宏 中村
宏二 藪下
攻 伊藤
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Mitsubishi Electric Corp
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Mitsubishi Electric Corp
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Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP28520698A priority Critical patent/JP4070896B2/ja
Priority to US09/412,758 priority patent/US6621537B1/en
Priority to KR1019990043000A priority patent/KR100690409B1/ko
Publication of JP2000111937A publication Critical patent/JP2000111937A/ja
Publication of JP2000111937A5 publication Critical patent/JP2000111937A5/ja
Application granted granted Critical
Publication of JP4070896B2 publication Critical patent/JP4070896B2/ja
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136213—Storage capacitors associated with the pixel electrode
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136286—Wiring, e.g. gate line, drain line
    • G02F1/136295—Materials; Compositions; Manufacture processes

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Power Engineering (AREA)
  • Liquid Crystal (AREA)
  • Thin Film Transistor (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP28520698A 1998-10-07 1998-10-07 電気光学素子および該電気光学素子の製造方法 Expired - Lifetime JP4070896B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP28520698A JP4070896B2 (ja) 1998-10-07 1998-10-07 電気光学素子および該電気光学素子の製造方法
US09/412,758 US6621537B1 (en) 1998-10-07 1999-10-05 Active matrix liquid crystal display and manufacturing method of the same
KR1019990043000A KR100690409B1 (ko) 1998-10-07 1999-10-06 전기광학소자 및 전기광학소자의 제조방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28520698A JP4070896B2 (ja) 1998-10-07 1998-10-07 電気光学素子および該電気光学素子の製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2007300531A Division JP4249241B2 (ja) 2007-11-20 2007-11-20 電気光学素子および該電気光学素子の製造方法

Publications (3)

Publication Number Publication Date
JP2000111937A JP2000111937A (ja) 2000-04-21
JP2000111937A5 JP2000111937A5 (enExample) 2007-01-11
JP4070896B2 true JP4070896B2 (ja) 2008-04-02

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Family Applications (1)

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JP28520698A Expired - Lifetime JP4070896B2 (ja) 1998-10-07 1998-10-07 電気光学素子および該電気光学素子の製造方法

Country Status (3)

Country Link
US (1) US6621537B1 (enExample)
JP (1) JP4070896B2 (enExample)
KR (1) KR100690409B1 (enExample)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
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TW578028B (en) * 1999-12-16 2004-03-01 Sharp Kk Liquid crystal display and manufacturing method thereof
JP2001255549A (ja) * 2000-03-09 2001-09-21 Matsushita Electric Ind Co Ltd 液晶表示装置
KR100488338B1 (ko) * 2000-05-09 2005-05-10 엘지.필립스 엘시디 주식회사 박막트랜지스터 액정표시장치용 어레이기판 및 그의제조방법
JP4777500B2 (ja) * 2000-06-19 2011-09-21 三菱電機株式会社 アレイ基板およびそれを用いた表示装置ならびにアレイ基板の製造方法
JP4689806B2 (ja) * 2000-09-28 2011-05-25 Ｎｅｃ液晶テクノロジー株式会社 液晶表示装置
KR100393945B1 (ko) * 2001-02-24 2003-08-06 이노스텍 (주) 금속 박막 저항체 소자의 제조 방법 및 이를 이용한 금속 박막 온도 센서의 제조 방법
AU2002245519A1 (en) * 2001-03-02 2002-09-19 Tokyo Electron Limited Apparatus and method of improving impedance matching between an rf signal and a multi-segmented electrode
TW594156B (en) 2002-01-04 2004-06-21 Fujitsu Display Tech Substrate for display device and display device equipped therewith
KR100853776B1 (ko) * 2002-06-15 2008-08-25 엘지디스플레이 주식회사 액정표시장치 및 그 제조 방법
KR100878237B1 (ko) 2002-08-01 2009-01-13 삼성전자주식회사 박막 트랜지스터 기판
US7385651B2 (en) * 2002-12-26 2008-06-10 Lg Display Co., Ltd. Array substrate for liquid crystal display device and method of manufacturing the same
KR101158902B1 (ko) * 2005-09-03 2012-06-25 삼성전자주식회사 어레이 기판, 액정표시패널 및 이를 구비한 액정표시장치
KR101226444B1 (ko) * 2005-12-21 2013-01-28 삼성디스플레이 주식회사 표시 기판의 제조 방법 및 표시 기판
KR101238337B1 (ko) 2006-05-12 2013-03-04 삼성디스플레이 주식회사 어레이 기판 및 이를 갖는 액정표시장치
KR20080009889A (ko) * 2006-07-25 2008-01-30 삼성전자주식회사 액정 표시 장치
CN100426109C (zh) * 2006-12-13 2008-10-15 友达光电股份有限公司 液晶显示器的像素阵列结构及其制造方法
JP4862777B2 (ja) * 2007-08-10 2012-01-25 カシオ計算機株式会社 表示装置
TWI425639B (zh) * 2007-10-22 2014-02-01 Au Optronics Corp 一種薄膜電晶體及其製造方法
JP2009180981A (ja) * 2008-01-31 2009-08-13 Mitsubishi Electric Corp アクティブマトリックス基板及びその製造方法
JP5239368B2 (ja) * 2008-02-06 2013-07-17 三菱電機株式会社 アレイ基板および表示装置
KR101571768B1 (ko) * 2008-03-03 2015-11-26 삼성디스플레이 주식회사 표시 기판, 이의 불량 리페어 방법 및 이 표시 기판을 갖는모기판
KR101671544B1 (ko) * 2008-11-21 2016-11-01 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치, 표시 장치 및 전자 기기
KR101575175B1 (ko) * 2008-12-24 2015-12-09 삼성디스플레이 주식회사 박막 트랜지스터 기판
JP5238826B2 (ja) * 2009-01-27 2013-07-17 シャープ株式会社 液晶表示装置
WO2014069529A1 (ja) 2012-10-30 2014-05-08 シャープ株式会社 アクティブマトリクス基板、表示パネル及びそれを備えた表示装置
JP6482256B2 (ja) * 2014-12-02 2019-03-13 三菱電機株式会社 薄膜トランジスタ基板および液晶表示装置
CN113363272B (zh) * 2021-05-31 2023-12-08 武汉新芯集成电路制造有限公司 感光阵列及制造方法、成像装置

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US5283566A (en) * 1988-04-06 1994-02-01 Hitachi, Ltd. Plane display
JPH0364735A (ja) * 1989-08-03 1991-03-20 Sharp Corp アクティブマトリクス表示装置
JP2714993B2 (ja) * 1989-12-15 1998-02-16 セイコーエプソン株式会社 液晶表示装置
US5162933A (en) * 1990-05-16 1992-11-10 Nippon Telegraph And Telephone Corporation Active matrix structure for liquid crystal display elements wherein each of the gate/data lines includes at least a molybdenum-base alloy layer containing 0.5 to 10 wt. % of chromium
JP3157325B2 (ja) * 1993-02-24 2001-04-16 三洋電機株式会社 液晶表示装置の製造方法
JPH081500B2 (ja) * 1993-03-23 1996-01-10 インターナショナル・ビジネス・マシーンズ・コーポレイション 液晶表示装置
JPH08201853A (ja) * 1994-11-24 1996-08-09 Toshiba Electron Eng Corp 電極基板および平面表示装置
JPH08320466A (ja) * 1995-03-17 1996-12-03 Sharp Corp アクティブマトリクス基板及びその欠陥修正方法

Also Published As

Publication number Publication date
JP2000111937A (ja) 2000-04-21
US6621537B1 (en) 2003-09-16
KR100690409B1 (ko) 2007-03-09
KR20000028864A (ko) 2000-05-25

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