JP4046636B2 - 基板処理方法及び基板処理装置 - Google Patents

基板処理方法及び基板処理装置 Download PDF

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JP4046636B2
JP4046636B2 JP2003107378A JP2003107378A JP4046636B2 JP 4046636 B2 JP4046636 B2 JP 4046636B2 JP 2003107378 A JP2003107378 A JP 2003107378A JP 2003107378 A JP2003107378 A JP 2003107378A JP 4046636 B2 JP4046636 B2 JP 4046636B2
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substrate
processed
ultraviolet
ultraviolet irradiation
gas
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Japanese (ja)
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JP2004319558A5 (enExample
JP2004319558A (ja
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英昭 岩坂
圭 宮崎
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2003107378A 2003-04-11 2003-04-11 基板処理方法及び基板処理装置 Expired - Fee Related JP4046636B2 (ja)

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JP2003107378A JP4046636B2 (ja) 2003-04-11 2003-04-11 基板処理方法及び基板処理装置

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JP2003107378A JP4046636B2 (ja) 2003-04-11 2003-04-11 基板処理方法及び基板処理装置

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JP2004319558A JP2004319558A (ja) 2004-11-11
JP2004319558A5 JP2004319558A5 (enExample) 2005-09-29
JP4046636B2 true JP4046636B2 (ja) 2008-02-13

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Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5017975B2 (ja) * 2006-09-13 2012-09-05 セイコーエプソン株式会社 表面改質方法及び表面改質装置
JP4859660B2 (ja) * 2006-12-27 2012-01-25 東京応化工業株式会社 基板処置装置
JP5093176B2 (ja) * 2009-03-31 2012-12-05 ウシオ電機株式会社 エキシマランプ装置
JP6323141B2 (ja) * 2014-04-18 2018-05-16 東京エレクトロン株式会社 基板処理装置
JP6349208B2 (ja) * 2014-09-09 2018-06-27 東京応化工業株式会社 紫外線照射装置、紫外線照射方法、基板処理装置、及び基板処理装置の製造方法
JP6320956B2 (ja) 2015-03-13 2018-05-09 東京エレクトロン株式会社 基板処理装置及び基板処理方法

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