JP4040037B2 - 被洗浄物の洗浄方法及びその装置 - Google Patents

被洗浄物の洗浄方法及びその装置 Download PDF

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Publication number
JP4040037B2
JP4040037B2 JP2004252505A JP2004252505A JP4040037B2 JP 4040037 B2 JP4040037 B2 JP 4040037B2 JP 2004252505 A JP2004252505 A JP 2004252505A JP 2004252505 A JP2004252505 A JP 2004252505A JP 4040037 B2 JP4040037 B2 JP 4040037B2
Authority
JP
Japan
Prior art keywords
cleaning
cleaned
liquid
cleaning liquid
storage body
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004252505A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005349380A (ja
JP2005349380A5 (enExample
Inventor
正英 内野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Japan Field Co Ltd
Original Assignee
Japan Field Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Field Co Ltd filed Critical Japan Field Co Ltd
Priority to JP2004252505A priority Critical patent/JP4040037B2/ja
Priority to US11/596,203 priority patent/US20070215177A1/en
Priority to KR1020067023153A priority patent/KR101128930B1/ko
Priority to CN2005800148879A priority patent/CN1950158B/zh
Priority to PCT/JP2005/008011 priority patent/WO2005107968A1/ja
Publication of JP2005349380A publication Critical patent/JP2005349380A/ja
Publication of JP2005349380A5 publication Critical patent/JP2005349380A5/ja
Application granted granted Critical
Publication of JP4040037B2 publication Critical patent/JP4040037B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/045—Cleaning involving contact with liquid using perforated containers, e.g. baskets, or racks immersed and agitated in a liquid bath

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
JP2004252505A 2004-05-11 2004-08-31 被洗浄物の洗浄方法及びその装置 Expired - Fee Related JP4040037B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2004252505A JP4040037B2 (ja) 2004-05-11 2004-08-31 被洗浄物の洗浄方法及びその装置
US11/596,203 US20070215177A1 (en) 2004-05-11 2005-04-27 Method for Cleaning Object to Be Cleaned and Apparatus Therefor
KR1020067023153A KR101128930B1 (ko) 2004-05-11 2005-04-27 피세정물의 세정방법 및 그 장치
CN2005800148879A CN1950158B (zh) 2004-05-11 2005-04-27 被清洗物的清洗方法及其装置
PCT/JP2005/008011 WO2005107968A1 (ja) 2004-05-11 2005-04-27 被洗浄物の洗浄方法及びその装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004141562 2004-05-11
JP2004252505A JP4040037B2 (ja) 2004-05-11 2004-08-31 被洗浄物の洗浄方法及びその装置

Publications (3)

Publication Number Publication Date
JP2005349380A JP2005349380A (ja) 2005-12-22
JP2005349380A5 JP2005349380A5 (enExample) 2006-02-09
JP4040037B2 true JP4040037B2 (ja) 2008-01-30

Family

ID=35320092

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004252505A Expired - Fee Related JP4040037B2 (ja) 2004-05-11 2004-08-31 被洗浄物の洗浄方法及びその装置

Country Status (5)

Country Link
US (1) US20070215177A1 (enExample)
JP (1) JP4040037B2 (enExample)
KR (1) KR101128930B1 (enExample)
CN (1) CN1950158B (enExample)
WO (1) WO2005107968A1 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20080107217A (ko) * 2007-06-05 2008-12-10 삼성전자주식회사 잉크젯 프린터의 노즐칩 세척장치 및 그것을 구비한 잉크젯프린터
DE102011075172A1 (de) * 2011-05-03 2012-11-08 Krones Aktiengesellschaft Sperrwassersystem
KR101311323B1 (ko) * 2012-02-24 2013-09-25 (주)범용테크놀러지 트레이와 다이 세정장치
CN104485306B (zh) * 2014-12-26 2018-04-27 合肥彩虹蓝光科技有限公司 一种led清洗篮垫块
CN105887105B (zh) * 2016-04-08 2018-10-09 北方夜视技术股份有限公司 一种用于扫描条纹管的超薄金属栅网片的清洁方法
JP2017202469A (ja) * 2016-05-13 2017-11-16 ジャパン・フィールド株式会社 被洗浄物の洗浄方法及びその装置
JP6351195B1 (ja) * 2017-10-30 2018-07-04 ジャパン・フィールド株式会社 被洗浄物の洗浄装置
KR102046973B1 (ko) * 2018-04-10 2019-12-02 세메스 주식회사 기판의 세정방법 및 세정장치
WO2020150029A1 (en) * 2019-01-20 2020-07-23 Applied Materials, Inc. Sonic cleaning system and method of sonic cleaning a workpiece
JP7049298B2 (ja) * 2019-09-27 2022-04-06 株式会社桜川ポンプ製作所 被洗浄物の洗浄装置及びこれを用いた被洗浄物の洗浄方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3041212A (en) * 1958-10-27 1962-06-26 Welded Products Company Egg washing apparatus and method
US3497445A (en) * 1967-07-28 1970-02-24 Economics Lab Apparatus for cleaning and detarnishing silverware
US4763392A (en) * 1987-04-10 1988-08-16 International Marketing Inc. Method of manufacturing a totally coated tire rim
JP2784157B2 (ja) * 1995-06-13 1998-08-06 ジャパン・フィールド株式会社 洗浄装置
US6616774B2 (en) * 1997-12-26 2003-09-09 Spc Electronics Wafer cleaning device and tray for use in wafer cleaning device
JP2001246335A (ja) * 2000-03-08 2001-09-11 Japan Field Kk 洗浄装置
JP3937698B2 (ja) * 2000-07-06 2007-06-27 セイコーエプソン株式会社 洗浄方法および液晶装置の製造方法
JP4027072B2 (ja) * 2001-10-18 2007-12-26 松下電器産業株式会社 減圧プラズマ処理装置及びその方法

Also Published As

Publication number Publication date
US20070215177A1 (en) 2007-09-20
CN1950158B (zh) 2010-05-05
WO2005107968A1 (ja) 2005-11-17
JP2005349380A (ja) 2005-12-22
KR101128930B1 (ko) 2012-03-27
KR20070007181A (ko) 2007-01-12
CN1950158A (zh) 2007-04-18

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