JP4027564B2 - 真空排気システム - Google Patents

真空排気システム Download PDF

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Publication number
JP4027564B2
JP4027564B2 JP2000109453A JP2000109453A JP4027564B2 JP 4027564 B2 JP4027564 B2 JP 4027564B2 JP 2000109453 A JP2000109453 A JP 2000109453A JP 2000109453 A JP2000109453 A JP 2000109453A JP 4027564 B2 JP4027564 B2 JP 4027564B2
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Japan
Prior art keywords
main
vacuum pump
vacuum chamber
pressure
exhaust line
Prior art date
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Expired - Lifetime
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JP2000109453A
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English (en)
Japanese (ja)
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JP2001295761A (ja
JP2001295761A5 (enExample
Inventor
裕之 川崎
博 服部
敏治 中澤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ebara Corp
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Ebara Corp
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Publication date
Application filed by Ebara Corp filed Critical Ebara Corp
Priority to JP2000109453A priority Critical patent/JP4027564B2/ja
Publication of JP2001295761A publication Critical patent/JP2001295761A/ja
Publication of JP2001295761A5 publication Critical patent/JP2001295761A5/ja
Application granted granted Critical
Publication of JP4027564B2 publication Critical patent/JP4027564B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
  • Control Of Positive-Displacement Pumps (AREA)
JP2000109453A 2000-04-11 2000-04-11 真空排気システム Expired - Lifetime JP4027564B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000109453A JP4027564B2 (ja) 2000-04-11 2000-04-11 真空排気システム

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000109453A JP4027564B2 (ja) 2000-04-11 2000-04-11 真空排気システム

Publications (3)

Publication Number Publication Date
JP2001295761A JP2001295761A (ja) 2001-10-26
JP2001295761A5 JP2001295761A5 (enExample) 2005-01-06
JP4027564B2 true JP4027564B2 (ja) 2007-12-26

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ID=18622144

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000109453A Expired - Lifetime JP4027564B2 (ja) 2000-04-11 2000-04-11 真空排気システム

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JP (1) JP4027564B2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100458629C (zh) * 2002-11-08 2009-02-04 东京毅力科创株式会社 流体处理装置及流体处理方法
JP2007242521A (ja) * 2006-03-10 2007-09-20 Mitsui Eng & Shipbuild Co Ltd イオン源の交換方法
CN103426789A (zh) * 2012-05-24 2013-12-04 上海宏力半导体制造有限公司 可检测自适应压力调整器泄露状态的设备
CN111322226A (zh) * 2018-12-14 2020-06-23 夏泰鑫半导体(青岛)有限公司 真空系统及半导体加工设备
CN112530777B (zh) * 2019-09-18 2024-09-10 夏泰鑫半导体(青岛)有限公司 抽气装置及其抽气方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2663549B2 (ja) * 1988-09-02 1997-10-15 株式会社日本自動車部品総合研究所 真空装置の圧力制御方法
JPH0378982U (enExample) * 1989-11-30 1991-08-12
JPH0457681U (enExample) * 1990-09-25 1992-05-18
JPH04326943A (ja) * 1991-04-25 1992-11-16 Hitachi Ltd 真空排気システム及び排気方法
JPH0758032A (ja) * 1993-08-09 1995-03-03 Hitachi Electron Eng Co Ltd 圧力制御装置および圧力制御方法
JP3277209B2 (ja) * 1994-06-08 2002-04-22 日本電信電話株式会社 ドライエッチング装置のドライ洗浄方法
JP3247270B2 (ja) * 1994-08-25 2002-01-15 東京エレクトロン株式会社 処理装置及びドライクリーニング方法
JPH0969515A (ja) * 1995-06-20 1997-03-11 Sony Corp 半導体製造装置用真空処理装置

Also Published As

Publication number Publication date
JP2001295761A (ja) 2001-10-26

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