JP4025859B2 - 検査装置及び検査方法並びにパターン基板の製造方法 - Google Patents

検査装置及び検査方法並びにパターン基板の製造方法 Download PDF

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JP4025859B2
JP4025859B2 JP2004257674A JP2004257674A JP4025859B2 JP 4025859 B2 JP4025859 B2 JP 4025859B2 JP 2004257674 A JP2004257674 A JP 2004257674A JP 2004257674 A JP2004257674 A JP 2004257674A JP 4025859 B2 JP4025859 B2 JP 4025859B2
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image
light
contour
luminance
light source
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JP2004257674A
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JP2006072147A (ja
JP2006072147A5 (enExample
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治彦 楠瀬
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Lasertec Corp
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Lasertec Corp
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  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2004257674A 2004-09-03 2004-09-03 検査装置及び検査方法並びにパターン基板の製造方法 Expired - Fee Related JP4025859B2 (ja)

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JP2004257674A JP4025859B2 (ja) 2004-09-03 2004-09-03 検査装置及び検査方法並びにパターン基板の製造方法

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JP2004257674A JP4025859B2 (ja) 2004-09-03 2004-09-03 検査装置及び検査方法並びにパターン基板の製造方法

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JP2007170090A Division JP4285613B2 (ja) 2007-06-28 2007-06-28 検査装置及び検査方法並びにパターン基板の製造方法

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JP2006072147A JP2006072147A (ja) 2006-03-16
JP2006072147A5 JP2006072147A5 (enExample) 2007-03-29
JP4025859B2 true JP4025859B2 (ja) 2007-12-26

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Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008026212A (ja) * 2006-07-24 2008-02-07 Ushio Inc パターン検査装置
JP5221858B2 (ja) * 2006-08-30 2013-06-26 株式会社日立ハイテクノロジーズ 欠陥検査装置、及び欠陥検査方法
JP4224863B2 (ja) 2007-02-02 2009-02-18 レーザーテック株式会社 検査装置及び検査方法、並びにパターン基板の製造方法
JP4590521B1 (ja) * 2009-10-30 2010-12-01 レーザーテック株式会社 検査装置、及び検査方法
US8280172B1 (en) * 2011-03-22 2012-10-02 Mitutoyo Corporation Edge location measurement correction for coaxial light images
JP5024842B1 (ja) * 2011-07-22 2012-09-12 レーザーテック株式会社 検査装置、及び検査方法
CN104813215B (zh) * 2013-02-28 2018-03-09 松下知识产权经营株式会社 共聚焦显微镜
JP6373074B2 (ja) * 2014-06-06 2018-08-15 株式会社ニューフレアテクノロジー マスク検査装置及びマスク検査方法
JP6591348B2 (ja) * 2016-06-03 2019-10-16 株式会社ニューフレアテクノロジー 検査方法
KR20230166137A (ko) 2019-03-28 2023-12-06 하마마츠 포토닉스 가부시키가이샤 검사 장치 및 검사 방법
JP7229138B2 (ja) * 2019-09-27 2023-02-27 Hoya株式会社 パターン検査方法、フォトマスクの検査装置、フォトマスクの製造方法、および表示装置の製造方法
JP7373105B2 (ja) * 2020-03-10 2023-11-02 株式会社東京精密 亀裂検出装置及び方法
CN113686897B (zh) * 2021-08-05 2023-11-03 江苏维普光电科技有限公司 一种掩模表面颗粒缺陷检测方法
CN115855967A (zh) * 2022-12-16 2023-03-28 合肥御微半导体技术有限公司 一种缺陷检测装置和方法

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