JP4016035B2 - 集積化サーミスタに関する方法および構造 - Google Patents
集積化サーミスタに関する方法および構造 Download PDFInfo
- Publication number
- JP4016035B2 JP4016035B2 JP2005000921A JP2005000921A JP4016035B2 JP 4016035 B2 JP4016035 B2 JP 4016035B2 JP 2005000921 A JP2005000921 A JP 2005000921A JP 2005000921 A JP2005000921 A JP 2005000921A JP 4016035 B2 JP4016035 B2 JP 4016035B2
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- Prior art keywords
- thermistor
- layer
- salicide
- ild
- upper layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
- H01L21/76895—Local interconnects; Local pads, as exemplified by patent document EP0896365
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01K—MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR
- G01K7/00—Measuring temperature based on the use of electric or magnetic elements directly sensitive to heat ; Power supply therefor, e.g. using thermoelectric elements
- G01K7/16—Measuring temperature based on the use of electric or magnetic elements directly sensitive to heat ; Power supply therefor, e.g. using thermoelectric elements using resistive elements
- G01K7/22—Measuring temperature based on the use of electric or magnetic elements directly sensitive to heat ; Power supply therefor, e.g. using thermoelectric elements using resistive elements the element being a non-linear resistance, e.g. thermistor
- G01K7/226—Measuring temperature based on the use of electric or magnetic elements directly sensitive to heat ; Power supply therefor, e.g. using thermoelectric elements using resistive elements the element being a non-linear resistance, e.g. thermistor using microstructures, e.g. silicon spreading resistance
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
- H01C7/006—Thin film resistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
- H01L21/76224—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using trench refilling with dielectric materials
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Nonlinear Science (AREA)
- Electromagnetism (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Semiconductor Integrated Circuits (AREA)
- Electrodes Of Semiconductors (AREA)
Description
サーミスタ材料 RTC
――――――――――――――――――――――――
プラチナ(Pt) +0.3927%/C
銅(Cu) +0.68%/C
コバルト(Co) +0.604%/C
ニッケル(Ni) +0.69%/C
シリコン(Si−真性) +0.70%/C
SiC(炭化シリコン) −2.01%/C
硼素ドープSiC −2.85%/C
100 サリサイド前駆体;導体層;薄膜層
110 SOI層;シリコン層;薄膜Si層
120 BOX層
130 シャロー・トレンチ分離(STI)構造;STI領域;
140 シリサイドの層;サリサイド・エリア;サリサイド層
150 無反応導体層
160 ブロック・マスク層
170 サーミスタ
180 コンタクト・バイア
190 レベル間誘電体層(ILD)
192 導体パターン
194 導体パターン
200 レベル間誘電体層(ILD)
210 ワイヤリング・レベル
220 マスク層
225 エンボス領域
230 サーミスタ材料;ハード・マスク層
240 相互接続ライナ;導体ライナ
242 下側エリア
244 上側エリア
245 開口
250 導体層;導体材料
252 第2のワイヤリング・レベル
254 導体バイア
260 サーミスタ;ハード・マスク
270 コンタクト・バイア
280 キャッピング層
290 レベル間誘電体層(ILD)
300 導体パターン
310 導体パターン
Claims (12)
- サーミスタを形成する方法であって、
少なくとも単結晶半導体の上側層を含む基板内に分離領域を形成するステップと、
前記分離領域および前記単結晶半導体の上側層上にサリサイド前駆体を形成するステップと、
前記サリサイド前駆体を前記上側層に反応させ、前記上側層に対して自己整合するサリサイドを形成するステップと、
前記分離領域上の前記サリサイド前駆体の部分を前記サーミスタの本体として保存しつつ、前記サリサイド前駆体の無反応部分を除去するステップと、を備える
方法。 - さらに、レベル間誘電体(ILD)の層を、前記サーミスタの本体上に形成するステップと、前記ILDによって絶縁された前記サーミスタの本体に導体コンタクトを形成するステップと、を備える、請求項1に記載の方法。
- 前記サリサイド前駆体は、Pt、Cu、Co、Ni、W、Tiからなるグループから選択された少なくとも1つの金属を含む、請求項2に記載の方法。
- 前記サーミスタの前記本体は、5から100nmまでの間の厚さを有する、請求項2に記載の方法。
- 前記レベル間誘電体は、BPSGを含む、請求項2に記載の方法。
- 前記単結晶半導体はシリコンからなり、前記基板は、単結晶半導体の上側層と、単結晶半導体のバルク層の間に埋められた酸化物層を有するシリコン・オン・インシュレータ(SOI)基板である、請求項2に記載の方法。
- 前記分離領域は、トレンチ分離領域である、請求項6に記載の方法。
- 前記サリサイド前駆体は、前記サーミスタ本体だけが分離領域にオーバーレイされるように除去される、請求項1に記載の方法。
- 前記分離領域は、トレンチ分離領域である、請求項8に記載の方法。
- 前記サリサイド前駆体は、アニーリング・プロセスにより、前記上側層と反応して前記上側層に対して自己整合するサリサイドを形成する、請求項1に記載の方法。
- 前記サリサイド前駆体は、スパッタリングによって、前記分離領域ならびに前記単結晶半導体の上側層上に形成される、請求項1に記載の方法。
- さらに、第1および第2の導体パターンを前記コンタクトの対応する1つへ相互接続することを含む、請求項2に記載の方法。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/707,746 US7078259B2 (en) | 2004-01-08 | 2004-01-08 | Method for integrating thermistor |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005197743A JP2005197743A (ja) | 2005-07-21 |
JP4016035B2 true JP4016035B2 (ja) | 2007-12-05 |
Family
ID=34738963
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005000921A Expired - Fee Related JP4016035B2 (ja) | 2004-01-08 | 2005-01-05 | 集積化サーミスタに関する方法および構造 |
Country Status (3)
Country | Link |
---|---|
US (1) | US7078259B2 (ja) |
JP (1) | JP4016035B2 (ja) |
TW (1) | TWI325629B (ja) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005268578A (ja) * | 2004-03-19 | 2005-09-29 | Toudai Tlo Ltd | サーミスタ素子 |
US8129816B2 (en) * | 2007-06-20 | 2012-03-06 | Kabushiki Kaisha Toshiba | Semiconductor device and method of manufacturing the same |
US20090019170A1 (en) * | 2007-07-09 | 2009-01-15 | Felix Immanuel Wyss | System and method for secure communication configuration |
KR100928504B1 (ko) * | 2007-10-19 | 2009-11-26 | 주식회사 동부하이텍 | 반도체 소자 및 반도체 소자의 제조방법 |
US7890893B2 (en) * | 2008-01-10 | 2011-02-15 | International Business Machines Corporation | Design structure for semiconductor on-chip repair scheme for negative bias temperature instability |
US7838958B2 (en) * | 2008-01-10 | 2010-11-23 | International Business Machines Corporation | Semiconductor on-chip repair scheme for negative bias temperature instability |
US9022644B1 (en) | 2011-09-09 | 2015-05-05 | Sitime Corporation | Micromachined thermistor and temperature measurement circuitry, and method of manufacturing and operating same |
US10302504B1 (en) * | 2017-01-27 | 2019-05-28 | Xilinx, Inc. | On-die temperature sensing and digitization system |
CN118362218A (zh) * | 2023-01-18 | 2024-07-19 | 北京有竹居网络技术有限公司 | 芯片中的温度传感器系统和芯片 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6223077A (ja) | 1985-07-23 | 1987-01-31 | Sharp Corp | 定着装置の異常温度防止装置 |
US5847436A (en) | 1994-03-18 | 1998-12-08 | Kabushiki Kaisha Tokai Rika Denki Seisakusho | Bipolar transistor having integrated thermistor shunt |
JPH10173135A (ja) * | 1996-12-16 | 1998-06-26 | Matsushita Electron Corp | 半導体集積回路とその製造方法 |
US6297135B1 (en) * | 1997-01-29 | 2001-10-02 | Ultratech Stepper, Inc. | Method for forming silicide regions on an integrated device |
JPH1114449A (ja) * | 1997-06-20 | 1999-01-22 | Terumo Corp | 赤外線センサ |
US5975485A (en) | 1997-10-16 | 1999-11-02 | Industrial Technology Research Institute | Integrated micro thermistor type flow control module |
US6002132A (en) * | 1997-10-27 | 1999-12-14 | The United States Of America As Represented By The Secretary Of The Air Force | Thermionic thermal detector and detector array |
US5915199A (en) * | 1998-06-04 | 1999-06-22 | Sharp Microelectronics Technology, Inc. | Method for manufacturing a CMOS self-aligned strapped interconnection |
JP3409848B2 (ja) * | 2000-08-29 | 2003-05-26 | 日本電気株式会社 | 熱型赤外線検出器 |
ATE468610T1 (de) * | 2003-11-20 | 2010-06-15 | Sioptical Inc | Auf silizium basierender optischer schottky- barrieren-infrarotdetektor |
-
2004
- 2004-01-08 US US10/707,746 patent/US7078259B2/en not_active Expired - Fee Related
-
2005
- 2005-01-03 TW TW094100073A patent/TWI325629B/zh not_active IP Right Cessation
- 2005-01-05 JP JP2005000921A patent/JP4016035B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
TWI325629B (en) | 2010-06-01 |
JP2005197743A (ja) | 2005-07-21 |
TW200532715A (en) | 2005-10-01 |
US20050151213A1 (en) | 2005-07-14 |
US7078259B2 (en) | 2006-07-18 |
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