JP4006456B2 - 有機elディスプレイの製造方法 - Google Patents
有機elディスプレイの製造方法 Download PDFInfo
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- JP4006456B2 JP4006456B2 JP2005243771A JP2005243771A JP4006456B2 JP 4006456 B2 JP4006456 B2 JP 4006456B2 JP 2005243771 A JP2005243771 A JP 2005243771A JP 2005243771 A JP2005243771 A JP 2005243771A JP 4006456 B2 JP4006456 B2 JP 4006456B2
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- JP
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- Prior art keywords
- organic
- film
- chamber
- sealing film
- sealing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- 238000004519 manufacturing process Methods 0.000 title claims description 19
- 238000007789 sealing Methods 0.000 claims description 106
- 239000000758 substrate Substances 0.000 claims description 43
- 238000010030 laminating Methods 0.000 claims description 8
- 230000001678 irradiating effect Effects 0.000 claims description 7
- 239000010408 film Substances 0.000 description 153
- 238000000034 method Methods 0.000 description 45
- 238000012545 processing Methods 0.000 description 40
- 239000010410 layer Substances 0.000 description 36
- 239000002184 metal Substances 0.000 description 26
- 229910052751 metal Inorganic materials 0.000 description 26
- 239000011521 glass Substances 0.000 description 12
- 239000010409 thin film Substances 0.000 description 12
- 238000004544 sputter deposition Methods 0.000 description 11
- 238000012546 transfer Methods 0.000 description 11
- 238000000151 deposition Methods 0.000 description 10
- 238000004140 cleaning Methods 0.000 description 9
- 238000010438 heat treatment Methods 0.000 description 9
- 230000015572 biosynthetic process Effects 0.000 description 8
- 230000008021 deposition Effects 0.000 description 8
- 239000012044 organic layer Substances 0.000 description 7
- 230000002093 peripheral effect Effects 0.000 description 7
- 238000002347 injection Methods 0.000 description 6
- 239000007924 injection Substances 0.000 description 6
- 229920001187 thermosetting polymer Polymers 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000011368 organic material Substances 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 238000000206 photolithography Methods 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- TVIVIEFSHFOWTE-UHFFFAOYSA-K tri(quinolin-8-yloxy)alumane Chemical compound [Al+3].C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1 TVIVIEFSHFOWTE-UHFFFAOYSA-K 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 4
- 230000006866 deterioration Effects 0.000 description 3
- 238000003618 dip coating Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 239000012528 membrane Substances 0.000 description 3
- 239000007769 metal material Substances 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- 229910003271 Ni-Fe Inorganic materials 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 239000002019 doping agent Substances 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 230000005525 hole transport Effects 0.000 description 2
- 230000006698 induction Effects 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- IBHBKWKFFTZAHE-UHFFFAOYSA-N n-[4-[4-(n-naphthalen-1-ylanilino)phenyl]phenyl]-n-phenylnaphthalen-1-amine Chemical compound C1=CC=CC=C1N(C=1C2=CC=CC=C2C=CC=1)C1=CC=C(C=2C=CC(=CC=2)N(C=2C=CC=CC=2)C=2C3=CC=CC=C3C=CC=2)C=C1 IBHBKWKFFTZAHE-UHFFFAOYSA-N 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- 238000003672 processing method Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 238000003848 UV Light-Curing Methods 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000001723 curing Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Landscapes
- Electroluminescent Light Sources (AREA)
Description
12 発光部
13 第一封止膜
14 端子部
15 給電用開口部
16 駆動回路
17 端子
18 第二封止膜
Claims (3)
- 基板上に陽極,有機発光層,陰極を順次積層して形成される発光部上に、この発光部を封止する第一封止膜をマスクを用いずに基板の全表面に成膜し、前記陽極及び陰極の端子部上に積層された前記第一封止膜の一部にレーザー光を照射することで、この端子部上の第一封止膜を除去して給電用開口部を形成し、この給電用開口部から露出する端子部に前記発光部駆動用の駆動回路の端子を接続して駆動回路を実装した後、この給電用開口部及び前記第一封止膜を完全に隠蔽するように基板上に第二封止膜を成膜することを特徴とする有機ELディスプレイの製造方法。
- 前記第二封止膜をマスクを用いずに基板の全表面に成膜することを特徴とする請求項1記載の有機ELディスプレイの製造方法。
- 前記第一封止膜若しくは前記第二封止膜は、一若しくは複数層の有機膜または一若しくは複数層の無機膜或いは一若しくは複数の無機膜と有機膜とを夫々積層して成ることを特徴とする請求項1,2のいずれか1項に記載の有機ELディスプレイの製造方法。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005243771A JP4006456B2 (ja) | 2005-08-25 | 2005-08-25 | 有機elディスプレイの製造方法 |
PCT/JP2006/316373 WO2007023789A1 (ja) | 2005-08-25 | 2006-08-22 | 有機el素子 |
KR1020087003595A KR101234948B1 (ko) | 2005-08-25 | 2006-08-22 | 유기 el 소자의 제조 방법 |
TW095131019A TWI429323B (zh) | 2005-08-25 | 2006-08-23 | Organic electroluminescent element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005243771A JP4006456B2 (ja) | 2005-08-25 | 2005-08-25 | 有機elディスプレイの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007059229A JP2007059229A (ja) | 2007-03-08 |
JP4006456B2 true JP4006456B2 (ja) | 2007-11-14 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005243771A Expired - Fee Related JP4006456B2 (ja) | 2005-08-25 | 2005-08-25 | 有機elディスプレイの製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4006456B2 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10014489B2 (en) | 2014-10-15 | 2018-07-03 | Sharp Kabushiki Kaisha | Electroluminescent device and manufacturing method |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010034007A (ja) * | 2008-07-31 | 2010-02-12 | Sony Corp | 転写シートおよび転写シートの形成方法 |
JP5909841B2 (ja) | 2011-11-22 | 2016-04-27 | 株式会社Joled | 表示パネルの製造方法、表示パネルおよび表示装置 |
-
2005
- 2005-08-25 JP JP2005243771A patent/JP4006456B2/ja not_active Expired - Fee Related
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10014489B2 (en) | 2014-10-15 | 2018-07-03 | Sharp Kabushiki Kaisha | Electroluminescent device and manufacturing method |
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JP2007059229A (ja) | 2007-03-08 |
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