JP3996856B2 - 試料作製装置と試料作製方法 - Google Patents

試料作製装置と試料作製方法 Download PDF

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Publication number
JP3996856B2
JP3996856B2 JP2003006505A JP2003006505A JP3996856B2 JP 3996856 B2 JP3996856 B2 JP 3996856B2 JP 2003006505 A JP2003006505 A JP 2003006505A JP 2003006505 A JP2003006505 A JP 2003006505A JP 3996856 B2 JP3996856 B2 JP 3996856B2
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JP
Japan
Prior art keywords
sample
probe
sample preparation
fine line
tip
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2003006505A
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English (en)
Japanese (ja)
Other versions
JP2004219236A (ja
JP2004219236A5 (enExample
Inventor
宗行 福田
聡 富松
広康 志知
修 渡辺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
Original Assignee
Hitachi High Technologies Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi High Technologies Corp filed Critical Hitachi High Technologies Corp
Priority to JP2003006505A priority Critical patent/JP3996856B2/ja
Priority to US10/603,720 priority patent/US6894287B2/en
Priority to FR0308792A priority patent/FR2849955B1/fr
Publication of JP2004219236A publication Critical patent/JP2004219236A/ja
Publication of JP2004219236A5 publication Critical patent/JP2004219236A5/ja
Application granted granted Critical
Publication of JP3996856B2 publication Critical patent/JP3996856B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching for microworking, e. g. etching of gratings or trimming of electrical components
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2003006505A 2003-01-15 2003-01-15 試料作製装置と試料作製方法 Expired - Fee Related JP3996856B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2003006505A JP3996856B2 (ja) 2003-01-15 2003-01-15 試料作製装置と試料作製方法
US10/603,720 US6894287B2 (en) 2003-01-15 2003-06-26 Microfabrication apparatus and microfabrication method
FR0308792A FR2849955B1 (fr) 2003-01-15 2003-07-18 Dispositif de micro-fabrication et procede de micro-fabrication

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003006505A JP3996856B2 (ja) 2003-01-15 2003-01-15 試料作製装置と試料作製方法

Publications (3)

Publication Number Publication Date
JP2004219236A JP2004219236A (ja) 2004-08-05
JP2004219236A5 JP2004219236A5 (enExample) 2006-01-19
JP3996856B2 true JP3996856B2 (ja) 2007-10-24

Family

ID=32588506

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003006505A Expired - Fee Related JP3996856B2 (ja) 2003-01-15 2003-01-15 試料作製装置と試料作製方法

Country Status (3)

Country Link
US (1) US6894287B2 (enExample)
JP (1) JP3996856B2 (enExample)
FR (1) FR2849955B1 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7356900B2 (en) * 2003-10-27 2008-04-15 Sii Nanotechnology Inc. Manipulator needle portion repairing method
US9423693B1 (en) 2005-05-10 2016-08-23 Victor B. Kley In-plane scanning probe microscopy tips and tools for wafers and substrates with diverse designs on one wafer or substrate
US7571638B1 (en) * 2005-05-10 2009-08-11 Kley Victor B Tool tips with scanning probe microscopy and/or atomic force microscopy applications
DE102008042179B9 (de) * 2008-09-17 2013-10-10 Carl Zeiss Microscopy Gmbh Verfahren zur Analyse einer Probe
JP5152111B2 (ja) * 2009-06-22 2013-02-27 新日鐵住金株式会社 集束イオンビーム加工装置用プローブ、プローブ装置、及びプローブの製造方法
EP2560186A4 (en) * 2010-04-16 2014-12-24 Hitachi High Tech Corp ION BEAM DEVICE AND ION BEAM PROCESSING METHOD
US9778572B1 (en) 2013-03-15 2017-10-03 Victor B. Kley In-plane scanning probe microscopy tips and tools for wafers and substrates with diverse designs on one wafer or substrate
CN208969129U (zh) * 2018-09-29 2019-06-11 Fei公司 晶片、微操纵器、用于制备微操纵器的系统

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999005506A1 (fr) * 1997-07-22 1999-02-04 Hitachi, Ltd. Procede et dispositif de preparation d'echantillons
JP4200665B2 (ja) * 2001-05-08 2008-12-24 株式会社日立製作所 加工装置

Also Published As

Publication number Publication date
FR2849955B1 (fr) 2015-05-15
US6894287B2 (en) 2005-05-17
FR2849955A1 (fr) 2004-07-16
JP2004219236A (ja) 2004-08-05
US20040135096A1 (en) 2004-07-15

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