JP3969907B2 - プラズマ処理装置 - Google Patents

プラズマ処理装置 Download PDF

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Publication number
JP3969907B2
JP3969907B2 JP25962799A JP25962799A JP3969907B2 JP 3969907 B2 JP3969907 B2 JP 3969907B2 JP 25962799 A JP25962799 A JP 25962799A JP 25962799 A JP25962799 A JP 25962799A JP 3969907 B2 JP3969907 B2 JP 3969907B2
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JP
Japan
Prior art keywords
gas supply
substrate
gas
vacuum chamber
plasma processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP25962799A
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English (en)
Japanese (ja)
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JP2001085409A5 (enExample
JP2001085409A (ja
Inventor
真二 杉山
聡 森
清彦 高木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Panasonic Holdings Corp
Original Assignee
Panasonic Corp
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Panasonic Corp, Matsushita Electric Industrial Co Ltd filed Critical Panasonic Corp
Priority to JP25962799A priority Critical patent/JP3969907B2/ja
Publication of JP2001085409A publication Critical patent/JP2001085409A/ja
Publication of JP2001085409A5 publication Critical patent/JP2001085409A5/ja
Application granted granted Critical
Publication of JP3969907B2 publication Critical patent/JP3969907B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
JP25962799A 1999-09-14 1999-09-14 プラズマ処理装置 Expired - Lifetime JP3969907B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25962799A JP3969907B2 (ja) 1999-09-14 1999-09-14 プラズマ処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25962799A JP3969907B2 (ja) 1999-09-14 1999-09-14 プラズマ処理装置

Publications (3)

Publication Number Publication Date
JP2001085409A JP2001085409A (ja) 2001-03-30
JP2001085409A5 JP2001085409A5 (enExample) 2005-09-02
JP3969907B2 true JP3969907B2 (ja) 2007-09-05

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ID=17336714

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25962799A Expired - Lifetime JP3969907B2 (ja) 1999-09-14 1999-09-14 プラズマ処理装置

Country Status (1)

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JP (1) JP3969907B2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20020080014A (ko) * 2001-04-10 2002-10-23 주식회사 에이티씨 플라즈마 처리 장치
JP4185483B2 (ja) 2004-10-22 2008-11-26 シャープ株式会社 プラズマ処理装置
JP2006196681A (ja) 2005-01-13 2006-07-27 Sharp Corp プラズマ処理装置および同装置により製造された半導体素子
JP4584722B2 (ja) * 2005-01-13 2010-11-24 シャープ株式会社 プラズマ処理装置および同装置により製造された半導体素子
CN101258786B (zh) * 2005-09-01 2012-08-29 松下电器产业株式会社 等离子体处理设备

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Publication number Publication date
JP2001085409A (ja) 2001-03-30

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