JP3962061B2 - 目標物に対する膜の形成方法及び装置 - Google Patents
目標物に対する膜の形成方法及び装置 Download PDFInfo
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- JP3962061B2 JP3962061B2 JP2005015961A JP2005015961A JP3962061B2 JP 3962061 B2 JP3962061 B2 JP 3962061B2 JP 2005015961 A JP2005015961 A JP 2005015961A JP 2005015961 A JP2005015961 A JP 2005015961A JP 3962061 B2 JP3962061 B2 JP 3962061B2
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- Prior art keywords
- film
- target
- particles
- gas
- hydroxyapatite particles
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C24/00—Coating starting from inorganic powder
- C23C24/02—Coating starting from inorganic powder by application of pressure only
- C23C24/04—Impact or kinetic deposition of particles
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Dental Tools And Instruments Or Auxiliary Dental Instruments (AREA)
Description
2 セラミックス粒子
3 供給管
4 接続管
5 ノズル
6 開口部
7 導入管
8 基板
9 サイクロン集塵器
10 粒子噴射装置
11 粒子供給管
12 高速電磁弁
13 タンク
14 粒子
15 粒子供給部
16 混合室
17 導入口
18 粒子噴射ノズル
19 パソコン
20 人体の歯
21 周辺部
22 セラミックス粒子
23 窩洞部
24 HA粒子
25 HA膜
26 レジン粒子
27 レジンの混合物
Claims (3)
- ハイドロキシアパタイト粒子を10μm以下の粒径に分級せしめる分級装置と、ノズル先端を歯目標物に対して1mm〜2mm離間しているガス噴射ノズルと、上記分級装置により分級したハイドロキシアパタイト粒子を、加速ガスにより100m/s〜200m/sに加速して上記歯目標物上に噴射せしめる手段とよりなり、常温大気圧下において、上記噴射により上記目標物上に膜が形成されることを特徴とする目標物に対する膜の形成装置。
- 10μm以下の粒径のハイドロキシアパタイト粒子を選別する工程と、
常温大気圧下において、ガス噴射ノズル先端と歯目標物の距離を1mm〜2mmとして、加速ガスにより上記選別したハイドロキシアパタイト粒子を100m/s〜200m/sに加速して上記歯目標物上に噴射せしめ、上記目標物上に膜を形成せしめる工程と
より成ることを特徴とする目標物に対する膜の形成方法。 - 10μm以下の粒径のハイドロキシアパタイト粒子を選別する第一の工程と、
常温大気圧下において、ガス噴射ノズル先端と歯目標物の距離を1mm〜2mmとして、加速ガスにより上記選別したハイドロキシアパタイト粒子を100m/s〜200m/sに加速して歯目標物上に噴射せしめ、上記目標物上に第1の膜を形成せしめる第二の工程と、
常温大気圧下において、ガス噴射ノズル先端と歯目標物の距離を1mm〜2mmとして、加速ガスにより上記選別したハイドロキシアパタイト粒子とレジン粒子とを100m/s〜200m/sに加速して上記第1の膜上に噴射せしめ、上記第1の膜上にハイドロキシアパタイト粒子とレジン粒子の混合物の第2の膜を形成せしめる第三の工程と、
上記第三の工程におけるハイドロキシアパタイト粒子の量に対するレジン粒子の量の割合をより増やして、常温大気圧下において、ガス噴射ノズル先端と歯目標物の距離を1mm〜2mmとして、加速ガスにより上記選別したハイドロキシアパタイト粒子とレジン粒子とを100m/s〜200m/sに加速して上記混合物の第2の膜上に噴射せしめ、上記混合物の第2の膜上にハイドロキシアパタイト粒子とレジン粒子の混合物の第3の膜を形成せしめる第四の工程と、
上記第四の工程を繰り返して、上記歯目標物上にハイドロキシアパタイト粒子の量に対するレジン粒子の量の割合が徐々に増える混合物の膜を形成せしめる第五の工程と、
上記混合膜上に充填材を付着せしめる第六の工程と
より成ることを特徴とする目標物に対する膜の形成方法。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005015961A JP3962061B2 (ja) | 2005-01-24 | 2005-01-24 | 目標物に対する膜の形成方法及び装置 |
PCT/JP2006/301259 WO2006078063A1 (ja) | 2005-01-24 | 2006-01-20 | 目標物に対する膜の形成方法及び装置 |
Applications Claiming Priority (1)
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JP2005015961A JP3962061B2 (ja) | 2005-01-24 | 2005-01-24 | 目標物に対する膜の形成方法及び装置 |
Publications (3)
Publication Number | Publication Date |
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JP2006200033A JP2006200033A (ja) | 2006-08-03 |
JP2006200033A5 JP2006200033A5 (ja) | 2006-09-14 |
JP3962061B2 true JP3962061B2 (ja) | 2007-08-22 |
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JP2005015961A Active JP3962061B2 (ja) | 2005-01-24 | 2005-01-24 | 目標物に対する膜の形成方法及び装置 |
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JP (1) | JP3962061B2 (ja) |
WO (1) | WO2006078063A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11007125B2 (en) | 2015-07-13 | 2021-05-18 | Kabushiki Kaisha Sangi | Tooth-surface-membrane-forming powder containing sintered apatite |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6417596B2 (ja) * | 2013-06-05 | 2018-11-07 | 株式会社サンギ | 粉体噴射用ハンドピース |
JP6284222B2 (ja) * | 2013-11-28 | 2018-02-28 | 株式会社サンギ | 粉体流通装置 |
JP6726486B2 (ja) * | 2015-03-10 | 2020-07-22 | シチズン時計株式会社 | 反射基板の製造方法及び反射基板 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2003277948A (ja) * | 2000-10-23 | 2003-10-02 | National Institute Of Advanced Industrial & Technology | 複合構造物およびその製造方法 |
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2005
- 2005-01-24 JP JP2005015961A patent/JP3962061B2/ja active Active
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2006
- 2006-01-20 WO PCT/JP2006/301259 patent/WO2006078063A1/ja not_active Application Discontinuation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11007125B2 (en) | 2015-07-13 | 2021-05-18 | Kabushiki Kaisha Sangi | Tooth-surface-membrane-forming powder containing sintered apatite |
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Publication number | Publication date |
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JP2006200033A (ja) | 2006-08-03 |
WO2006078063A1 (ja) | 2006-07-27 |
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