JP3961749B2 - 基板洗浄装置及び基板処理装置、基板処理方法 - Google Patents
基板洗浄装置及び基板処理装置、基板処理方法 Download PDFInfo
- Publication number
- JP3961749B2 JP3961749B2 JP2000242905A JP2000242905A JP3961749B2 JP 3961749 B2 JP3961749 B2 JP 3961749B2 JP 2000242905 A JP2000242905 A JP 2000242905A JP 2000242905 A JP2000242905 A JP 2000242905A JP 3961749 B2 JP3961749 B2 JP 3961749B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- cleaning
- unit
- processed
- cleaning tank
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004140 cleaning Methods 0.000 title claims description 192
- 239000000758 substrate Substances 0.000 title claims description 168
- 238000003672 processing method Methods 0.000 title description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 69
- 238000005498 polishing Methods 0.000 claims description 35
- 239000003595 mist Substances 0.000 claims description 27
- 239000007788 liquid Substances 0.000 claims description 22
- 230000007246 mechanism Effects 0.000 claims description 20
- 238000001035 drying Methods 0.000 claims description 17
- 238000002347 injection Methods 0.000 claims description 13
- 239000007924 injection Substances 0.000 claims description 13
- 241001125929 Trisopterus luscus Species 0.000 claims description 5
- 238000000034 method Methods 0.000 claims description 4
- 230000007723 transport mechanism Effects 0.000 claims description 3
- 238000001514 detection method Methods 0.000 claims description 2
- 238000007599 discharging Methods 0.000 claims 1
- 239000000126 substance Substances 0.000 description 44
- 239000000243 solution Substances 0.000 description 11
- 229910021642 ultra pure water Inorganic materials 0.000 description 9
- 239000012498 ultrapure water Substances 0.000 description 9
- 238000005406 washing Methods 0.000 description 7
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 6
- 238000005192 partition Methods 0.000 description 6
- 238000009792 diffusion process Methods 0.000 description 4
- 239000004744 fabric Substances 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 230000032258 transport Effects 0.000 description 2
- 230000003750 conditioning effect Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
Images
Landscapes
- Cleaning In General (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000242905A JP3961749B2 (ja) | 2000-08-10 | 2000-08-10 | 基板洗浄装置及び基板処理装置、基板処理方法 |
| US09/915,289 US6616512B2 (en) | 2000-07-28 | 2001-07-27 | Substrate cleaning apparatus and substrate polishing apparatus with substrate cleaning apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000242905A JP3961749B2 (ja) | 2000-08-10 | 2000-08-10 | 基板洗浄装置及び基板処理装置、基板処理方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002057137A JP2002057137A (ja) | 2002-02-22 |
| JP2002057137A5 JP2002057137A5 (US06573293-20030603-C00009.png) | 2005-08-04 |
| JP3961749B2 true JP3961749B2 (ja) | 2007-08-22 |
Family
ID=18733846
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000242905A Expired - Lifetime JP3961749B2 (ja) | 2000-07-28 | 2000-08-10 | 基板洗浄装置及び基板処理装置、基板処理方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3961749B2 (US06573293-20030603-C00009.png) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100423206C (zh) * | 2003-07-02 | 2008-10-01 | 上海思恩电子技术有限公司 | 用加热化学气体产生的雾状化学剂处理基片的方法及系统 |
| JP4733616B2 (ja) * | 2006-11-01 | 2011-07-27 | 積水化学工業株式会社 | 表面処理装置 |
| JP5844681B2 (ja) * | 2011-07-06 | 2016-01-20 | 東京エレクトロン株式会社 | 基板液処理装置及び基板液処理方法 |
| CN102989736B (zh) * | 2012-11-26 | 2015-03-18 | 北京七星华创电子股份有限公司 | 一种排风装置 |
| JP6338275B2 (ja) * | 2014-06-27 | 2018-06-06 | 株式会社Ｓｃｒｅｅｎホールディングス | 基板処理方法および基板処理装置 |
| CN110587471B (zh) * | 2019-10-22 | 2021-08-27 | 武汉新芯集成电路制造有限公司 | 一种自清洁防护罩 |
| CN112005890B (zh) * | 2020-09-14 | 2022-04-15 | 王芝林 | 一种生态养猪场用室内水帘风机降温系统 |
| JP2022079045A (ja) * | 2020-11-16 | 2022-05-26 | 株式会社ディスコ | 加工装置 |
-
2000
- 2000-08-10 JP JP2000242905A patent/JP3961749B2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JP2002057137A (ja) | 2002-02-22 |
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