JP3919887B2 - 化学増幅型ポジ型レジスト組成物 - Google Patents

化学増幅型ポジ型レジスト組成物 Download PDF

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Publication number
JP3919887B2
JP3919887B2 JP19897897A JP19897897A JP3919887B2 JP 3919887 B2 JP3919887 B2 JP 3919887B2 JP 19897897 A JP19897897 A JP 19897897A JP 19897897 A JP19897897 A JP 19897897A JP 3919887 B2 JP3919887 B2 JP 3919887B2
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JP
Japan
Prior art keywords
group
acid
resist composition
weight
positive resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP19897897A
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English (en)
Japanese (ja)
Other versions
JPH1090883A (ja
JPH1090883A5 (enExample
Inventor
和行 新田
和史 佐藤
晃義 山崎
与日 坂井
寿昌 中山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP19897897A priority Critical patent/JP3919887B2/ja
Publication of JPH1090883A publication Critical patent/JPH1090883A/ja
Publication of JPH1090883A5 publication Critical patent/JPH1090883A5/ja
Application granted granted Critical
Publication of JP3919887B2 publication Critical patent/JP3919887B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00—Technologies relating to chemical industry
    • Y02P20/50—Improvements relating to the production of bulk chemicals
    • Y02P20/55—Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups

Landscapes

  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
JP19897897A 1996-07-24 1997-07-24 化学増幅型ポジ型レジスト組成物 Expired - Fee Related JP3919887B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19897897A JP3919887B2 (ja) 1996-07-24 1997-07-24 化学増幅型ポジ型レジスト組成物

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP19509996 1996-07-24
JP8-195099 1996-07-24
JP19897897A JP3919887B2 (ja) 1996-07-24 1997-07-24 化学増幅型ポジ型レジスト組成物

Publications (3)

Publication Number Publication Date
JPH1090883A JPH1090883A (ja) 1998-04-10
JPH1090883A5 JPH1090883A5 (enExample) 2004-10-21
JP3919887B2 true JP3919887B2 (ja) 2007-05-30

Family

ID=26508925

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19897897A Expired - Fee Related JP3919887B2 (ja) 1996-07-24 1997-07-24 化学増幅型ポジ型レジスト組成物

Country Status (1)

Country Link
JP (1) JP3919887B2 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4991074B2 (ja) * 2000-02-27 2012-08-01 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． 光反応性酸発生剤およびそれを含有してなるフォトレジスト
TW200401164A (en) * 2002-03-01 2004-01-16 Shipley Co Llc Photoresist compositions

Also Published As

Publication number Publication date
JPH1090883A (ja) 1998-04-10

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