JPH1090883A5 - - Google Patents

Info

Publication number
JPH1090883A5
JPH1090883A5 JP1997198978A JP19897897A JPH1090883A5 JP H1090883 A5 JPH1090883 A5 JP H1090883A5 JP 1997198978 A JP1997198978 A JP 1997198978A JP 19897897 A JP19897897 A JP 19897897A JP H1090883 A5 JPH1090883 A5 JP H1090883A5
Authority
JP
Japan
Prior art keywords
group
weight
resist composition
positive resist
chemically amplified
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1997198978A
Other languages
English (en)
Japanese (ja)
Other versions
JPH1090883A (ja
JP3919887B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP19897897A priority Critical patent/JP3919887B2/ja
Priority claimed from JP19897897A external-priority patent/JP3919887B2/ja
Publication of JPH1090883A publication Critical patent/JPH1090883A/ja
Publication of JPH1090883A5 publication Critical patent/JPH1090883A5/ja
Application granted granted Critical
Publication of JP3919887B2 publication Critical patent/JP3919887B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP19897897A 1996-07-24 1997-07-24 化学増幅型ポジ型レジスト組成物 Expired - Fee Related JP3919887B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19897897A JP3919887B2 (ja) 1996-07-24 1997-07-24 化学増幅型ポジ型レジスト組成物

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP19509996 1996-07-24
JP8-195099 1996-07-24
JP19897897A JP3919887B2 (ja) 1996-07-24 1997-07-24 化学増幅型ポジ型レジスト組成物

Publications (3)

Publication Number Publication Date
JPH1090883A JPH1090883A (ja) 1998-04-10
JPH1090883A5 true JPH1090883A5 (enExample) 2004-10-21
JP3919887B2 JP3919887B2 (ja) 2007-05-30

Family

ID=26508925

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19897897A Expired - Fee Related JP3919887B2 (ja) 1996-07-24 1997-07-24 化学増幅型ポジ型レジスト組成物

Country Status (1)

Country Link
JP (1) JP3919887B2 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4991074B2 (ja) * 2000-02-27 2012-08-01 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． 光反応性酸発生剤およびそれを含有してなるフォトレジスト
TW200401164A (en) * 2002-03-01 2004-01-16 Shipley Co Llc Photoresist compositions

Similar Documents

Publication Publication Date Title
JP3921748B2 (ja) フォトレジスト組成物
JP3662774B2 (ja) ポジ型レジスト組成物
JP2006259582A (ja) ネガ型レジスト組成物およびレジストパターン形成方法
JP4727092B2 (ja) 化学増幅型レジスト組成物
KR100577039B1 (ko) 포토레지스트 패턴의 형성방법 및 포토레지스트 적층체
RU2001134613A (ru) Аморфные нитроэфиры и их фармацевтические композиции
US7544460B2 (en) Resist composition, multilayer body, and method for forming resist pattern
JP4023003B2 (ja) 化学増幅型ポジ型フォトレジスト組成物
JP3771739B2 (ja) ポジ型レジスト組成物
JPH1180578A5 (enExample)
JPH1090883A5 (enExample)
JP3711198B2 (ja) レジストパターンの形成方法
JP2002275215A5 (enExample)
CN1366212A (zh) 化学增强型正光刻胶组合物
JP3638086B2 (ja) ポジ型レジスト組成物及びそれを用いたレジストパターン形成方法
JPH1090884A5 (enExample)
JP3975535B2 (ja) アセト酢酸誘導体、その製法及び用途
JP4754265B2 (ja) ポジ型レジスト組成物およびレジストパターン形成方法
JP3934816B2 (ja) ディフェクト抑制ポジ型レジスト塗布液
KR970002469A (ko) 화학감광형 포지티브형 포토레지스트조성물
JP3711230B2 (ja) 多層型感光材料
US7422839B2 (en) Resin for positive resist composition, and positive resist composition using the same, laminate and method for forming resist pattern
JP3973151B2 (ja) 化学増幅型ポジ型レジスト組成物
WO2007072702A1 (ja) レジスト組成物およびレジスト組成物の製造方法
US20050042540A1 (en) Positive resist composition and method of forming resist pattern