JP3911929B2 - 液晶表示装置の製造方法 - Google Patents
液晶表示装置の製造方法 Download PDFInfo
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- JP3911929B2 JP3911929B2 JP30277899A JP30277899A JP3911929B2 JP 3911929 B2 JP3911929 B2 JP 3911929B2 JP 30277899 A JP30277899 A JP 30277899A JP 30277899 A JP30277899 A JP 30277899A JP 3911929 B2 JP3911929 B2 JP 3911929B2
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Images
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- Liquid Crystal (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Thin Film Transistor (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30277899A JP3911929B2 (ja) | 1999-10-25 | 1999-10-25 | 液晶表示装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30277899A JP3911929B2 (ja) | 1999-10-25 | 1999-10-25 | 液晶表示装置の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001125138A JP2001125138A (ja) | 2001-05-11 |
| JP2001125138A5 JP2001125138A5 (enExample) | 2005-04-07 |
| JP3911929B2 true JP3911929B2 (ja) | 2007-05-09 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP30277899A Expired - Fee Related JP3911929B2 (ja) | 1999-10-25 | 1999-10-25 | 液晶表示装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3911929B2 (enExample) |
Families Citing this family (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8415208B2 (en) | 2001-07-16 | 2013-04-09 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and peeling off method and method of manufacturing semiconductor device |
| TW554398B (en) | 2001-08-10 | 2003-09-21 | Semiconductor Energy Lab | Method of peeling off and method of manufacturing semiconductor device |
| TW558743B (en) | 2001-08-22 | 2003-10-21 | Semiconductor Energy Lab | Peeling method and method of manufacturing semiconductor device |
| US6953735B2 (en) | 2001-12-28 | 2005-10-11 | Semiconductor Energy Laboratory Co., Ltd. | Method for fabricating a semiconductor device by transferring a layer to a support with curvature |
| JP4186502B2 (ja) * | 2002-04-22 | 2008-11-26 | ソニー株式会社 | 薄膜デバイスの製造方法、薄膜デバイスおよび表示装置 |
| JP3965562B2 (ja) * | 2002-04-22 | 2007-08-29 | セイコーエプソン株式会社 | デバイスの製造方法、デバイス、電気光学装置及び電子機器 |
| EP1363319B1 (en) | 2002-05-17 | 2009-01-07 | Semiconductor Energy Laboratory Co., Ltd. | Method of transferring an object and method of manufacturing a semiconductor device |
| US7183582B2 (en) * | 2002-05-29 | 2007-02-27 | Seiko Epson Coporation | Electro-optical device and method of manufacturing the same, element driving device and method of manufacturing the same, element substrate, and electronic apparatus |
| KR101005569B1 (ko) | 2002-12-27 | 2011-01-05 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치의 제조방법 |
| JP4373085B2 (ja) | 2002-12-27 | 2009-11-25 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法、剥離方法及び転写方法 |
| KR101033797B1 (ko) | 2003-01-15 | 2011-05-13 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 박리 방법 및 그 박리 방법을 사용한 표시 장치의 제작 방법 |
| JP4151420B2 (ja) | 2003-01-23 | 2008-09-17 | セイコーエプソン株式会社 | デバイスの製造方法 |
| JP2004349513A (ja) | 2003-05-22 | 2004-12-09 | Seiko Epson Corp | 薄膜回路装置及びその製造方法、並びに電気光学装置、電子機器 |
| FR2870988B1 (fr) * | 2004-06-01 | 2006-08-11 | Michel Bruel | Procede de realisation d'une structure multi-couches comportant, en profondeur, une couche de separation |
| JP2004341557A (ja) * | 2004-08-23 | 2004-12-02 | Semiconductor Energy Lab Co Ltd | 半導体装置の作製方法 |
| JP2006120726A (ja) | 2004-10-19 | 2006-05-11 | Seiko Epson Corp | 薄膜装置の製造方法、電気光学装置、及び電子機器 |
| US7972910B2 (en) | 2005-06-03 | 2011-07-05 | Semiconductor Energy Laboratory Co., Ltd. | Manufacturing method of integrated circuit device including thin film transistor |
| US7820495B2 (en) | 2005-06-30 | 2010-10-26 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing semiconductor device |
| JP4610515B2 (ja) * | 2006-04-21 | 2011-01-12 | 株式会社半導体エネルギー研究所 | 剥離方法 |
| JP4894415B2 (ja) * | 2006-08-25 | 2012-03-14 | 凸版印刷株式会社 | 液晶表示装置の製造方法 |
| US7968388B2 (en) | 2007-08-31 | 2011-06-28 | Seiko Epson Corporation | Thin-film device, method for manufacturing thin-film device, and display |
| JP2016038490A (ja) * | 2014-08-08 | 2016-03-22 | 株式会社半導体エネルギー研究所 | 表示パネル、表示モジュール、及び電子機器 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2929704B2 (ja) * | 1990-11-01 | 1999-08-03 | 松下電器産業株式会社 | 液晶表示用基板の製造方法 |
| FR2679057B1 (fr) * | 1991-07-11 | 1995-10-20 | Morin Francois | Structure d'ecran a cristal liquide, a matrice active et a haute definition. |
| JPH09197405A (ja) * | 1995-11-14 | 1997-07-31 | Sharp Corp | 視角特性制御型液晶表示装置 |
| JPH1126733A (ja) * | 1997-07-03 | 1999-01-29 | Seiko Epson Corp | 薄膜デバイスの転写方法、薄膜デバイス、薄膜集積回路装置，アクティブマトリクス基板、液晶表示装置および電子機器 |
| JPH11243209A (ja) * | 1998-02-25 | 1999-09-07 | Seiko Epson Corp | 薄膜デバイスの転写方法、薄膜デバイス、薄膜集積回路装置、アクティブマトリクス基板、液晶表示装置および電子機器 |
-
1999
- 1999-10-25 JP JP30277899A patent/JP3911929B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2001125138A (ja) | 2001-05-11 |
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