JP3800189B2 - 半透過反射基板、その製造方法、電気光学装置および電子機器 - Google Patents

半透過反射基板、その製造方法、電気光学装置および電子機器 Download PDF

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Publication number
JP3800189B2
JP3800189B2 JP2003064033A JP2003064033A JP3800189B2 JP 3800189 B2 JP3800189 B2 JP 3800189B2 JP 2003064033 A JP2003064033 A JP 2003064033A JP 2003064033 A JP2003064033 A JP 2003064033A JP 3800189 B2 JP3800189 B2 JP 3800189B2
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Japan
Prior art keywords
substrate
light
layer
transflective
uneven
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Expired - Fee Related
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JP2003064033A
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Japanese (ja)
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JP2004272006A (ja
JP2004272006A5 (enExample
Inventor
俊裕 大竹
睦 松尾
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Seiko Epson Corp
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Seiko Epson Corp
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Priority to JP2003064033A priority Critical patent/JP3800189B2/ja
Priority to US10/733,176 priority patent/US7088404B2/en
Priority to KR1020030090042A priority patent/KR100589801B1/ko
Priority to CNB2003101213312A priority patent/CN1331007C/zh
Priority to TW092135044A priority patent/TWI250332B/zh
Publication of JP2004272006A publication Critical patent/JP2004272006A/ja
Publication of JP2004272006A5 publication Critical patent/JP2004272006A5/ja
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Publication of JP3800189B2 publication Critical patent/JP3800189B2/ja
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  • Liquid Crystal (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Electroluminescent Light Sources (AREA)
JP2003064033A 2002-12-12 2003-03-10 半透過反射基板、その製造方法、電気光学装置および電子機器 Expired - Fee Related JP3800189B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2003064033A JP3800189B2 (ja) 2003-03-10 2003-03-10 半透過反射基板、その製造方法、電気光学装置および電子機器
US10/733,176 US7088404B2 (en) 2002-12-12 2003-12-11 Substrate for electro-optical device having particular concave portions and convex portions and flat section on the surface of a base layer
KR1020030090042A KR100589801B1 (ko) 2002-12-12 2003-12-11 전기 광학 장치용 기판, 전기 광학 장치용 기판의 제조방법, 전기 광학 장치, 전기 광학 장치의 제조 방법, 전자기기 및 마스크
CNB2003101213312A CN1331007C (zh) 2002-12-12 2003-12-11 电光装置用基板、该基板的制造方法及其应用、以及掩模
TW092135044A TWI250332B (en) 2002-12-12 2003-12-11 Substrate for optoelectronic device, manufacturing method of substrate for optoelectronic device, optoelectronic device, manufacturing method of optoelectronic device, electronic machine and mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003064033A JP3800189B2 (ja) 2003-03-10 2003-03-10 半透過反射基板、その製造方法、電気光学装置および電子機器

Publications (3)

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JP2004272006A JP2004272006A (ja) 2004-09-30
JP2004272006A5 JP2004272006A5 (enExample) 2005-10-20
JP3800189B2 true JP3800189B2 (ja) 2006-07-26

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JP2003064033A Expired - Fee Related JP3800189B2 (ja) 2002-12-12 2003-03-10 半透過反射基板、その製造方法、電気光学装置および電子機器

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Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005024754A (ja) * 2003-06-30 2005-01-27 Shin Sti Technology Kk フォトマスク、拡散反射板及びその製造方法並びにカラーフィルタ

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