JP2004272006A5 - - Google Patents
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- Publication number
- JP2004272006A5 JP2004272006A5 JP2003064033A JP2003064033A JP2004272006A5 JP 2004272006 A5 JP2004272006 A5 JP 2004272006A5 JP 2003064033 A JP2003064033 A JP 2003064033A JP 2003064033 A JP2003064033 A JP 2003064033A JP 2004272006 A5 JP2004272006 A5 JP 2004272006A5
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- JP
- Japan
- Prior art keywords
- uneven
- photosensitive material
- light
- edge
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000000758 substrate Substances 0.000 claims 11
- 239000000463 material Substances 0.000 claims 8
- 238000004519 manufacturing process Methods 0.000 claims 7
- 238000010521 absorption reaction Methods 0.000 claims 4
- 238000001579 optical reflectometry Methods 0.000 claims 3
- 238000000034 method Methods 0.000 claims 2
- 230000015572 biosynthetic process Effects 0.000 claims 1
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003064033A JP3800189B2 (ja) | 2003-03-10 | 2003-03-10 | 半透過反射基板、その製造方法、電気光学装置および電子機器 |
| US10/733,176 US7088404B2 (en) | 2002-12-12 | 2003-12-11 | Substrate for electro-optical device having particular concave portions and convex portions and flat section on the surface of a base layer |
| KR1020030090042A KR100589801B1 (ko) | 2002-12-12 | 2003-12-11 | 전기 광학 장치용 기판, 전기 광학 장치용 기판의 제조방법, 전기 광학 장치, 전기 광학 장치의 제조 방법, 전자기기 및 마스크 |
| CNB2003101213312A CN1331007C (zh) | 2002-12-12 | 2003-12-11 | 电光装置用基板、该基板的制造方法及其应用、以及掩模 |
| TW092135044A TWI250332B (en) | 2002-12-12 | 2003-12-11 | Substrate for optoelectronic device, manufacturing method of substrate for optoelectronic device, optoelectronic device, manufacturing method of optoelectronic device, electronic machine and mask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003064033A JP3800189B2 (ja) | 2003-03-10 | 2003-03-10 | 半透過反射基板、その製造方法、電気光学装置および電子機器 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004272006A JP2004272006A (ja) | 2004-09-30 |
| JP2004272006A5 true JP2004272006A5 (enExample) | 2005-10-20 |
| JP3800189B2 JP3800189B2 (ja) | 2006-07-26 |
Family
ID=33125458
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003064033A Expired - Fee Related JP3800189B2 (ja) | 2002-12-12 | 2003-03-10 | 半透過反射基板、その製造方法、電気光学装置および電子機器 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3800189B2 (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005024754A (ja) * | 2003-06-30 | 2005-01-27 | Shin Sti Technology Kk | フォトマスク、拡散反射板及びその製造方法並びにカラーフィルタ |
-
2003
- 2003-03-10 JP JP2003064033A patent/JP3800189B2/ja not_active Expired - Fee Related
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