JP3781154B2 - 真空蒸着装置 - Google Patents
真空蒸着装置 Download PDFInfo
- Publication number
- JP3781154B2 JP3781154B2 JP01790398A JP1790398A JP3781154B2 JP 3781154 B2 JP3781154 B2 JP 3781154B2 JP 01790398 A JP01790398 A JP 01790398A JP 1790398 A JP1790398 A JP 1790398A JP 3781154 B2 JP3781154 B2 JP 3781154B2
- Authority
- JP
- Japan
- Prior art keywords
- crucible
- vapor deposition
- incident angle
- vacuum
- deposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000001771 vacuum deposition Methods 0.000 title claims description 7
- 238000007740 vapor deposition Methods 0.000 claims description 29
- 238000000151 deposition Methods 0.000 claims description 15
- 239000000463 material Substances 0.000 claims description 15
- 230000008021 deposition Effects 0.000 claims description 13
- 238000010894 electron beam technology Methods 0.000 claims description 4
- 238000001816 cooling Methods 0.000 claims description 3
- 238000001704 evaporation Methods 0.000 description 14
- 230000008020 evaporation Effects 0.000 description 13
- 229910052751 metal Inorganic materials 0.000 description 12
- 239000002184 metal Substances 0.000 description 12
- 239000010408 film Substances 0.000 description 10
- 239000000758 substrate Substances 0.000 description 6
- 239000007789 gas Substances 0.000 description 5
- 239000010409 thin film Substances 0.000 description 5
- 230000005294 ferromagnetic effect Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 230000005291 magnetic effect Effects 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000010923 batch production Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- -1 polyethylene terephthalate Polymers 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Images
Landscapes
- Physical Vapour Deposition (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP01790398A JP3781154B2 (ja) | 1998-01-13 | 1998-01-13 | 真空蒸着装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP01790398A JP3781154B2 (ja) | 1998-01-13 | 1998-01-13 | 真空蒸着装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH11200021A JPH11200021A (ja) | 1999-07-27 |
| JPH11200021A5 JPH11200021A5 (enrdf_load_html_response) | 2005-08-04 |
| JP3781154B2 true JP3781154B2 (ja) | 2006-05-31 |
Family
ID=11956713
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP01790398A Expired - Lifetime JP3781154B2 (ja) | 1998-01-13 | 1998-01-13 | 真空蒸着装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3781154B2 (enrdf_load_html_response) |
-
1998
- 1998-01-13 JP JP01790398A patent/JP3781154B2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH11200021A (ja) | 1999-07-27 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3781154B2 (ja) | 真空蒸着装置 | |
| JPH0625839A (ja) | スパッタ装置及びカソード | |
| JPH11200011A (ja) | 真空蒸着装置 | |
| KR900001141B1 (ko) | 자기 기록매체 및 그 제조방법 | |
| JPH0633228A (ja) | 真空蒸着装置 | |
| JPH11193460A (ja) | 真空容器内の巻き取り装置 | |
| JPS6134175A (ja) | スパツタリング装置 | |
| Feuerstein et al. | Video tape manufacture by high vacuum evaporation—aspects of machine technology | |
| JPH0610117A (ja) | 薄膜形成方法、薄膜形成装置、レーザー光照射装置及びボンバード装置 | |
| JP2004362699A (ja) | 磁気記録媒体の製造方法および製造装置 | |
| JPH11200023A (ja) | 真空蒸着装置 | |
| JPH11200020A (ja) | 真空蒸着装置 | |
| JPS63222314A (ja) | 磁気ヘツド用コア | |
| JP3041105B2 (ja) | 磁気記録媒体の製造方法および蒸着用るつぼ | |
| JPH06172984A (ja) | 蒸着方法および装置 | |
| JP3529393B2 (ja) | 真空蒸着装置 | |
| JPH10105965A (ja) | 磁気記録媒体の製造方法および装置 | |
| JPH08185820A (ja) | エネルギー粒子発生装置における放電防止方法、その放電防止構造及びエネルギー粒子発生装置 | |
| JPS6134176A (ja) | 対向タ−ゲツト式スパツタ装置 | |
| JPH11200047A (ja) | 真空蒸着装置 | |
| JPH0562186A (ja) | 磁気記録媒体の製造方法 | |
| JP3827116B2 (ja) | 真空装置内の基体除電装置 | |
| JPH0757260A (ja) | 磁気記録媒体の製造装置 | |
| JPH089163Y2 (ja) | 巻取式蒸着装置 | |
| JPH06176360A (ja) | 磁気記録媒体の製造方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20041217 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20050113 |
|
| RD04 | Notification of resignation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20050225 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20050804 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20050819 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20051017 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20060301 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20060301 |
|
| R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100317 Year of fee payment: 4 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110317 Year of fee payment: 5 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120317 Year of fee payment: 6 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120317 Year of fee payment: 6 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130317 Year of fee payment: 7 |