JP3723580B2 - 中程度の屈折率の光学コーテイング製造用の蒸気析出素材 - Google Patents
中程度の屈折率の光学コーテイング製造用の蒸気析出素材 Download PDFInfo
- Publication number
- JP3723580B2 JP3723580B2 JP14380593A JP14380593A JP3723580B2 JP 3723580 B2 JP3723580 B2 JP 3723580B2 JP 14380593 A JP14380593 A JP 14380593A JP 14380593 A JP14380593 A JP 14380593A JP 3723580 B2 JP3723580 B2 JP 3723580B2
- Authority
- JP
- Japan
- Prior art keywords
- refractive index
- vapor deposition
- coating
- medium refractive
- production
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000463 material Substances 0.000 title claims abstract description 29
- 238000000576 coating method Methods 0.000 title claims description 40
- 230000003287 optical effect Effects 0.000 title claims description 19
- 238000007740 vapor deposition Methods 0.000 title claims description 15
- 238000004519 manufacturing process Methods 0.000 title claims description 14
- 239000000758 substrate Substances 0.000 claims abstract description 7
- 239000011248 coating agent Substances 0.000 claims description 28
- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 claims description 14
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 7
- 230000008018 melting Effects 0.000 claims description 6
- 238000002844 melting Methods 0.000 claims description 6
- 239000000126 substance Substances 0.000 claims description 4
- 238000000151 deposition Methods 0.000 claims description 3
- 230000001747 exhibiting effect Effects 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 abstract description 8
- 230000008021 deposition Effects 0.000 abstract description 3
- 239000012788 optical film Substances 0.000 abstract 1
- 239000000203 mixture Substances 0.000 description 17
- 238000010521 absorption reaction Methods 0.000 description 5
- 239000000654 additive Substances 0.000 description 5
- 239000008187 granular material Substances 0.000 description 5
- 238000007738 vacuum evaporation Methods 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 239000007858 starting material Substances 0.000 description 4
- 229910052746 lanthanum Inorganic materials 0.000 description 3
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 238000001771 vacuum deposition Methods 0.000 description 3
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 239000006117 anti-reflective coating Substances 0.000 description 2
- QCCDYNYSHILRDG-UHFFFAOYSA-K cerium(3+);trifluoride Chemical compound [F-].[F-].[F-].[Ce+3] QCCDYNYSHILRDG-UHFFFAOYSA-K 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- PLDDOISOJJCEMH-UHFFFAOYSA-N neodymium(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Nd+3].[Nd+3] PLDDOISOJJCEMH-UHFFFAOYSA-N 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- BYMUNNMMXKDFEZ-UHFFFAOYSA-K trifluorolanthanum Chemical compound F[La](F)F BYMUNNMMXKDFEZ-UHFFFAOYSA-K 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical class [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910052777 Praseodymium Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910000449 hafnium oxide Inorganic materials 0.000 description 1
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 230000002427 irreversible effect Effects 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- MMKQUGHLEMYQSG-UHFFFAOYSA-N oxygen(2-);praseodymium(3+) Chemical compound [O-2].[O-2].[O-2].[Pr+3].[Pr+3] MMKQUGHLEMYQSG-UHFFFAOYSA-N 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- RUDFQVOCFDJEEF-UHFFFAOYSA-N oxygen(2-);yttrium(3+) Chemical class [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 description 1
- PUDIUYLPXJFUGB-UHFFFAOYSA-N praseodymium atom Chemical compound [Pr] PUDIUYLPXJFUGB-UHFFFAOYSA-N 0.000 description 1
- 229910003447 praseodymium oxide Inorganic materials 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
- 238000002207 thermal evaporation Methods 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/44—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on aluminates
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
- C01F17/00—Compounds of rare earth metals
- C01F17/30—Compounds containing rare earth metals and at least one element other than a rare earth metal, oxygen or hydrogen, e.g. La4S3Br6
- C01F17/32—Compounds containing rare earth metals and at least one element other than a rare earth metal, oxygen or hydrogen, e.g. La4S3Br6 oxide or hydroxide being the only anion, e.g. NaCeO2 or MgxCayEuO
- C01F17/34—Aluminates, e.g. YAlO3 or Y3-xGdxAl5O12
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/081—Oxides of aluminium, magnesium or beryllium
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31551—Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Ceramic Engineering (AREA)
- Mechanical Engineering (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Metallurgy (AREA)
- Manufacturing & Machinery (AREA)
- Life Sciences & Earth Sciences (AREA)
- Inorganic Chemistry (AREA)
- Geology (AREA)
- Structural Engineering (AREA)
- Physical Vapour Deposition (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Glass Compositions (AREA)
- Surface Treatment Of Glass (AREA)
- Laminated Bodies (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE4219817A DE4219817A1 (de) | 1992-06-17 | 1992-06-17 | Aufdampfmaterial zur Herstellung mittelbrechender optischer Schichten |
| DE4219817/8 | 1992-06-17 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH06184730A JPH06184730A (ja) | 1994-07-05 |
| JP3723580B2 true JP3723580B2 (ja) | 2005-12-07 |
Family
ID=6461205
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14380593A Expired - Lifetime JP3723580B2 (ja) | 1992-06-17 | 1993-06-15 | 中程度の屈折率の光学コーテイング製造用の蒸気析出素材 |
Country Status (12)
| Country | Link |
|---|---|
| US (1) | US5415946A (enExample) |
| EP (1) | EP0574785B1 (enExample) |
| JP (1) | JP3723580B2 (enExample) |
| KR (1) | KR940000880A (enExample) |
| CN (1) | CN1043367C (enExample) |
| AT (1) | ATE138420T1 (enExample) |
| CA (1) | CA2098447A1 (enExample) |
| CZ (1) | CZ112093A3 (enExample) |
| DE (2) | DE4219817A1 (enExample) |
| HU (1) | HUT67512A (enExample) |
| SK (1) | SK57593A3 (enExample) |
| TW (1) | TW241292B (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20100136919A (ko) | 2009-06-19 | 2010-12-29 | 캐논 옵트론 가부시키가이샤 | 박막 형성용 조성물 및 광학 박막 |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19807163C1 (de) * | 1998-02-20 | 1999-10-28 | Rainer Gadow | Wärmedämmaterial und Verfahren zum Herstellen eines solchen |
| JP4218744B2 (ja) * | 1998-09-10 | 2009-02-04 | 日鉄ハード株式会社 | 溶射材料およびそれを溶射して形成した皮膜を有する部材 |
| US6327087B1 (en) * | 1998-12-09 | 2001-12-04 | Canon Kabushiki Kaisha | Optical-thin-film material, process for its production, and optical device making use of the optical-thin-film material |
| EP1297565A2 (en) * | 2000-06-26 | 2003-04-02 | North Carolina State University | Novel non-crystalline oxides for use in microelectronic, optical, and other applications |
| DE10119909B4 (de) * | 2001-04-23 | 2005-04-21 | Leica Microsystems Semiconductor Gmbh | Inspektionsmikroskop für den sichtbaren und ultravioletten Spektralbereich und Reflexionsminderungsschicht für den sichtbaren und ultravioletten Spektralbereich |
| US20050040478A1 (en) * | 2001-06-25 | 2005-02-24 | Gerald Lucovsky | Novel non-crystalline oxides for use in microelectronic, optical, and other applications |
| US6678082B2 (en) | 2001-09-12 | 2004-01-13 | Harris Corporation | Electro-optical component including a fluorinated poly(phenylene ether ketone) protective coating and related methods |
| JP4174216B2 (ja) * | 2002-01-18 | 2008-10-29 | フジノン株式会社 | バリア層を有する光学素子、光学系および投映プロジェクタ装置 |
| JP4792871B2 (ja) * | 2005-08-16 | 2011-10-12 | コニカミノルタオプト株式会社 | 光学反射部材 |
| US7382944B1 (en) | 2006-07-14 | 2008-06-03 | The United States Of America As Represented By The Administration Of The National Aeronautics And Space Administration | Protective coating and hyperthermal atomic oxygen texturing of optical fibers used for blood glucose monitoring |
| CN101363920B (zh) * | 2008-09-18 | 2010-06-02 | 北京有色金属研究总院 | 中折射率光学薄膜用蒸发材料及制备方法 |
| CN104557039B (zh) * | 2014-12-24 | 2017-04-19 | 福建阿石创新材料股份有限公司 | 中折射率蒸发镀膜材料及其制备工艺和应用 |
| KR102886222B1 (ko) * | 2020-02-18 | 2025-11-14 | 엘지전자 주식회사 | 가스 난방장치 및 그 제어 방법 |
| CN112323023B (zh) * | 2020-11-06 | 2022-03-18 | 江苏北方湖光光电有限公司 | 一种基于ZnS基底的多波段耐盐雾减反射膜及其制备方法 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CH391198A (de) * | 1958-10-30 | 1965-04-30 | Balzers Patent Beteilig Ag | Verfahren zur Herstellung dünner Oxydschichten |
| FR2508054A1 (fr) * | 1981-06-19 | 1982-12-24 | Labo Electronique Physique | Melange de depart pour une encre serigraphiable contenant un verre au plomb a cuire en atmosphere non oxydante et encre serigraphiable obtenue |
| JPS5930507A (ja) * | 1982-08-12 | 1984-02-18 | Matsushita Electric Ind Co Ltd | 光回路用基板 |
| JPS63156057A (ja) * | 1986-12-19 | 1988-06-29 | 科学技術庁無機材質研究所長 | 高密度ペロブスカイトセラミックスの製造法 |
| CH672380A5 (en) * | 1987-01-27 | 1989-11-15 | Bbc Brown Boveri & Cie | Reduce darkening of mercury vapour UV tube - using hafnium, lanthanum, thorium or aluminium oxide coating |
| SU1581765A1 (ru) * | 1988-04-04 | 1990-07-30 | Черкасский Филиал Киевского Политехнического Института Им.50-Летия Великой Октябрьской Социалистической Революции | Порошковый материал дл покрыти поршневых колец |
| US5082688A (en) * | 1989-05-04 | 1992-01-21 | Eastman Kodak Company | Processes of forming Ag doped conductive crystalline bismuth mixed alkaline earth copper oxide films |
| JP3015408B2 (ja) * | 1989-05-23 | 2000-03-06 | 三洋電機株式会社 | 超電導トランジスタの製造方法 |
| US5137703A (en) * | 1989-06-26 | 1992-08-11 | Trustees Of Boston University | Thermal catalytic methods for converting oxides of nitrogen into environmentally compatible products |
| US5219826A (en) * | 1990-08-20 | 1993-06-15 | Conductus, Inc. | Superconducting junctions and method of making same |
| US5157466A (en) * | 1991-03-19 | 1992-10-20 | Conductus, Inc. | Grain boundary junctions in high temperature superconductor films |
| US5213911A (en) * | 1991-10-17 | 1993-05-25 | The United States Of America As Represented By The United States Department Of Energy | Solid-oxide fuel cell electrolyte |
-
1992
- 1992-06-17 DE DE4219817A patent/DE4219817A1/de not_active Withdrawn
-
1993
- 1993-06-07 EP EP93109115A patent/EP0574785B1/de not_active Expired - Lifetime
- 1993-06-07 DE DE59302657T patent/DE59302657D1/de not_active Expired - Lifetime
- 1993-06-07 AT AT93109115T patent/ATE138420T1/de not_active IP Right Cessation
- 1993-06-08 SK SK575-93A patent/SK57593A3/sk unknown
- 1993-06-09 CZ CZ931120A patent/CZ112093A3/cs unknown
- 1993-06-11 KR KR1019930010612A patent/KR940000880A/ko not_active Withdrawn
- 1993-06-14 TW TW082104702A patent/TW241292B/zh not_active IP Right Cessation
- 1993-06-15 JP JP14380593A patent/JP3723580B2/ja not_active Expired - Lifetime
- 1993-06-15 CA CA002098447A patent/CA2098447A1/en not_active Abandoned
- 1993-06-17 CN CN93107220A patent/CN1043367C/zh not_active Expired - Lifetime
- 1993-06-17 US US08/077,594 patent/US5415946A/en not_active Expired - Lifetime
- 1993-06-17 HU HU9301767A patent/HUT67512A/hu unknown
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20100136919A (ko) | 2009-06-19 | 2010-12-29 | 캐논 옵트론 가부시키가이샤 | 박막 형성용 조성물 및 광학 박막 |
| JP2011001608A (ja) * | 2009-06-19 | 2011-01-06 | Canon Optron Inc | 薄膜形成用組成物および光学薄膜 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP0574785A1 (de) | 1993-12-22 |
| CN1043367C (zh) | 1999-05-12 |
| HU9301767D0 (en) | 1993-11-29 |
| JPH06184730A (ja) | 1994-07-05 |
| SK57593A3 (en) | 1994-01-12 |
| HUT67512A (en) | 1995-04-28 |
| KR940000880A (ko) | 1994-01-10 |
| EP0574785B1 (de) | 1996-05-22 |
| DE59302657D1 (de) | 1996-06-27 |
| CA2098447A1 (en) | 1993-12-18 |
| ATE138420T1 (de) | 1996-06-15 |
| DE4219817A1 (de) | 1993-12-23 |
| TW241292B (enExample) | 1995-02-21 |
| CZ112093A3 (en) | 1994-08-17 |
| CN1083543A (zh) | 1994-03-09 |
| US5415946A (en) | 1995-05-16 |
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