CN1083543A - 用于生产中折射率光学涂层的蒸镀用材料 - Google Patents
用于生产中折射率光学涂层的蒸镀用材料 Download PDFInfo
- Publication number
- CN1083543A CN1083543A CN93107220A CN93107220A CN1083543A CN 1083543 A CN1083543 A CN 1083543A CN 93107220 A CN93107220 A CN 93107220A CN 93107220 A CN93107220 A CN 93107220A CN 1083543 A CN1083543 A CN 1083543A
- Authority
- CN
- China
- Prior art keywords
- vapour
- coating
- specific refractory
- refractory power
- deposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/44—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on aluminates
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
- C01F17/00—Compounds of rare earth metals
- C01F17/30—Compounds containing rare earth metals and at least one element other than a rare earth metal, oxygen or hydrogen, e.g. La4S3Br6
- C01F17/32—Compounds containing rare earth metals and at least one element other than a rare earth metal, oxygen or hydrogen, e.g. La4S3Br6 oxide or hydroxide being the only anion, e.g. NaCeO2 or MgxCayEuO
- C01F17/34—Aluminates, e.g. YAlO3 or Y3-xGdxAl5O12
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/081—Oxides of aluminium, magnesium or beryllium
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31551—Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Ceramic Engineering (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Inorganic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Structural Engineering (AREA)
- Geology (AREA)
- Physical Vapour Deposition (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Glass Compositions (AREA)
- Laminated Bodies (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
本发明涉及一种通过真空蒸镀法在基体上制备
中折射率光学涂层的蒸镀用材料。该材料是一种化
学式为La1-xAl1+xO3(其中x=0~0.84)的化合物。
Description
薄氧化物涂层被广泛地用于工业中,特别是在光学领域中被用作保护涂层或其它光学性能的目的。因此,它们可用来防止光学元件和仪器的表面受到腐蚀和机械损伤,或者作为它们表面的抗反射涂层,尤其是例如作为透镜、反光镜和棱镜等表面的抗反射涂层。此外,薄氧化物涂层还被用于生产高、中或低折射率的光学涂层以便提高或降低反射率。主要应用领域是生产护目透镜和照相机镜头、双筒望远镜和光学测量仪器以及激光技术的光学器件等元件表面的抗反射涂层。它们还可用于生产具有一定折射率和/或一定光吸收性能的涂层。例如,干涉反射镜、光束分离器、滤热器和透热镜的涂层。
用于生产这类氧化物涂层的原料是众所周知的。常用材料是SiO2和宽广范围的金属氧化物,它们还可互相结合使用。基本上是根据所要求的光学性能和加工性能凭经验进行选择。通过已知的真空蒸镀(vacuum vapour deposition)技术来生产涂层。在德国专利1228489中并由H.A.Macleod在“Fhin Film Op-tical Filters”,A.Hilger Ltd.,Bristol。1986,中给出了示范性说明,它们建议了可供使用的材料、加工技术以及与其有关的一些问题。
为了生产光折射率值在1.6~1.9之间的中折射率的涂层,必须限于选择基本上适用的原料。合适的原料主要有铝、镁、钇、镧、镨的氧化物;氟化铈和氟化镧;以及它们的混合体系。适于中折射率涂层的优选原料是氧化铝。
然而,这些合适的材料具有许多缺点,尤其是从实际加工过程来看这些缺点更为明显。
一方面,这些物质具有高的熔点和沸点,而且这些熔点和沸点又彼此相近。然而,从实际观点来看,重要的是蒸镀用材料在开始明显沉积之前必须完全被熔化。然后,只有这样才能保证均匀而合适的沉积速率。必需这样才能在要涂敷的物体上形成均质和厚度均匀的涂层。然而,在镁和钇的氧化物实际应用的条件下并不是上述情况,在常规的生产条件下,这些物质不熔化或至少不完全熔化。总的说来,它们难于蒸发而且产生厚度变化的涂层。
氧化镁总是形成湿气容易被包含在其中的多孔涂层,这会使涂层变得不稳定。氧化镧的情况也如此。氟化铈和氟化镧也会形成硬度和强度不合适的不均匀涂层。
因此希望通过加入适当的添加剂来降低基料的熔点。而且该添加剂可在一定范围内改变和调节所得涂层的折射率。
为此目的而选择的适当添加剂必须满足不吸收光的要求。因此,只有那些在近红外线和从可见光谱范围直到近紫外线波长(约200nm)范围内不吸收光的金属氧化物才是合适的添加剂。
例如,二氧化钛、氧化镨和氧化钕就不适合于上述要求。
尽管上述问题可以通过适当地选择添加剂或选择合适的某些物质的混合物来解决,但在真空蒸镀技术中使用混合物体系本身是不理想的。其原因是,混合体系蒸发通常是不相容的,也就是,在蒸发过程中它们的组成以及沉积涂层的组成要发生变化,由此它们的折射率也发生相应的变化。这类典型的实例是氧化钽/氧化铝和氧化铪/氧化铝混合体系。
本发明的目的是寻找一种适合于用真空蒸镀(vacuum vapour deposition)技术来生产中折射率光学涂层的蒸镀用材料,这种材料没有已知材料的那些缺点,并且尤其是用这种材料可以生产出一种具有均质组成并在可见光范围内不吸收光的均匀涂层。
所提出的初步设想是,一种以镧和铝的氧化物为基的体系在这方面显示出较大的意义。
然而,这些氧化物的混合物证明不适合于实际运用,因为它们吸收湿气并由于不可逆转地变为氢氧化物而不能用于真空蒸发。
然而,已意外地发现,一些化学式为La1-xAl1+xO3(其中x=0~0.84)的化合物十分适合于作为通过真空蒸发来生产中折射率光学涂层的蒸镀用材料。现已发现,这些材料可以在真空中蒸发而不会发生问题,也不会溅射,并且在真空蒸发技术的通常工作条件下很容易地获得均匀的不吸收光的稳定涂层。
因此,本发明涉及一种通过真空中蒸发沉积在基体上来生产中折射率光学涂层的蒸镀用材料,这种材料是一种化学式为La1-xAl1+xO3(其中x=0~0.84)的化合物。
一种特别优选的蒸镀用材料是一种以化学式La1-xAl1+xO3(其中x=0~0.6)为特征的化合物。
本发明还涉及一种适于生产中折射率光学涂层的方法,在该方法中是在真空中将上述类型的蒸镀用材料沉积镀敷到基体上。
本发明的蒸镀用材料不是两种氧化物的混合物,而是一种具有离散的、化学计量规定组成的混合氧化物化合物。在这些化合物中,氧化镧和氧化铝的摩尔比为1∶1~1∶11,优选1∶1~1∶5。在所有这些混合氧化物化合物中,氧含量是精确化学计量的。
在本发明的蒸镀用材料中,在真空蒸发过程中不释放氧。该组成的选择范围应使得,在真空蒸发技术的常规工作条件下很容易形成不吸收光的涂层。还已发现,所得涂层的光学性能几乎不受在真空蒸发过程中氧剩余压力变化的影响。
这些发现十分意外而且料想不到。
可以按照下述方法获得本发明的蒸镀用材料,即将镧和铝的氧化物按照合适的化学计量比例混合并在高真空和低于其熔点温度的条件下烧结该混合物。本发明也包括了制备本发明这类蒸镀用材料的方法。该烧结产物为坚硬的白色颗粒,在约1800℃的温度下完全熔化,并能在温度为2200至2300℃之间和在约为10-4mbar的真空条件下蒸发。
本发明的蒸镀用材料可以已知方法,应用在有关技术中和常规工艺条件下常用的真空蒸镀设备和装置中。真空蒸发不仅可通过热蒸发而且也可通过电子束蒸发而进行。
使用本发明的材料,可以在任何合适的基体上制备出均质的、厚度均匀而具有强粘合力的薄涂层,该涂层特别能抗机械和化学作用。这种涂层具有1.6~1.9的中等折射率,这取决于它的组成和进行测定的光的波长。该涂层在从近紫外线(约200nm)开始,通过可见光区域,直到近红外线(约7000nm)的波长范围内具有很高的透射率,特别在可见光波长范围内无吸收光作用。
实施例1:制备
将下列物质:51%(重量)的氧化镧(Ⅲ)和49%(重量)的氧化铝(Ⅲ)制成粉末状混合物并将该混合物磨细。选择该组成以使其能形成一种化学式为La0.5Al1.5O3形式的化合物。
将这些细粒物质在1600-1680℃的温度和高真空(10-4mbar)下烧结3~8小时。所得白色产物的熔点为1930℃。
实施例2:制备
将下列物质:76%(重量)的氧化镧(Ⅲ)和24%(重量)的氧化铝(Ⅲ)制成粉末状混合物并将该混合物磨细。选择该组成以使其能形成一种化学式为LaAlO3形式的化合物。
将这些细粒物质在1600-1680℃的温度和高真空(10-4mbar)下烧结3~8小时。所得白色产物的熔点为1850℃。
实施例3:应用
将在实施例1中得到的细粒物质加入一个铜蒸发坩埚中,并将其放入一台市售的以电子束蒸发的真空蒸镀设备中。
被涂敷的基体是石英或玻璃。
在2200~2300℃的温度、2×10-4mbar的氧剩余压力、250℃的基体温度和0.4nm/sec的沉积速率下进行涂敷,直到涂层厚度达到250nm。
该涂层在波长为500nm处的折射率n=1.7。该涂层在从可见光区域直到波长约200nm的范围内都没有吸收光的作用。
将实施例2得到的细粒物质进行类似处理得到了一种在波长为500nm处折射率n=1.8的涂层。
Claims (5)
1、通过真空蒸镀法在基体上制备中折射率光学涂层的蒸镀用材料,其特征在于,该材料是一种化学式为La1-xAl1+xO3(其中x=0~0.84)的化合物。
2、根据权利要求1所述的蒸镀用材料,其特征在于,该材料是一种化学式为La1-xAl1+xO3(其中x=0~0.6)的化合物。
3、用于制备权利要求1和2所述的蒸镀用材料的方法,其特征在于,将镧和铝的氧化物按1∶1~1∶11的摩尔比进行混合,并在高真空和低于其熔点温度的条件下进行烧结。
4、将权利要求1和2的蒸镀用材料用于制备中折射率的光学涂层。
5、通过真空蒸镀法在基体上制备中折射率光学涂层的方法,其特征在于,使用根据权利要求1和2所述的蒸镀用材料进行涂敷。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE4219817A DE4219817A1 (de) | 1992-06-17 | 1992-06-17 | Aufdampfmaterial zur Herstellung mittelbrechender optischer Schichten |
DEP4219817.8 | 1992-06-17 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1083543A true CN1083543A (zh) | 1994-03-09 |
CN1043367C CN1043367C (zh) | 1999-05-12 |
Family
ID=6461205
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN93107220A Expired - Lifetime CN1043367C (zh) | 1992-06-17 | 1993-06-17 | 蒸镀材料其制备方法和用该材料制备光学涂层方法 |
Country Status (12)
Country | Link |
---|---|
US (1) | US5415946A (zh) |
EP (1) | EP0574785B1 (zh) |
JP (1) | JP3723580B2 (zh) |
KR (1) | KR940000880A (zh) |
CN (1) | CN1043367C (zh) |
AT (1) | ATE138420T1 (zh) |
CA (1) | CA2098447A1 (zh) |
CZ (1) | CZ112093A3 (zh) |
DE (2) | DE4219817A1 (zh) |
HU (1) | HUT67512A (zh) |
SK (1) | SK57593A3 (zh) |
TW (1) | TW241292B (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101363920B (zh) * | 2008-09-18 | 2010-06-02 | 北京有色金属研究总院 | 中折射率光学薄膜用蒸发材料及制备方法 |
CN104557039A (zh) * | 2014-12-24 | 2015-04-29 | 福州阿石创光电子材料有限公司 | 中折射率蒸发镀膜材料及其制备工艺和应用 |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19807163C1 (de) * | 1998-02-20 | 1999-10-28 | Rainer Gadow | Wärmedämmaterial und Verfahren zum Herstellen eines solchen |
JP4218744B2 (ja) * | 1998-09-10 | 2009-02-04 | 日鉄ハード株式会社 | 溶射材料およびそれを溶射して形成した皮膜を有する部材 |
US6327087B1 (en) | 1998-12-09 | 2001-12-04 | Canon Kabushiki Kaisha | Optical-thin-film material, process for its production, and optical device making use of the optical-thin-film material |
EP1297565A2 (en) * | 2000-06-26 | 2003-04-02 | North Carolina State University | Novel non-crystalline oxides for use in microelectronic, optical, and other applications |
DE10119909B4 (de) * | 2001-04-23 | 2005-04-21 | Leica Microsystems Semiconductor Gmbh | Inspektionsmikroskop für den sichtbaren und ultravioletten Spektralbereich und Reflexionsminderungsschicht für den sichtbaren und ultravioletten Spektralbereich |
US20050040478A1 (en) * | 2001-06-25 | 2005-02-24 | Gerald Lucovsky | Novel non-crystalline oxides for use in microelectronic, optical, and other applications |
US6678082B2 (en) | 2001-09-12 | 2004-01-13 | Harris Corporation | Electro-optical component including a fluorinated poly(phenylene ether ketone) protective coating and related methods |
JP4174216B2 (ja) * | 2002-01-18 | 2008-10-29 | フジノン株式会社 | バリア層を有する光学素子、光学系および投映プロジェクタ装置 |
JP4792871B2 (ja) * | 2005-08-16 | 2011-10-12 | コニカミノルタオプト株式会社 | 光学反射部材 |
US7382944B1 (en) | 2006-07-14 | 2008-06-03 | The United States Of America As Represented By The Administration Of The National Aeronautics And Space Administration | Protective coating and hyperthermal atomic oxygen texturing of optical fibers used for blood glucose monitoring |
JP5308246B2 (ja) * | 2009-06-19 | 2013-10-09 | キヤノンオプトロン株式会社 | 薄膜形成用組成物および光学薄膜 |
CN112323023B (zh) * | 2020-11-06 | 2022-03-18 | 江苏北方湖光光电有限公司 | 一种基于ZnS基底的多波段耐盐雾减反射膜及其制备方法 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH391198A (de) * | 1958-10-30 | 1965-04-30 | Balzers Patent Beteilig Ag | Verfahren zur Herstellung dünner Oxydschichten |
FR2508054A1 (fr) * | 1981-06-19 | 1982-12-24 | Labo Electronique Physique | Melange de depart pour une encre serigraphiable contenant un verre au plomb a cuire en atmosphere non oxydante et encre serigraphiable obtenue |
JPS5930507A (ja) * | 1982-08-12 | 1984-02-18 | Matsushita Electric Ind Co Ltd | 光回路用基板 |
JPS63156057A (ja) * | 1986-12-19 | 1988-06-29 | 科学技術庁無機材質研究所長 | 高密度ペロブスカイトセラミックスの製造法 |
CH672380A5 (en) * | 1987-01-27 | 1989-11-15 | Bbc Brown Boveri & Cie | Reduce darkening of mercury vapour UV tube - using hafnium, lanthanum, thorium or aluminium oxide coating |
SU1581765A1 (ru) * | 1988-04-04 | 1990-07-30 | Черкасский Филиал Киевского Политехнического Института Им.50-Летия Великой Октябрьской Социалистической Революции | Порошковый материал дл покрыти поршневых колец |
US5082688A (en) * | 1989-05-04 | 1992-01-21 | Eastman Kodak Company | Processes of forming Ag doped conductive crystalline bismuth mixed alkaline earth copper oxide films |
JP3015408B2 (ja) * | 1989-05-23 | 2000-03-06 | 三洋電機株式会社 | 超電導トランジスタの製造方法 |
US5137703A (en) * | 1989-06-26 | 1992-08-11 | Trustees Of Boston University | Thermal catalytic methods for converting oxides of nitrogen into environmentally compatible products |
US5219826A (en) * | 1990-08-20 | 1993-06-15 | Conductus, Inc. | Superconducting junctions and method of making same |
US5157466A (en) * | 1991-03-19 | 1992-10-20 | Conductus, Inc. | Grain boundary junctions in high temperature superconductor films |
US5213911A (en) * | 1991-10-17 | 1993-05-25 | The United States Of America As Represented By The United States Department Of Energy | Solid-oxide fuel cell electrolyte |
-
1992
- 1992-06-17 DE DE4219817A patent/DE4219817A1/de not_active Withdrawn
-
1993
- 1993-06-07 AT AT93109115T patent/ATE138420T1/de not_active IP Right Cessation
- 1993-06-07 DE DE59302657T patent/DE59302657D1/de not_active Expired - Lifetime
- 1993-06-07 EP EP93109115A patent/EP0574785B1/de not_active Expired - Lifetime
- 1993-06-08 SK SK575-93A patent/SK57593A3/sk unknown
- 1993-06-09 CZ CZ931120A patent/CZ112093A3/cs unknown
- 1993-06-11 KR KR1019930010612A patent/KR940000880A/ko not_active Application Discontinuation
- 1993-06-14 TW TW082104702A patent/TW241292B/zh not_active IP Right Cessation
- 1993-06-15 JP JP14380593A patent/JP3723580B2/ja not_active Expired - Lifetime
- 1993-06-15 CA CA002098447A patent/CA2098447A1/en not_active Abandoned
- 1993-06-17 CN CN93107220A patent/CN1043367C/zh not_active Expired - Lifetime
- 1993-06-17 HU HU9301767A patent/HUT67512A/hu unknown
- 1993-06-17 US US08/077,594 patent/US5415946A/en not_active Expired - Lifetime
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101363920B (zh) * | 2008-09-18 | 2010-06-02 | 北京有色金属研究总院 | 中折射率光学薄膜用蒸发材料及制备方法 |
CN104557039A (zh) * | 2014-12-24 | 2015-04-29 | 福州阿石创光电子材料有限公司 | 中折射率蒸发镀膜材料及其制备工艺和应用 |
Also Published As
Publication number | Publication date |
---|---|
CN1043367C (zh) | 1999-05-12 |
JP3723580B2 (ja) | 2005-12-07 |
KR940000880A (ko) | 1994-01-10 |
TW241292B (zh) | 1995-02-21 |
EP0574785B1 (de) | 1996-05-22 |
CA2098447A1 (en) | 1993-12-18 |
DE4219817A1 (de) | 1993-12-23 |
US5415946A (en) | 1995-05-16 |
ATE138420T1 (de) | 1996-06-15 |
CZ112093A3 (en) | 1994-08-17 |
HU9301767D0 (en) | 1993-11-29 |
JPH06184730A (ja) | 1994-07-05 |
EP0574785A1 (de) | 1993-12-22 |
DE59302657D1 (de) | 1996-06-27 |
SK57593A3 (en) | 1994-01-12 |
HUT67512A (en) | 1995-04-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN1043367C (zh) | 蒸镀材料其制备方法和用该材料制备光学涂层方法 | |
CN1033471C (zh) | 用于生产高折射率光学涂层的蒸镀用材料 | |
KR100252552B1 (ko) | 혼합산화물고굴절광학코팅재료및방법 | |
EP1008868B1 (en) | Optical-thin-film material, process for its production, and optical device making use of the optical-thin-film material | |
CN1103054C (zh) | 汽相沉积物料、带有光学涂层的光学基体以及它们的制备方法 | |
CN1150345C (zh) | 稳定的氧化钛基气相沉积材料 | |
US6756137B2 (en) | Vapor-deposition material for the production of high-refractive-index optical layers, and process for the production of the vapor-deposition material | |
KR20050102661A (ko) | 고 굴절률의 광학 층을 제조하기 위한 증착 물질 | |
US5157547A (en) | Transparent coating having a medium refractivity | |
Pulker | Coatings on glass substrates | |
JPH03183761A (ja) | 蒸着法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C17 | Cessation of patent right | ||
CX01 | Expiry of patent term |
Expiration termination date: 20130617 Granted publication date: 19990512 |