JP3601171B2 - 露光装置 - Google Patents
露光装置 Download PDFInfo
- Publication number
- JP3601171B2 JP3601171B2 JP07289496A JP7289496A JP3601171B2 JP 3601171 B2 JP3601171 B2 JP 3601171B2 JP 07289496 A JP07289496 A JP 07289496A JP 7289496 A JP7289496 A JP 7289496A JP 3601171 B2 JP3601171 B2 JP 3601171B2
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- outside air
- unit
- exposure apparatus
- pressure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
Landscapes
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Toxicology (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP07289496A JP3601171B2 (ja) | 1996-03-27 | 1996-03-27 | 露光装置 |
| KR1019970012127A KR100542414B1 (ko) | 1996-03-27 | 1997-03-27 | 노광장치및공조장치 |
| US09/266,873 US6535270B1 (en) | 1996-03-27 | 1999-03-12 | Exposure apparatus and air-conditioning apparatus for use with exposure apparatus |
| US10/237,133 US20030035087A1 (en) | 1996-03-27 | 2002-09-09 | Exposure apparatus and air-conditioning apparatus for use with exposure apparatus |
| US11/071,106 US20050185156A1 (en) | 1996-03-27 | 2005-03-04 | Exposure apparatus and air-conditioning apparatus for use with exposure apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP07289496A JP3601171B2 (ja) | 1996-03-27 | 1996-03-27 | 露光装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH09266148A JPH09266148A (ja) | 1997-10-07 |
| JPH09266148A5 JPH09266148A5 (enExample) | 2004-07-29 |
| JP3601171B2 true JP3601171B2 (ja) | 2004-12-15 |
Family
ID=13502525
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP07289496A Expired - Fee Related JP3601171B2 (ja) | 1996-03-27 | 1996-03-27 | 露光装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3601171B2 (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105988296B (zh) * | 2015-01-28 | 2017-12-29 | 南通大学 | 一种净化曝光装置 |
| CN116300338A (zh) * | 2023-03-30 | 2023-06-23 | 苏州清越光电科技股份有限公司 | 曝光灯箱、曝光机 |
-
1996
- 1996-03-27 JP JP07289496A patent/JP3601171B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH09266148A (ja) | 1997-10-07 |
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