JP3409028B2 - 溶剤の再生方法及び装置 - Google Patents

溶剤の再生方法及び装置

Info

Publication number
JP3409028B2
JP3409028B2 JP2000399583A JP2000399583A JP3409028B2 JP 3409028 B2 JP3409028 B2 JP 3409028B2 JP 2000399583 A JP2000399583 A JP 2000399583A JP 2000399583 A JP2000399583 A JP 2000399583A JP 3409028 B2 JP3409028 B2 JP 3409028B2
Authority
JP
Japan
Prior art keywords
solvent
component
liquid
boiling point
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2000399583A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002014475A (ja
Inventor
軌雄 五十嵐
恭 井上
典生 山口
義登 増田
泰人 川瀬
芳芝 青島
昭昌 小田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Refine Co Ltd
Original Assignee
Nippon Refine Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=26591262&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=JP3409028(B2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Nippon Refine Co Ltd filed Critical Nippon Refine Co Ltd
Priority to JP2000399583A priority Critical patent/JP3409028B2/ja
Priority to TW090109865A priority patent/TW514962B/zh
Priority to CNB011171669A priority patent/CN1181520C/zh
Priority to KR1020010023074A priority patent/KR100665559B1/ko
Publication of JP2002014475A publication Critical patent/JP2002014475A/ja
Application granted granted Critical
Publication of JP3409028B2 publication Critical patent/JP3409028B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
    • B01D3/42—Regulation; Control
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D1/00—Evaporating
    • B01D1/22—Evaporating by bringing a thin layer of the liquid into contact with a heated surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D19/00—Degasification of liquids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D5/00—Condensation of vapours; Recovering volatile solvents by condensation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2221/00—Applications of separation devices
    • B01D2221/14—Separation devices for workshops, car or semiconductor industry, e.g. for separating chips and other machining residues

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Degasification And Air Bubble Elimination (AREA)
JP2000399583A 2000-04-28 2000-12-27 溶剤の再生方法及び装置 Expired - Lifetime JP3409028B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2000399583A JP3409028B2 (ja) 2000-04-28 2000-12-27 溶剤の再生方法及び装置
TW090109865A TW514962B (en) 2000-04-28 2001-04-25 Method and apparatus for reclaiming used solvent
CNB011171669A CN1181520C (zh) 2000-04-28 2001-04-27 废溶剂的再生方法和装置
KR1020010023074A KR100665559B1 (ko) 2000-04-28 2001-04-27 사용된 용제의 재생방법 및 장치

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000-131099 2000-04-28
JP2000131099 2000-04-28
JP2000399583A JP3409028B2 (ja) 2000-04-28 2000-12-27 溶剤の再生方法及び装置

Publications (2)

Publication Number Publication Date
JP2002014475A JP2002014475A (ja) 2002-01-18
JP3409028B2 true JP3409028B2 (ja) 2003-05-19

Family

ID=26591262

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000399583A Expired - Lifetime JP3409028B2 (ja) 2000-04-28 2000-12-27 溶剤の再生方法及び装置

Country Status (4)

Country Link
JP (1) JP3409028B2 (ko)
KR (1) KR100665559B1 (ko)
CN (1) CN1181520C (ko)
TW (1) TW514962B (ko)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20030021006A (ko) * 2001-09-05 2003-03-12 주식회사 고려덴트칼라 신나 재생추출기
CN100377758C (zh) * 2003-10-24 2008-04-02 北京金伟晖工程技术有限公司 一种水溶性溶剂再生系统及其方法
JP2006069960A (ja) * 2004-09-02 2006-03-16 Nippon Refine Kk ジメチルスルホキシドとモノエタノールアミンを含有する混合系の分離精製方法
WO2007029767A1 (ja) * 2005-09-09 2007-03-15 Tokyo Ohka Kogyo Co., Ltd. ホトリソグラフィ用洗浄剤およびこれを用いたホトレジストパターン形成方法
KR100891747B1 (ko) * 2007-09-05 2009-04-03 주식회사 코렉스 포토레지스트 스트리퍼의 재생장치
JP4476356B2 (ja) * 2007-09-05 2010-06-09 コレックス コーポレーション フォトレジストストリッパー廃液の再生方法及び再生装置、並びにその再生回収率の改善方法
KR100952913B1 (ko) * 2009-04-15 2010-04-16 주식회사 이엔에프테크놀로지 폐유기용제의 처리방법
CN103657121B (zh) * 2012-09-17 2015-11-25 中国石油化工股份有限公司 一种萃取精馏分离苯乙烯所用溶剂的再生方法
JP6045283B2 (ja) * 2012-10-11 2016-12-14 日本リファイン株式会社 レジスト剥離液の再生方法および再生装置
JP6033033B2 (ja) * 2012-10-11 2016-11-30 日本リファイン株式会社 レジスト剥離液の再生方法および再生装置
JP6156678B2 (ja) * 2012-10-11 2017-07-05 パナソニックＩｐマネジメント株式会社 レジスト剥離液の再生方法および再生装置
KR101819278B1 (ko) * 2015-04-03 2018-01-17 주식회사 엘지화학 증류 장치
WO2018051716A1 (ja) * 2016-09-15 2018-03-22 富士フイルム株式会社 有機溶剤の精製方法および有機溶剤の精製装置
JP2020096994A (ja) * 2017-03-29 2020-06-25 住友精化株式会社 精留装置
TWI643657B (zh) * 2017-12-29 2018-12-11 財團法人工業技術研究院 廢溶劑處理系統及方法
KR102047217B1 (ko) * 2018-07-18 2019-11-20 리파인 홀딩스 가부시키가이샤 용액 처리 장치 및 용액 처리 방법
CN113072447A (zh) * 2021-03-29 2021-07-06 新中天环保股份有限公司 一种从电子pgmea废溶剂中回收pgmea的方法

Also Published As

Publication number Publication date
CN1181520C (zh) 2004-12-22
KR20010104641A (ko) 2001-11-26
TW514962B (en) 2002-12-21
KR100665559B1 (ko) 2007-01-10
CN1322005A (zh) 2001-11-14
JP2002014475A (ja) 2002-01-18

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