TW514962B - Method and apparatus for reclaiming used solvent - Google Patents

Method and apparatus for reclaiming used solvent Download PDF

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Publication number
TW514962B
TW514962B TW090109865A TW90109865A TW514962B TW 514962 B TW514962 B TW 514962B TW 090109865 A TW090109865 A TW 090109865A TW 90109865 A TW90109865 A TW 90109865A TW 514962 B TW514962 B TW 514962B
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solvent
item
scope
volatile
patent application
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TW090109865A
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Chinese (zh)
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Michio Igarashi
Takashi Inoue
Norio Yamaguchi
Yoshito Masuda
Yasuhito Kawase
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Matsushita Env Aircond Eng Co
Nippon Refine Kk
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D3/00Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
    • B01D3/42Regulation; Control
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D1/00Evaporating
    • B01D1/22Evaporating by bringing a thin layer of the liquid into contact with a heated surface
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D19/00Degasification of liquids
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D5/00Condensation of vapours; Recovering volatile solvents by condensation
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/42Stripping or agents therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2221/00Applications of separation devices
    • B01D2221/14Separation devices for workshops, car or semiconductor industry, e.g. for separating chips and other machining residues

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Degasification And Air Bubble Elimination (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

The present invention relates to a method of reclaiming a used solvent that has been used for dissolving a resist resin component or a used solvent containing a resin component that has been spent in a process of separating a resist resin on a substrate when manufacturing semiconductors or liquid crystal substrates. The method comprises the steps of removing a resin component, removing a volatile impurity, such as water, and refining the solvent. First, the resin component removing step is performed. After the refined solvent has been vaporized finally, the reclaimed solvent is recovered as a condensed solvent. An apparatus for performing this method is also described.

Description

514962 五、發明說明(1) '〜 - 發明背景 發明領域 本發明是有關於用過溶劑之再生方法及裝置。特別 地’本發明是有關於用過溶劑(例如,已用於分離基底阻 抗層方法之分離液體或清除劑)之再生方法及裝置。本發 明也有關於稀釋劑之再生方法及裝置,該稀釋劑是用於溶 解製造半‘體或液晶顯示器或其他類似製造技術中所使用 的樹脂。 相關技藝之說明 在已知的技術中,當製造半導體或液晶顯示器時,加 熱的溶劑(清除劑)是用於分離基底的阻抗層。清除劑通 常是由單乙醇胺(以下稱” MEA”)及二曱基亞楓(以下稱 ” DMSCT )的混合物所組成。清除劑混合物也可包含少量的 水。此外,稀釋劑可由丙二醇單乙基醚醋酸酯(以下稱 ” PGMEA”)及丙二醇單乙基醚(以下稱"pGME,,)的混合物 所組成。稀釋劑混合物是水溶性的,並且包含少量的水。 最近’半導體及液晶顯示器基底的大小已逐漸增加。 因此’有愈來愈多量的清除劑及稀釋劑會用在半導體及液 晶顯示器的製造中。在使·用清除劑及稀釋劑之後,處理廢 棄物的服務通常是收集廢棄的(用過的)液體加以處理。 然而,這樣的收集成本很高,並且廢棄液體的處理會對地 球的環境有不利的影響。因此,對於用過溶劑(例如,用 過的清除劑或稀釋劑)之再生,有愈來愈增加的需求,以 取代用過溶劑的處理。514962 V. Description of the invention (1) '~-BACKGROUND OF THE INVENTION Field of the Invention The present invention relates to a method and a device for regenerating used solvents. In particular, the present invention relates to a method and apparatus for regenerating used solvents (e.g., separation liquids or scavengers that have been used to separate substrate barrier layers). The invention also relates to a method and a device for regenerating a diluent, which is a resin used for dissolving a semi-isolated or liquid crystal display or other similar manufacturing technology. Description of Related Art In the known technology, when manufacturing a semiconductor or a liquid crystal display, a heated solvent (scavenger) is a resistance layer for separating a substrate. The scavenger is usually composed of a mixture of monoethanolamine (hereinafter referred to as "MEA") and difluorenylsulfonate (hereinafter referred to as "DMSCT"). The scavenger mixture may also contain a small amount of water. In addition, the diluent may be propylene glycol monoethyl A mixture of ether acetate (hereinafter referred to as "PGMEA") and propylene glycol monoethyl ether (hereinafter referred to as "pGME,"). The diluent mixture is water-soluble and contains a small amount of water. Recently 'semiconductor and liquid crystal displays The size of the substrate has gradually increased. Therefore, more and more scavengers and thinners are used in the manufacture of semiconductors and liquid crystal displays. After using the scavengers and thinners, the service of waste disposal is usually collected Waste (used) liquids are disposed of. However, such collection is costly and the disposal of waste liquids can adversely affect the environment of the planet. Therefore, for used solvents (for example, used scavengers or Diluent) regeneration, there is an increasing demand to replace the treatment with used solvents.

2042-3900-PF.ptd 第6頁 514962 五、發明說明(2) 一種已知的用過 的溶劑,以將用過的 這個方法中’要分離 相同於原始溶劑般的 長期穩定地操作再生 困難的。因此,在半 用過溶劑之再生方法 及裝置在此領域中是 此外,雖然溶劑 放在操作表現上的話 可易於維持再生溶劑 也有其需要。 之再生方 之個別成 的清除劑 之新溶劑 同時要維 及液晶裝 別的裝置 以來都有 裝置有更 是,對於 質及較小 法,是 份加以 或稀釋 是有困 持再生 置的領 ’並且 其需求 大的傾 提供具 體積之 蒸餾用過 然而,在 製備具有 此外,要 品質也是 尚未建立 再生方法 果把重點 生成果、 生裝置, 發明概述 因此’本發明的一種形能县 法及裝置之-種或多種的問的溶劑再生方 教:當製造半導體或液晶基底時,用過二::態中, r進—步的製造操作中使用,並且=理二的:劑 本毛明的另一形您是提供溶劑再生裝置,當制、生 體或液晶基底#,其可再生用過的溶劑(例如,::: 除劑及稀釋劑)。較佳,也’這樣的溶劑再 有:清 的穩定性以及相對較小的大小。 直/、有長期 2042-3900-PF.ptd 五、發明說明(3) 在本發 的溶劑之再 雜質;以及 份。此外, 收作為冷凝 本發明 置。用過的 操作期間溶 移除裝置, 用以移除揮 較佳地,樹 精製的溶劑 凝溶劑。 根據本 成份移除之 溶解的樹脂 具有而純度 置可長期穩 本發明 下的詳細說 更明顯易懂 明所教示 生方法, 精製溶劑 在精製的 溶劑。 也提供含 溶劑可包 解於溶劑 用以移除 發性雜質 脂成份移 已在下游 發明之方 後精製, 成份之影 的再生溶 定地操作 之上述和 明並配合 的一種形 是涉及到 之步驟。 溶劑完全 有樹脂成 含樹脂成 中。溶劑 樹脂成份 ;以及一 除裝置是 蒸發之後 法,因為 因此’精 響。因此 劑。此外 ’而不會 其他目的 所附圖示 態中,含有樹脂成份之用過 移除樹脂成份;移除揮發性 較佳地,首先是移除樹脂成 蒸發之後,將再生的溶劑回 份之用過的溶劑之再生裝 份’其已在分離阻抗樹脂的 再生裝置可包括一樹脂成份 ;一揮發性成份移除裝置, 精製裝置,用以精製溶劑。 提供在上游位置。此外,在 ’將再生的溶劑回收作為冷 要再生的溶劑成份是在樹脂 製的方法並不會受到懸浮或 ’可得到高的精製效率以及 ’根據本發明之裝置,此裝 降低精製的效率。 、特徵及優點,在閱讀過以 及申晴專利範圍後,將變得 圖示之簡單說明 第1圖是顯示本發明具體實施例之方法步驟的流程2042-3900-PF.ptd Page 6 514962 V. Description of the invention (2) A known used solvent, in this method, it is difficult to operate in the same way as the original solvent for long-term stable regeneration. of. Therefore, regeneration methods and apparatuses for semi-used solvents are in this field. In addition, there is a need for the ease of maintaining the regenerated solvent even if the solvent is placed on the operation performance. The new solvent of the scavenger made by the regeneration side must also maintain the liquid crystal device. Since the device has been installed, for the quality and smaller methods, it is necessary to add or dilute it. And it has a large demand for distillation. It has been used to provide concrete products. However, in addition to the preparation, the quality is not yet established. Regeneration methods have not been established. The focus is on generating fruit and raw devices. Summary of the Invention Therefore, a form energy method and device of the present invention One or more kinds of solvent regeneration methods: when manufacturing semiconductor or liquid crystal substrates, have used two :: in the state, r is used in further manufacturing operations, and = two of the two: agent Ben Maoming's Another form is to provide a solvent regeneration device, which can be used for manufacturing, living body, or liquid crystal substrates, which can regenerate used solvents (for example, :: remover and thinner). It is also preferable that such a solvent has the stability of Qing and relatively small size. Straight / 、 Long-term 2042-3900-PF.ptd V. Description of the invention (3) Re-impurities in the solvent of this invention; In addition, the present invention is used as a condensing device. Used during the operation of the solvent removal device to remove the volatile solvent, preferably the tree-refined solvent. The dissolved resin removed according to this ingredient has long-term stability and purity. The detailed description of the present invention makes it easier to understand the teaching method, the refined solvent, and the refined solvent. It also provides a solvent-containing solution that can be decomposed in a solvent to remove hairy impurities. The lipid component has been refined after the invention of the downstream invention. The regenerative operation of the shadow of the component is dissolved and the above mentioned forms are involved. step. The solvent is completely resin-containing. Solvent resin composition; and a removal device is a post-evaporation method, because it ’s fine. Therefore agent. In addition to the state shown in the attached diagram for other purposes, the resin component is used to remove the resin component; the volatility is preferably removed, and the first is to remove the resin to evaporate, and then reuse the recycled solvent The regenerating component of the used solvent may include a resin component in the regeneration device for separating the impedance resin, a volatile component removing device, and a refining device for refining the solvent. Provided in an upstream position. In addition, in the method of recovering the regenerated solvent as the solvent component to be regenerated coldly, the resin is not subjected to suspension or the high refining efficiency can be obtained and the device according to the present invention reduces the refining efficiency. , Characteristics and advantages, after reading and Shen Qing patent scope, it will become a simple illustration. Figure 1 is a flow chart showing the steps of the method

2042-3900-PF.ptd 第8頁 514962 五、發明說明(4) 圖, 第2圖是顯示具體實施例之初步方法步驟的流程圖; 第3圖是顯示具體實施例之方法步驟的流程圖; 第4圖是顯示具體實施例之方法步驟的流程圖; 第5圖是顯示根據本發明修飾之方法步驟的流程圖; 第6圖是顯示根據本發明另一修飾之方法步驟的流程 圖, 第7圖是顯示具體實施例之溶劑再生裝置的示意圖; 第8圖是顯示樹脂成份移除裝置的部份分裂結構圖; 第9圖是揮發性成份槽及相關裝置零件之示意圖; 第1 0圖是兩個處理的溶劑槽及相關裝置零件之示意 圖, 第11圖是冷凝裝置及相關裝置零件之示意圖;以及 第1 2圖是本發明另一具體實施例之溶劑再生裝置的示 意圖。 參考標號之說明 I :再生裝置; 2 :溶劑回收槽; 3, 43 :幫浦; 4, 8, 1 3, 25, 28, 32, 41,47, 5 0,:管線; 5 :樹脂成份移除裝置; 6 a :入口埠; 6b:出 口埠; 7, 23, 39:槽; 9 :蒸餾管柱; 1 0 :填充劑; II :再循環埠; 1 2 :蒸汽排放埠; 1 4,3 3 :冷凝器; 1 5,3 4 :排放冷凝器;2042-3900-PF.ptd Page 8 514962 V. Description of the invention (4) Figure, Figure 2 is a flowchart showing the preliminary method steps of a specific embodiment; Figure 3 is a flowchart showing the method steps of a specific embodiment Figure 4 is a flowchart showing method steps of a specific embodiment; Figure 5 is a flowchart showing method steps modified according to the present invention; Figure 6 is a flowchart showing method steps modified according to the present invention, FIG. 7 is a schematic diagram showing a solvent regeneration device according to a specific embodiment; FIG. 8 is a partial split structure diagram showing a resin component removing device; FIG. 9 is a schematic diagram of a volatile component tank and related device parts; FIG. 11 is a schematic diagram of two processed solvent tanks and related device parts, FIG. 11 is a schematic diagram of a condensation device and related device parts, and FIG. 12 is a schematic diagram of a solvent regeneration device according to another embodiment of the present invention. Explanation of reference numerals I: regeneration device; 2: solvent recovery tank; 3, 43: pump; 4, 8, 1 3, 25, 28, 32, 41, 47, 5 0 ,: pipeline; 5: resin component transfer 6 a: inlet port; 6b: outlet port; 7, 23, 39: tank; 9: distillation column; 10: filler; II: recirculation port; 12: steam discharge port; 1 4, 3 3: condenser; 1, 3, 4: discharge condenser;

2042-3900-PF.ptd 第9頁 5149622042-3900-PF.ptd Page 9 514962

五、發明說明(5) % :再循環槽; 3 7 :再循環通路; 返回管線; 揮發性成份排放通路; 揮發性成份槽; 轉移幫浦; 托盤; 16, 18, 20 21 22 26 29 31 :蒸汽排放埠; 42 :熱交換器; 4 5,4 6 :處理溶劑槽; 49 :過濾器; Μ :分光鏡分析器; 5 4 :低壓導管;Ϊ 56, 66 :加熱裝置 5 8 :旋轉體; 60,62,63 ·氮氣導管; 17, 36, • 再 循環幫浦 19 • _ —_ 向 閥 門; 24, 40 : :加熱再沸器 27 精 餾 管 杈; 30 精 餾 埠 > 38 排 放 通 路; 44 通 路 , 48 濃 度 控 制槽; 51 化 學 供 應槽; 53 壓 力 降 低裝置; 55 圓 柱 體 57 蒸 發 表 面; 59 毛 刷 , 61,64, 65 :開放/關閉閥門; 6 7 :絕熱材料; 6 8,6 9 :單元。 發明詳述 在本發明中使用之用過 晶基底期間,已用於溶解或 般而言,用過的溶劑基本上 少量的水。 的溶劑,是在製造半導體或液 分離阻抗樹脂之廢棄液體。一 包括主溶劑成份、阻抗樹脂及V. Description of the invention (5)%: recirculation tank; 37: recirculation path; return pipeline; volatile component discharge path; volatile component tank; transfer pump; tray; 16, 18, 20 21 22 26 29 31 : Steam discharge port; 42: heat exchanger; 4 5, 4 6: process solvent tank; 49: filter; Μ: spectroscope analyzer; 5 4: low-pressure duct; Ϊ 56, 66: heating device 5 8: rotation Body; 60, 62, 63 · Nitrogen conduit; 17, 36, • Recirculation pump 19 • _ —_ directional valve; 24, 40:: Heating reboiler 27 distillation tube branch; 30 distillation port > 38 Drain passage; 44 passage, 48 concentration control tank; 51 chemical supply tank; 53 pressure reducing device; 55 cylinder 57 evaporation surface; 59 brush, 61, 64, 65: open / close valve; 6 7: thermal insulation material; 6 8, 6 9: Unit. DETAILED DESCRIPTION OF THE INVENTION During the use of a crystalline substrate used in the present invention, the solvent used has been used to dissolve or, in general, a substantially small amount of water has been used. Solvents are waste liquids used in the manufacture of semiconductors or liquid separation resistance resins. 1 Including the main solvent components, resistance resin and

如第1圖所示,本發明之古 抗樹脂)之m 方法包括移除樹脂成份(阻 ^最後,在溶劑蒸發之後將溶::成伤(例如’水 ::劑回收作為冷凝溶劑。根據這’將再生的 树脂成份可先被移除,目此 ;因為非揮發性的 或溶解的樹脂成份之影響、’;::::不會受到懸浮 作。 此此再生裝置可穩定地操 獲得再生溶劑的方法中 在 移除揮 冷凝。 應到申 如 氛中, 可在排 氣處理 個方法 溶劑作 此 樹脂的 份(例 可藉由 對應到 〇 . 队儿秒丨眾樹脂成份,麸德 =成份,最後將溶劑藉由蒸發分離而精製,4 2這個方法,溶劑的流動可較簡化(這 : 清專利範圍第1項,)。 /ίΓ對 第2圖所示,排,氣系統將氣體排放至含有溶 該溶劑是在處理溶劑的方法中被蒸發。這樣的乳 亂冷凝步驟中冷凝,並且此排氣冷凝步驟可以_ 步驟之前。可使用冷凝的液體作為用過的溶 ^ 對應到申請專利範圍第2項)。可利用這個用 為再生溶劑。 〇 外’根據第3圖所示之另一方法,已用於分離阻 方法中之用過的溶劑,例如,由—種或多種主几 如’ ΜΕΑ及DMSO作為主要成份)所組成的清除劑要成 移除阻抗樹脂、水及其他的雜質而再生(這個^方’、 申請專利範圍第3項)。 & 此外,如第4圖所示,可利用另一方法分離由—種 多種主要成份(例如,PGMEA及PGME作為主要成份) ^As shown in Fig. 1, the m method of the ancient anti-resin of the present invention includes removing the resin component (resistance, finally, after the solvent evaporates, dissolving the solvent :: damage (for example, 'water :: agent is recovered as a condensing solvent. This 'recyclable resin component can be removed first, for this reason; because of the influence of non-volatile or dissolved resin components,'; :::: will not be affected by suspension operation. This regeneration device can be stably operated In the method of regenerating the solvent, the condensation is removed. The solvent should be used as a part of this resin in Shen Ruqiang. For example, the resin component can be corresponding to 0.0. = Component, and finally the solvent is refined by evaporation and separation. This method of 4 2 can simplify the flow of the solvent (this: item 1 of the Qing patent scope). / Γ As shown in Figure 2, the exhaust gas system will The gas is discharged to the solvent containing the solvent which is evaporated in the method of processing the solvent. Such a milky condensing step is condensed, and the exhaust gas condensation step can be preceded by the step. The condensed liquid can be used as the used solvent ^ corresponding to Shen The scope of the patent is item 2). This can be used as a regenerating solvent. 〇Outside 'According to another method shown in Figure 3, the solvent used in the separation resistance method has been used, for example, by one or more main solvents. The scavenger composed of 'ΜΕΑ and DMSO as main components) is to be regenerated by removing resistance resin, water and other impurities (this method, item 3 of the scope of patent application). In addition, as in section 4 As shown in the figure, another method can be used to separate a variety of main components (for example, PGMEA and PGME as main components) ^

514962 五、發明說明(7) 成的稀釋劑,# 地,用過的稀:ί釋,已用於分離方法或其他方法。特別 而再生(這個:::错由移除阻抗樹脂、水及其他的雜質 樹脂成到申請專利範圍第4項)。 (falUng flI t成份移除步驟中,利用下降膜 應到申請專利範圍第、5么項破)置。而以高密度移除(這個方法對 Μ E A疋有助於你允々 (碳酸鹽)之溶劑的;Γ子中吸此收:氣/ (叫)並且產生鹽類 驟中,從鹽類而分離出來 ^體疋在揮發性成份移除步 第6項)。 &固方法對應到申請專利範圍 …、父換I置是在每個轉移、 中間提供,使得已在每個步\ 幫浦)的上游或 溫度下進料到之後或之前的步;::洛劑,可在較低的 裝置:壽命(這個方法對應到申請“範可項延)長轉移 如上所述,溶劑成份可藉 軌圍第7項)。 類。此外或可選擇地,氣體 如的虱體而轉換成鹽 示,將已吸收這樣的氣體之用二,,劑中。如第5圖所 移除的步驟,並將溶解的氣體,利’合劑’進一步進行氣體 類似的方法而分離。結果·,可減/用超音波壓印法或其他 利的作用,並且可增加再生溶二^起後續步驟之各種不 申請專利範圍第8項)。 、純度(這個方法對應到 如第6圖所*,已在精製步 質,是持續地監控並最適化地控後传的再生溶劑之品 穩定(這個方法對應到申請專^範’使得溶劑品質可保持 第9項)。 第12514962 V. Description of the invention (7) The diluent formed by # 7, used dilute: used for separation or other methods. Special and regenerative (this ::: wrong is made by removing resistance resin, water and other impurities resin to item 4 of the patent application scope). (In the falUng flI t component removal step, the use of the falling film should be applied to the patent application scope No. 5). And remove it with high density (this method will help you to allow the solvent of (carbonate); Γ absorbs this: gas / (called) and produces salt in the step, from the salt and Isolate ^ body 疋 in step 6 of volatile component removal step). The & solid method corresponds to the scope of patent application ..., the parent replacement is provided in each transfer, so that it has been fed to the next or previous step upstream or at the temperature of each step; :: Lotion can be used in lower devices: longevity (this method corresponds to the application "Fan Keyan extension") as described above, the solvent composition can be borrowed around item 7). Class. In addition or alternatively, gas such as The conversion of the lice body into salt shows that the gas that has been absorbed will be used in two, in the agent. The steps are removed as shown in Figure 5, and the dissolved gas will be further processed in a similar way to the gas mixture. Separation. As a result, the ultrasonic imprinting method or other beneficial effects can be reduced / reduced, and the regeneration solvent can be increased. The various non-patented scopes of the subsequent steps (item 8). Purity (this method corresponds to the first As shown in Figure 6 *, the quality has been refined, and the quality of the recycled solvent is continuously monitored and optimized to control the stability of the post-regeneration solvent.

2042-3900-PF.ptd 514962 w /合刎成伤可在較低的溫度下,藉由較大的壓力降低, 而從用過的溶劑中公遙鱼。ι /-廢爲w 一 ^ ^中離了使用抗腐蝕材料以避免裝置被 腐蝕谷訓所腐蝕。這個構造提供抗腐蝕裝置,立不需要 使用特殊金屬作為抗腐蝕材料(例如,Η /、, ;-絡商品名,可在高溫抵抗酸並且具;高的為強 又個方法對應到申請專利範圍第1 0項)。 f藉由蒸發而分離之揮發性成份(例如,水)混人之 m:的濃度,是在揮發性成份移除步驟中調整。:這 個^驟中,揮發性成份可在比後續冷凝 ^ 更高的溫度下蒗菸。έ士里—、人、t ρ /哪甲的々,果/皿度 凝的液體r ^Ό ,在、竑y驟中’蒸汽轉變成冷 Hi方法對應到中請專㈣圍川項)。 從槽中:;2:f的溶劑’是藉由在壓力下供給氮氣,而 攸?日γ進枓並進料至槽中。妗 (這個方法對虛$丨由太* 、口 叮、准持再生溶劑的品質 去對應到申請專利範圍第1 2項)。 =精製步驟中分離的揮發性成# 體或猎由返回幫浦而_ ^棄液 發性成份是回到# η梦二成伤移除步驟。正常地,揮 的步驟。結果步驟中:並且再次進行相同 專利範圍第1 3項)。σ刀.#效率(這個方法對應到申請 如第7圖所示,#L ti+ ro 置;揮發性成份移除步琶'、要±包括樹脂成份移除裝 序從上游端到下、、纟浐j ,以及精製裴置,其可以這個順 的,因此:1心=:因為樹脂成份是首先被移除 的裝置上產生。此:::作用不會在下游端的後續步驟 生此外,再生的溶劑是藉由蒸發及冷凝而最 514962 五、發明說明(9) 終地獲得,藉此可得到高純度、再生的溶劑(這個方法對 應到申請專利範圍第1 4項)。 樹脂成份移除裝置包括如第8圖所示之下降膜蒗笋 置,使得樹脂成份可易於分離(這個方法 申請γ 範圍第1 5項)。 τ s~ 藉由先移除樹脂成份(非揮發性成份),在裝置 及溶劑品質方面的不利因素,可首先被除去。此外,在 份移除步驟的後續步驟中,雜 官柱中增加。因此,可使用包裝型的蒸飽管柱(這個^ 對應到申請專利範圍第丨6項)^ 彳 提供冷凝裝置,以將藉由蒸發而從揮發性成份 份冷凝。將冷凝裝置保持溫暖,心 $凍/皿度的靶圍内維持冷凝裝置。因此,可達 , 作“個方法對應到申請專利範圍第17項)。’。的知 可容Π'*藉由使用包裝型的蒸餾管柱’再生裝置的大小 小。因此’考量運送及建構的容易性,= 裝置可由夕數的單元而建構(這個 ^正的 圍第1 8項)。 対應到申凊專利範 明。本發明之具體實施例現在將參考所附圖示而詳細說 、-個:5將§兄明溶劑再生裝置(以下稱"再生穿置1"、 1再生襄置1可用於進行本發明之溶劑再), 至第1 2圖顯示再生t置1之結構。 /。第7圖 要再生之用過的溶劑L,可以是製造半導體或液晶裝2042-3900-PF.ptd 514962 w / combined wounds can be fished from the used solvents at lower temperatures and with greater pressure reduction. ι / -waste is used to prevent the device from being corroded by the Corrosion Training Institute. This structure provides anti-corrosion device, which does not need to use special metal as anti-corrosion material (for example, Η / ,,;-network trade name, can resist acid at high temperature and has high strength; another method corresponds to the scope of patent application. Item 10). f The concentration of m: mixed with volatile components (for example, water) separated by evaporation is adjusted in the volatile component removal step. : In this step, the volatile components can be smoked at a higher temperature than subsequent condensation ^.士士 里 —, person, t ρ / Ne Jia's 々, fruit / dish degree, condensed liquid r ^ Ό, in 竑 y step ’steam is transformed into cold Hi method corresponds to the Chinese version, please specialize the Waichuan item). From the tank :; 2: f of the solvent ’is provided by supplying nitrogen under pressure, and what? Day γ is fed and fed into the tank.妗 (This method corresponds to the quality of the virtual solvent from too much *, mouth, and quasi-recycling solvent to item 12 of the scope of patent application). = The volatile component isolated in the refining step or the hunting body is returned to the pump and the waste liquid is returned to the # η 梦 二 成 伤 removal step. Normally, wave the steps. In the result step: the same patent scope item 13 is performed again). σ 刀. # efficient (this method corresponds to the application as shown in Figure 7, #L ti + ro set; volatile component removal step ', want to include the resin component removal sequence from the upstream end to the bottom, 纟浐 j and refined Pei Zhi, which can be smooth, so: 1 heart =: because the resin component is first removed on the device. This ::: The effect will not occur in subsequent steps at the downstream end In addition, the regeneration The solvent is 514962 by evaporation and condensation. 5. Description of the invention (9) is finally obtained, which can obtain a high-purity, regenerated solvent (this method corresponds to item 14 of the scope of patent application). Resin component removal device Including the falling film as shown in Figure 8 makes the resin components easy to separate (this method applies to item 15 of the gamma range). Τ s ~ By removing the resin components (non-volatile components) first, The disadvantages of the device and solvent quality can be removed first. In addition, in the subsequent steps of the portion removal step, the miscellaneous column is added. Therefore, a packaged steam-saturated column (this ^ corresponds to a patent application) Range item 6 ^ Provide condensing device to condense the volatile components by evaporation. Keep the condensing device warm and maintain the condensing device within the target range of freezing / dish degree. Therefore, it is possible to make “a method corresponding to The scope of the patent application is No. 17). '. The knowledge and content Π' * By using a packed distillation column, the size of the regeneration device is small. Therefore, 'the ease of transportation and construction is considered, = the number of units that can be used by the device And the construction (this is around item 18). The application should go to the patent application. The specific embodiments of the present invention will now be described in detail with reference to the attached drawings. (Hereinafter referred to as "regeneration wear 1", 1 regeneration Xiang 1 can be used to carry out the solvent of the present invention), Fig. 12 shows the structure of regeneration t set to 1. Fig. 7 used to be regenerated Solvent L, which can be used in the manufacture of semiconductors or liquid crystal devices

2042-3900-PF.ptd 第14頁 五、發明說明(10) 置後所收集之廢華液體。此外 集自排放系統之;凝的液體。’用過的溶机也可以是收 經由ΐ =:幫=過:溶劑L之溶劑回收槽2,是 )。(::到2明之樹脂溶劑移除裝置及下降膜蒸發裝置 溶劑移除,H二之人/46a及出°糊,是配置在樹脂 配交低表面。此外,樹脂成份出口糾是 可從二排出 並連接至樹脂成份槽7。樹脂成份 樹r H,蒸汽排放埠8a及返回溶劑接收埠8b,是配置在 線8曰冷:/多除裝置5的上部。蒸汽排放埠8a是經由第二管 Ϊ探至蒸镏管㈣的大約中段位置(制到本發明 柱裝/)。蒸館管柱9是包裝型的蒸德管 11是西己置在蒸餘管柱9的上段。再循環埠 菽餾劑1〇a之上,以及蒸汽排放埠12是配置在 為餾官柱9的的頂部。 而將;*二:1卜由第一冷凝器1 4及第-排放冷凝器1 5, 均包括冷卻水循環通: 且 返回管繞?0乃你八^ 再循糸槽16具有再循環通路18、 劑可從栲ifi的广成份排放通路21。再循環槽16中的溶 # Ρ Μ ^ 1 7、氐多除,並且經由再循環通路1 8,藉由再 備玉衣幫浦1 7而通到再掂俨+倉】, LL ^ ^ 而回到再循产;m β再盾埠一谷劑經由返回管線20 閥ηιίί Γ 返回管線20是從再循環通路18、三向 刀 此外’揮發性成份可從槽1 6的上端部份移2042-3900-PF.ptd Page 14 V. Description of the invention (10) Waste liquid collected after disposing. In addition, it is collected from the drainage system; condensed liquid. The used dissolver can also be collected via ΐ =: 帮 = 过: Solvent recovery tank 2 for solvent L, yes). (:: Removal of the solvent from the resin solvent removal device and falling film evaporation device from 2 Ming, H 2 / 46a and the paste are placed on the low surface of resin mating. In addition, the resin component outlet can be adjusted from It is discharged and connected to the resin composition tank 7. The resin composition tree r H, the steam discharge port 8a and the return solvent receiving port 8b are arranged on the upper part of the line 8: / multi-removing device 5. The steam discharge port 8a is via a second pipe Detect to the middle position of the steaming pipe (made to the column of the present invention). The steaming hall pipe 9 is a packaged steaming pipe 11 which is placed on the upper section of the steaming pipe column 9. The recycling port The distillate 10a and the steam discharge port 12 are arranged on the top of the distillation column 9. And the second one: 1 is provided by the first condenser 14 and the first-discharge condenser 15, Both include a cooling water circulation path: and the return pipe is wound? 0 is your eighth ^ recirculation tank 16 has a recirculation path 18, the agent can be discharged from the wide component discharge path 21. The solvent in the recirculation tank 16 Ρ Μ ^ 1 7. Divide more than one, and through the recirculation path 18, through the re-preparation of Yuyi Pump 1 7 to the re 掂 俨 + warehouse], LL ^ ^ Back recycled yield; m β shield another port via a return line 20 Valley agent ηιίί Γ valve 20 is furthermore a return line 'volatile components can be moved from the upper end portion of the groove 16 from the recirculation passage 18, a three-knife

514962 五、發明說明(11) =fI由揮發性成份排放通路21而通到揮發性成份槽 22。揮發性成份可從揮發性成份槽22中排放出來。 Θ =外,填充劑10b是配置在蒸館管柱9的下段内。槽23 2】將:2 :充劑1〇b下方,在管柱9的最下部份。循環管線 經由:r幫連接至加熱再沸器24,以及第四管線28 、、二甶轉私4浦26,而將槽23連接至精餾管柱27。 在其ί: 3 I柱27是托盤型的管柱,並且有多數的托盤配置 排二心j上段内。精㈣⑼是配置在托盤上,以及基汽 排放埠31疋配置在精館管柱27的頂部由 二冷凝器33及第二排放冷凝罘立吕琛工由弟 至A^ 排冷旋34,將蒸汽排放埠31連接 J再德以35。兩個冷凝器34、35均包括冷卻水循環通 再循環槽35具有再循環通路37及再生 外;= 到再循環埠3◦。此 部份移除。 #生成伤排放通路38,而從槽35的上端 此外,槽39是提供在托盤下方,在 部份。循環管線41將管柱.内的槽39連 :227的取下 以及返回通路44經由熱交換…==彿器4〇 ’ 省4 2“ + … 姨凌置)42及返回幫 浦43,而將官柱内的槽39連接至樹 、萬 回溶劑接受埠8b。 77秒I示衷置5的返 再生成份排放通路38是連接到第一 二處理溶劑槽46。第六管線47以4 ::齊:槽:5及第 刀別將槽45及46的底 第16頁 2042-3900-PF.ptd 514962 五、發明說明(12) 部,連接至濃度控制槽48。此外,第七管線5〇經由過濾器 4 9 ’而將濃度控制槽4 8連接至化學供應槽5丨。鐵氟龍過濾 材料是配置在過濾器49内。在化學供應槽51中的化學溶劑 可供給至半導體或液晶的製造步驟。 支官50a是從位於過濾器49及化學供應槽51支間的第 七導官50分支出來。支管5〇a連接到分光鏡分析器52,並 再次接到第七導管5 0。 此外,低壓導管5 4 a及5 4 b將壓力降低裝置5 3 (例如, 真空幫浦)連接至第一排放冷凝器丨5、第二排放冷凝器 34、揮發性成份槽22以及處理溶劑槽託及仙。因此,在基 餾管柱9、精餾管柱27及樹脂成份移除裝置5内的壓力,也 可減少或降低。 如苐8圖所示 體5 5以及圍繞在圓 氣體是從外部導入 55,以及圓柱體55 體58是同軸地及可 有毛刷5 9,放射狀 5 8以毛刷5 9旋轉, 此外,溫度計 管柱27的上段、中 溫度及壓力。 樹脂成份移除裝置5包括一封閉的圓柱 柱體55周圍的加熱裝置56。蒸汽或其他 至加熱裝置56。加熱裝置56加熱圓柱體 的内表面包括一蒸發表面57。圓柱旋轉 旋轉地配置在圓柱體55内。旋轉體58具 地延伸至旋轉體58的周圍表面。旋轉體 其接觸圓柱體55的内表面。 ^ ί力口十刀別提供在蒸餾管柱9及精餾 又下段部份,以便可測量管柱内部的 在這個具體實施例中 管柱9及精餾管柱27的外部 ^沸器24及40分別提供在蒸餾 然而,再沸器24及40可在管514962 V. Description of the invention (11) = fI flows from the volatile component discharge path 21 to the volatile component tank 22. Volatile components may be discharged from the volatile component tank 22. Θ = outside, the filler 10b is arranged in the lower section of the steaming hall column 9. Slot 23 2] will be: 2: the bottom of the charge 10b, at the bottom of the column 9. The circulation line is connected to the heating reboiler 24 via the r-line, and the fourth line 28 and the second line 26 are connected to the 4th line 26, and the tank 23 is connected to the rectification column 27. In its ί: 3 I-pillar 27 is a tray-type tube column, and there are most of the trays arranged in the upper row of the second core j. The precision cylinder is arranged on the tray, and the base steam exhaust port 31 is arranged on the top of the precision hall pipe column 27. The second condenser 33 and the second exhaust condensation are set up. The steam exhaust port 31 is connected to J and then to 35. The two condensers 34 and 35 each include a cooling water circulation passage, and the recirculation tank 35 has a recirculation passage 37 and regeneration; = to the recirculation port 3. This section is removed. #Generating a wound discharge path 38 from the upper end of the slot 35 In addition, the slot 39 is provided below the tray, in part. The circulation line 41 connects the groove 39 in the pipe string: the removal of 227 and the return path 44 via heat exchange ... == Buddha ware 40, province 4 2 "+… aunt set) 42 and return pump 43, and The tank 39 in the official column is connected to the tree and the solvent receiving port 8b. The 77 seconds I indicates that the regenerating component discharge path 38 at 5 is connected to the first and second treatment solvent tank 46. The sixth line 47 is 4: : Qi: trough: 5 and the first knife will be the bottom of the grooves 45 and 46. Page 16 2042-3900-PF.ptd 514962 5. The description of the invention (12) is connected to the concentration control tank 48. In addition, the seventh line 5 〇 The concentration control tank 4 8 is connected to the chemical supply tank 5 through the filter 4 9 ′. The Teflon filter material is arranged in the filter 49. The chemical solvent in the chemical supply tank 51 can be supplied to the semiconductor or liquid crystal The manufacturing officer 50a is branched from the seventh guide member 50 located between the filter 49 and the branch of the chemical supply tank 51. The branch pipe 50a is connected to the spectroscope analyzer 52 and is connected to the seventh conduit 50 again. In addition, the low-pressure ducts 5 4 a and 5 4 b connect the pressure reducing device 5 3 (for example, a vacuum pump) to the first exhaust condensation丨 5, the second discharge condenser 34, the volatile component tank 22, and the processing solvent tank brackets and cents. Therefore, the pressure in the base distillation column 9, the rectification column 27, and the resin component removing device 5 can also be Reduce or lower. As shown in Figure 8 the body 5 5 and the surrounding gas are introduced from the outside 55, and the cylinder 55 body 58 is coaxial and can have a brush 5 9, radial 5 8 with a brush 5 9 In addition, the upper, middle temperature and pressure of the thermometer column 27 are rotated. The resin component removing device 5 includes a heating device 56 surrounding a closed cylindrical column 55. Steam or other to the heating device 56. The heating device 56 heats the cylinder The inner surface includes an evaporation surface 57. The cylinder is rotatably disposed inside the cylinder 55. The rotation body 58 extends to the surrounding surface of the rotation body 58. The rotation body contacts the inner surface of the cylinder 55. ^ 力 口 十The knife is provided in the distillation column 9 and the lower part of the rectification, so that the inside of the pipe string can be measured. In this specific embodiment, the outside of the column 9 and the rectification column 27. The boilers 24 and 40 are respectively provided in the distillation. However, the reboilers 24 and 40 can be

2042-3900-PF.ptd 514962 五、發明說明(13) 柱9及2 7内,與槽2 3及3 9形成一片(例如,排管體形式 )’其具有實質上相同的加熱功效並可降低空間的需求。 如第7圖及第9圖所示,揮發性成份槽2 2具有氮氣導管 6 〇以及開放/關閉閥門6 1 a,以將氮氣導入槽2 2中·。此外, 父換閥門6 1 b、6 1 c、6 1 d及6 1 e,是分別提供在個別連接到 槽2 2的系統(也就是,空氣開放系統)、上游的溶劑進料 系統(揮發性成份排放通路2 1 )、壓力降低系統以及槽2 2 的排放系統。 相似地’如第1 〇圖所示,第一及第二處理溶劑槽4 5及 46 ’具有氮氣導管62及63以及開放/關閉閥門64a及65a, 以將氮氣分別導入槽4 5及4 6中。此外,交換閥門6 4 b、 64c、64d及64e以及65b、65c、65d及65e是提供在連接到 槽4/5及46的系統。特別地,閥門64b及65b是配置在空氣開 放系統’閥門6 4 c及6 5 c是配置在上游的溶劑進料系統(再 生成份排放通路38a及38b);閥門64d及65d是配置在壓力 降低系統;以及閥門64e及65e是配置在槽45及46的排放 統。 、,外’如第11圖所示,絕熱材料6 7覆蓋第一冷凝器1 4 的f,周圍表面,其連接自蒸餾管柱9的頂部、第一排放 ===1 5及冷凍導管(冷卻水)。加熱裝置6 6是包裹在絕 、(、例料67 並且覆蓋壓力降低導管。供應熱的加熱蒸汽 士 1 ί,洛氣)、加熱器或其他裝置,可有效地使用作為 加熱裝置6 6。 現在將根據操作程序以及用過的溶劑支流動而說明再2042-3900-PF.ptd 514962 V. Description of the invention (13) In the columns 9 and 27, one piece (for example, in the form of a row of tubes) is formed with the grooves 23 and 39, which has substantially the same heating effect and can be Reduce space requirements. As shown in FIGS. 7 and 9, the volatile component tank 22 has a nitrogen pipe 6 0 and an open / close valve 6 1 a to introduce nitrogen into the tank 22. In addition, the parent valve 6 1 b, 6 1 c, 6 1 d, and 6 1 e are respectively provided in a system (ie, an air opening system) that is individually connected to the tank 2 2 and an upstream solvent feeding system (volatile The sexual component discharge path 21), the pressure reduction system, and the discharge system of the tank 22. Similarly, as shown in FIG. 10, the first and second processing solvent tanks 45 and 46 'have nitrogen conduits 62 and 63 and open / close valves 64a and 65a to introduce nitrogen into the tanks 4 5 and 4 6 respectively. in. In addition, the switching valves 6 4 b, 64c, 64d, and 64e and 65b, 65c, 65d, and 65e are provided in systems connected to the slots 4/5 and 46. In particular, valves 64b and 65b are arranged in the air-opening system. Valves 6 4 c and 6 5 c are solvent feeding systems arranged upstream (regeneration component discharge paths 38a and 38b); valves 64d and 65d are arranged in pressure reduction. System; and valves 64e and 65e are discharge systems arranged in tanks 45 and 46. As shown in Fig. 11, the insulation material 6 7 covers the f of the first condenser 1 4 and the surrounding surface, which is connected to the top of the distillation column 9, the first discharge === 1 5 and the freezing duct ( Cooling water). The heating device 66 is a heating device 66, which is wrapped in an insulation tube (Example 67, and covers a pressure reducing duct. Heating steam (1), Luo gas), which supplies heat, can be effectively used as the heating device 66. It will now be explained according to the operating procedure and the used solvent branch flow.

2042-3900-PF.ptd2042-3900-PF.ptd

第18頁 514962 五、發明說明(14) 生裝置1的操作 在第7圖中’由於壓力降低導 壓力降低裝置53 (真空幫浦)\ a及54b的傳導,當 5、瘵餾官柱9及精餾管柱2 7是維拄:樹知成份移除裝置 此外,加熱裝置將樹脂成份移::真空的狀態。 精餾管柱27 ,加熱至預定的溫度。,、衣置5、梁餾管柱9及 然後’操作幫浦3以將用過的 料至樹脂成份移除裝置5。举田、a 攸冷劑回收槽2進 々且υ 田用過的、,交添丨丨τ撞 移除裝置5時,顯示在第8圖的/ 入至樹脂成份 過的溶劑L接觸蒸發表面57。1%果轉I58:毛刷59會使得用 而分散,並且分離成揮發性成以 Ϊ=9揮發性成份U是從蒸汽卿^ 作為樹脂成份移除裝置5,可以使用由曰本汕 Se1Z〇 Kalsha公司所製造及販售之„薄膜蒸發器π ,盆且 相同於樹脂成份移除裝置5的結構。 /、/、$ 非揮务性成份L 2沿著樹脂成份移除裝置5的内壁下 降,在底部被收集並儲存在樹脂成份槽7 (參見第7圖及第 8圖)。已導入至蒸餾管柱9的揮發性成份L1,是藉由在向 下移動的精餾溶劑Lr 1及由於熱而向上移動的蒸汽間之氣 體-液體的接觸,而在填充劑1 〇 a及1 〇 b内蒸鶴。結果,揮 發性成份L3被蒸發。蒸發的揮發性成份L3向上移動,並從 ?泰汽排放璋1 2中排放出來。然後,蒸汽是在第一冷凝器1 4 及第一排放冷凝器1 5内冷凝。冷卻水是在冷凝器1 4及1 5的 五、發明說明(15) 周圍循環。冷凝的溶劑(也就是,液體 於再循環槽16中。接著藉由再循環幫浦I ::時儲存 衡’而從槽16的底部排放到蒸餾管柱9的二;埠;广餾平 2凝的溶劑。從再循環溶劑Lrl而 二:= 到再循環槽16。在再循環槽16中之任里^;/1Le回 =,都是經由揮發性成份排放通賴而。:發::: 槽22,並儲存在槽22中以用於排出。 軍毛^成知 為了排出在揮發性成份槽2 2中的揮Page 18 514962 V. Description of the invention (14) The operation of the bioreactor 1 is shown in Fig. 7 'due to the pressure reduction, the conductance reduction device 53 (vacuum pump) \ a and 54b conduct, when 5, retort column 9 And the distillation column 27 is a dimensional: tree knowing component removing device. In addition, the heating device moves the resin component :: vacuum state. The rectification column 27 is heated to a predetermined temperature. , Clothes set 5, beam distillation column 9 and then 'operate pump 3 to send the used material to the resin component removing device 5. For example, when a refrigerant recovery tank 2 enters 々 and υ is used, and it crosses the removal device 5, it is shown in Fig. 8 / The solvent L which has been injected into the resin component contacts the evaporation surface. 57.1% fruit transfer I58: brush 59 will be dispersed and used, and separated into volatile to 成 = 9 volatile components U is from steam steam ^ As a resin component removal device 5, can be used by Yue Benshan The thin film evaporator π manufactured and sold by Se1Zal Kalsha company has the same structure as the resin component removing device 5. /, /, $ The non-volatile component L 2 is along the resin component removing device 5 The inner wall is lowered and collected at the bottom and stored in the resin component tank 7 (see Figures 7 and 8). The volatile component L1 that has been introduced into the distillation column 9 is the rectifying solvent Lr moving downward. 1 and gas-liquid contact between steam moving upward due to heat, and steaming the crane in the fillers 10a and 10b. As a result, the volatile component L3 is evaporated. The evaporated volatile component L3 moves upward, And is discharged from the Thai steam exhaust 璋 1 2. Then, the steam is in the first condenser 1 4 and the first The drain condenser 15 is condensed. The cooling water is circulated around the condensers 14 and 15 of the invention description (15). The condensed solvent (that is, the liquid is in the recirculation tank 16. Then by recycling Pump I :: Time storage scale 'is discharged from the bottom of the tank 16 to the second of the distillation column 9; the port; the distillate 2 condensates the solvent. From the recirculated solvent Lrl and the second: = to the recirculation tank 16. In Renli in the recirculation tank 16; / 1Le back =, all rely on the discharge of volatile components .: Hair ::: tank 22, and stored in the tank 22 for discharge. Jun Mao ^ Chengzhi In order to discharge the

1 Γ,Ι ^ Π ( X ^ ^ H ) 61c ^61d Μ Γ,Λ Λ π I I 閥”交換閥門)61b開放,使得在槽22内的壓: '閉 ^門力放將閥門⑽關閉並將開放/關閉間門…及 e開放。接者,氮氣經由開放/關閉閥門6 2二=揮發性成份心當綱^ :關閉並將闊門61b開放,使得在槽22内的 放,使r捏Ltf。然後’將開放’關閉閥門61。及61(1開 使传揮發性成份L3可儲存在槽22中。 作為=管;9=二’/Γ具有相當輸^ 較古、it? 中之液體。操作轉移幫浦26以將 份L4經由第四導管28,而供應到精餾管柱” 精健管柱27之較高沸點的成份L4 ’是儲 而心=匕9中。一些較高彿點的成份“是藉由熱 移動二i〒 向上移動。蒸發的成份U是藉由在向下 體-、夜體2環液體W及由於熱而向上移動的蒸汽間之氣 的接觸’經由托盤29而蒸餾。結果,精餾成份L51 Γ, Ι ^ Π (X ^ ^ H) 61c ^ 61d Μ Γ, Λ Λ π II valve "exchange valve) 61b is opened, so that the pressure in the groove 22: 'close ^ door force release valve ⑽ and Open / close the door ... and e open. Then, the nitrogen passes through the open / close valve 6 22 = Volatile ingredient care ^: Close and open the wide door 61b, so that it is placed in the groove 22, so that r pinch Ltf. Then 'will open' close the valve 61. And 61 (1 open so that the volatile component L3 can be stored in the tank 22. As = tube; 9 = two '/ Γ has a considerable loss ^ Older, it? Liquid. Operate the transfer pump 26 to pass the portion L4 through the fourth conduit 28 and supply it to the rectification column. "The higher boiling point component L4 'of the precision column 27 is stored in the core = dagger 9. Some higher The composition of the Buddha's point "is moved upward by the heat moving two i〒. The evaporated component U is by the contact of the gas in the lower body-, the night-body 2 ring W and the vapor moving upward due to the heat 'via the tray 29 while distillation. As a result, the rectification component L5

(最終的再生成份)向上 ♦ 來。然後,精镏成份L5是在第’ ^從蒸汽排放埠31排放出 器34内冷凝。冷卻水是=二冷凝器33及第二排放冷凝 的精餾成份L5是暫時周圍循環。冷凝 管綱再循嫩館::再底部排㈣ 槽35的預定水平之任何:ί再:盾,浴劑Lr2。超過再循環 38而通到處理溶劑样45:二:疋經由再生成份排放通路 中心矣益:」 中的一個,並儲存在槽45及46 :以作為。再生浴劑成❾(精館成份)L5 中的一個填滿時,可選擇使用另一個處理溶劑;;。曰 如弟10圖所示,t第一處理溶劑槽45填 /關㈣及64d關閉’並將第二處理溶劑賴的開2 關閉閥門65c及65d開S,使得再生溶劑成份以可儲存 二處理溶劑槽4 6中。 卜當第一或第二處理溶劑槽45或46填滿時,在壓力下將 氮氣通入槽内。結果,再生溶劑成份。是從已填滿的槽“ 或46之一個或另一個,經由第六管線47a或47b而交替地進 到濃度控制槽48。 如第1 0圖所示,為了從第一處理溶劑槽45中排出再生 溶劑成份L5,將開放/關閉閥門64b開放,使得在槽45内的 壓力回到大氣壓力。然後,將閥門64b關閉並將開放/關閉 閥門6 4 a及6 4 e開放。接著,氮氣經由開放/關閉閥門6 4 a進 料至槽45,以便從槽45中排出再生溶劑成份L5。當完成排 放時’將開放/關閉閥門6 4 a及6 4 e關閉並將閥門6 4 b開放,(Final regenerative ingredient) Come up. Then, the refined ingredient L5 is condensed in the exhauster 34 discharged from the steam exhaust port 31. The cooling water is the second condenser 33 and the rectified component L5 condensed by the second discharge is temporarily circulated around. The condensate tube is recirculated in the tender hall: any bottom of the predetermined level of the tank 35: ί re: shield, bath Lr2. Exceeded recycling 38 and passed to the processing solvent sample 45: 2: 疋 through the regenerative component discharge path central benefit: "One of them, and stored in tanks 45 and 46: as. When one of the regenerant bath ingredients (Seikan ingredient) L5 is filled, you can choose to use another processing solvent ;;. As shown in Fig. 10, the first processing solvent tank 45 is filled / closed and 64d is closed ', and the second processing solvent is opened 2 The valves 65c and 65d are opened S, so that the recycled solvent composition can be stored in the second processing Solvent tank 4-6. When the first or second processing solvent tank 45 or 46 is filled, nitrogen gas is passed into the tank under pressure. As a result, the solvent component is regenerated. It is from one or the other of the filled tanks “or 46” to alternately enter the concentration control tank 48 via the sixth line 47a or 47b. As shown in FIG. The regenerated solvent component L5 was discharged, and the opening / closing valve 64b was opened so that the pressure in the tank 45 returned to atmospheric pressure. Then, the valve 64b was closed and the opening / closing valves 6 4 a and 6 4 e were opened. Next, nitrogen Feed to tank 45 via opening / closing valve 6 4 a to discharge the regenerated solvent component L5 from tank 45. When the discharge is completed 'close / open valves 6 4 a and 6 4 e and open valve 6 4 b ,

514962 五、發明說明(17) 使得在槽45内的壓力回到大氣壓力。然後,將開放/關閉 閥門6 4 c及6 4 d開放,使得再生溶劑成份L 5可儲存在槽4 5 中。進行相似的開放及關閉閥門之操作,以便從第二處理 溶劑槽4 6中排出再生溶劑成份L 5。 在濃度控制槽48中之再生溶劑成份L5的濃度,是控制 在所需要的特定濃度範圍内。特別地,分光鏡分析器5 2是 提供在濃度控制槽4 8的下游,並且迅速分析再生溶劑成份 L 5的 >辰度。根據分析的結果’如果任何成份(例如,μ E A 及DMSO )的濃度都沒有達到特定濃度範圍的話,則將要供 應額外量的成份。如果成份的濃度是在特定濃度範圍内的 話,則不需要這樣的調整(參見第6及7圖)。 分光鏡分析器5 2藉由吸收波長的紅外光分析,而測量 流經分支導管50a之再生溶劑成份L6的成份濃度。如果再 生溶劑成份L 6的濃度不在特定濃度範圍内的話,則分光鏡 分析器5 2將停止再生裝置或調整濃度。可使用各種的分光 鏡作為分光鏡分析器。 過濾器4 9將已調整濃度之再生溶劑成份匕6中的粗顆粒 移除。過濾的溶劑L6是儲存在化學供應槽51中,以反向供 應到製造步驟。 ^ 根據此具體實施例,可改善再生用過溶劑之效率、可 得到穩定品質的再生溶劑、可延長再生裝置的壽命並可降 低廢棄溶劑的量,並因此降低廢棄溶劑的處理成本。此 外也可降低用過的溶劑對地球的環境之有害的影響。 此外,在条餾管柱9及精餾管柱27中,可藉由在真空514962 V. Description of the invention (17) The pressure in the groove 45 is returned to atmospheric pressure. Then, the opening / closing valves 6 4 c and 6 4 d are opened, so that the regenerated solvent component L 5 can be stored in the tank 4 5. A similar operation of opening and closing the valve is performed to discharge the regenerated solvent component L 5 from the second processing solvent tank 46. The concentration of the regenerating solvent component L5 in the concentration control tank 48 is controlled within a specific concentration range required. In particular, the spectroscopic analyzer 52 is provided downstream of the concentration control tank 48 and quickly analyzes the > degree of the regenerated solvent component L5. According to the result of the analysis', if the concentration of any component (for example, μ E A and DMSO) does not reach a specific concentration range, an additional amount of component will be supplied. If the concentration of the ingredients is within a specific concentration range, no such adjustment is required (see Figures 6 and 7). The spectroscopic analyzer 52 measures the component concentration of the regenerating solvent component L6 flowing through the branch duct 50a by analyzing the infrared light of the absorption wavelength. If the concentration of the regeneration solvent component L 6 is not within a specific concentration range, the spectroscopic analyzer 52 stops the regeneration device or adjusts the concentration. Various spectroscopes can be used as the spectroscope analyzer. The filter 49 removes the coarse particles in the regenerated solvent component D6 with the adjusted concentration. The filtered solvent L6 is stored in the chemical supply tank 51 to be supplied to the manufacturing steps in the reverse direction. ^ According to this embodiment, the efficiency of regenerating the used solvent can be improved, a regenerating solvent with stable quality can be obtained, the life of the regenerating device can be extended, and the amount of waste solvent can be reduced, and thus the disposal cost of the waste solvent can be reduced. It also reduces the harmful effects of used solvents on the planet's environment. In addition, in the distillation column 9 and the rectification column 27,

514962 五、發明說明(18) ---- (減壓)下蒸發,而將溶劑成份在較低的溫度下,從含有 混合成份中的用過溶劑中分離。因此,藉由在特定溫度或 特定溫度以下的溫度分離溶劑,再生裝置可長時間地 操作’而無須利用特殊的材料也不需要經常更換零件。 例如,如以下表i所示,關於MEA及DMS〇的混合物,當 壓力是從傳統的壓力p〇降低12· 7 kPa時,SUS3 04的溫度可 從傳統的溫度TO降低大約4〇它。結果,可大幅降低腐蝕速 率。因此,可延長再生裝置的壽命,而無須使用特殊的材 料。此外’也可降低製造成本並縮短傳輸時間。 表1 : SUS3 04關於分離溶液(70 %MEA,3〇 %DMS〇 )的溫度 及腐蝕速率 壓力(kPa) Ρ0 P0-6.7 P0-12.7 溫度rc) TO T0-15 T0-40 腐钮速率ΧΙΟ·5 (毫升/年) 20 15 7〜0 此外’根據此具體實施例,用過的溶劑L可再生及回 收。如以下表2所示,可再生多達大約9 〇 %之用過的溶劑 L。因此,必須購買的溶劑量,可大幅地減少至少於1 〇 % 要供應的新溶劑的總量。另一方面,如果不能利用這樣的 再生裝置的話’傳統的方法需要購買丨〇 〇 %的溶劑。因 此’可降低購買的成本並可降低廢棄溶劑的量,並因此也 可大幅降低廢棄溶劑的處理成本。此外,排放冷凝的方法514962 V. Description of the invention (18) ---- (evaporation under reduced pressure), and the solvent component is separated from the used solvent containing the mixed component at a lower temperature. Therefore, by separating the solvent at or below a specific temperature, the regeneration device can be operated for a long time 'without using special materials or requiring frequent replacement of parts. For example, as shown in Table i below, regarding the mixture of MEA and DMS0, when the pressure is reduced by 12.7 kPa from the conventional pressure p0, the temperature of SUS304 can be reduced by about 40% from the conventional temperature TO. As a result, the corrosion rate can be greatly reduced. Therefore, the life of the regeneration device can be extended without using special materials. In addition, it can also reduce the manufacturing cost and the transmission time. Table 1: Temperature and corrosion rate pressure (kPa) of the separation solution (70% MEA, 30% DMS〇) in SUS3 04 (P0 P0-6.7 P0-12.7 temperature rc) TO T0-15 T0-40 Corrosion button rate XΙΟ · 5 (ml / year) 20 15 7 ~ 0 Furthermore, according to this embodiment, the used solvent L can be regenerated and recovered. As shown in Table 2 below, up to about 90% of the used solvent L can be regenerated. Therefore, the amount of solvent that must be purchased can significantly reduce the total amount of new solvent to be supplied by less than 10%. On the other hand, if such a regeneration device cannot be used, the conventional method requires the purchase of a solvent of 1000%. Therefore 'can reduce the cost of purchase and the amount of waste solvent, and therefore can also significantly reduce the disposal cost of waste solvent. In addition, the method of discharging condensation

514962 五、發明說明(19) 可進一步增加可再生之用過溶劑的量。因此,可增加再生 溶劑的絕對量,排放氣體的處理方法對環境也是溫和的, 並可減少新溶劑的購買量。此外’可穩定地保持再生溶劑 的品質’並可延長再生裝置的哥命。 表2 :利用或未利用溶劑再生裝置之間的效果之比較(要 供應的新溶劑的量視為1 〇 〇 ) 用過的溶劑L 再生溶劑 廢棄溶劑 其他C包括 棑放系統) 新供應的溶劑 (購買溶劑) 未利用再 生裝置 102 0 102 7 100 (100) 利用再生 浆置 102 92 10 7 100 (8) 棑放冷凝 107 96 11 2 100 (4) 雖然以上說明之再生裝置1是藉由依序組合樹脂成份 移除裝置5、蒸餾管柱9、精餾管柱27及其他零件而形成, 但再生裝置1也可分割成裝置部份,以便先形成多數的單 元。每個單元可在安裝部位一起連接,以形成再生裝置 1。例如,如第12圖所示,首先將單元68及69分開建構, 並藉由螺拴或其他栓繫裝置而在安裝部位一起連接。514962 V. Description of the invention (19) It can further increase the amount of renewable used solvents. Therefore, the absolute amount of the regenerating solvent can be increased, the treatment method of the exhaust gas is also mild to the environment, and the purchase amount of the new solvent can be reduced. In addition, "the quality of the regeneration solvent can be stably maintained", and the life of the regeneration device can be extended. Table 2: Comparison of effects between regenerating devices with or without solvent (the amount of new solvent to be supplied is considered as 100) used solvent L regenerated solvent waste solvent other C including release system) newly supplied solvent (Purchasing solvent) Unused regeneration device 102 0 102 7 100 (100) Utilized regeneration slurry 102 92 10 7 100 (8) Drain condensation 107 96 11 2 100 (4) Although the regeneration device 1 described above is in order It is formed by combining the resin component removing device 5, the distillation column 9, the rectification column 27, and other parts, but the regeneration device 1 can also be divided into device parts so as to form a large number of units first. Each unit can be connected together at the installation site to form the regeneration device 1. For example, as shown in FIG. 12, the units 68 and 69 are first constructed separately and connected together at the installation site by bolts or other tethering devices.

凡68及69之間的連接導管及傳遞裴置,是易於藉由 連接的凸緣結構而安裝。 JThe connecting ducts and transmission pipes between 68 and 69 are easy to install by connecting flange structure. J

2042-3900-PF.ptd2042-3900-PF.ptd

第24頁 514962 五、發明說明(20) 發明功效 根據申請 份可從用過的 劑。 根據申請 系統所得之冷 根據申請 或多種主成份 根據申請 或多種主成份 根據申請 用過的溶劑中 成份分離操作 根據申請 份可在揮發性 根據申請 長受溫度影塑 ί / 曰 根據申請 用過的溶劑中 再生效率。 根據申請 劑的成份可在 取行動以校正 溶劑可持續供 專利範 凝液體 專利範 所組成 專利範 所組成 專利範 之樹脂 可易於 專利範 成份移 專利範 的幫浦 專利範 之過量 專利I巳圍第1項所定義的第一發明,溶劑成 /谷劑中回收及再生,藉此得到可使用的溶 圍第2項所定義的第二發明,由排放 可回收成為溶劑成份。 圍第3項所定義的第三發明,由一種 之清除劑,可以回收及再生。 圍第4項所定義的第四發明,由一種 之稀释劑,可以回收及再生。 圍第5項所定義的第五發明,包含在 成份’可先有效地移除,使得後續的 進行。 、 圍第6項所定義的第六發明,氣體成 除步驟中分離。 圍,7項所定義的第七發明,可以延 之^哥〇 圍,8項所定義的第八發明,溶解在 的氣體,可首先移除,以改善回收及 利乾圍第9項所定義的第九發明,再生; 生裝置的操作期間持續分析,並可迅速 =何不適當的條件。因&,穩定品 應到化學供應槽。 θPage 24 514962 V. Description of the invention (20) Efficacy of the invention According to the application, the agent can be used. The cold obtained according to the application system is based on the application or multiple main components. According to the application or multiple main components according to the application, the components in the solvent used in the application can be separated according to the application. Regeneration efficiency in solvents. Depending on the composition of the application agent, actions can be taken to correct the solvent. The resin of the patent range composed of the patent range of the liquid patent range can be easily removed. The excess of the patent range of the patent range of the patent range can be easily changed. The first invention defined in the item is recovered and regenerated in a solvent-forming / cereal formulation, thereby obtaining a usable solution. The second invention defined in the second item is recovered and discharged into a solvent component. The third invention defined in item 3 can be recovered and regenerated by a scavenger. The fourth invention defined in item 4 can be recovered and regenerated by a thinner. The fifth invention defined in item 5 can be effectively removed first so that it can be carried out later. The sixth invention as defined in item 6, is separated in the gas removal step. The seventh invention, as defined in item 7, can be extended. The eighth invention, as defined in item 8, can be removed first. The dissolved gas can be removed first to improve the recovery and definition of item 9 The ninth invention, regeneration; continuous analysis during operation of the bioreactor, and can quickly = why not suitable conditions. Because of &, the stable product should go to the chemical supply tank. θ

^62^ 62

根據申請專利範圍第j 〇 * 分離溫度可藉由壓力的下降而降;義?第十發明’溶劑的 定溫度以下的溫度分離溶劑,由在特定溫度或特 作,*無須利用特殊的材料 干破置可長時間穩定地操 根據申請專利範圍第u ; = !更換零件。 慮給予冷;東溫度的最適條件下n m"月’在考 置而液化。 軍务性成伤可藉由冷凝裝 =申請專利範圍第12項所定義 ^ ^ ,, ^ ^ ,〜a v A “ π W疋義的第十二 =:不會有任何雜質混合到溶劑中。 製+ :; ”利範圍第13項所定義的第十三發明,在精 ^ ^ .之車乂回沸點的成份,可以分離並再次萃取,以改 善再生的效率。 干% μ ?文 根據申請專利範圍第14項所定義的第十四發明,溶劑 =伤可從用過的溶劑中回收及再生,#此得到可使用的溶 根據申請專利範圍第1 5項所定義的第十五發明,包含 在用過的溶劑中之樹脂成份,可先有效地移除。 ^ 根據申請專利範圍第1 6項所定義的第十六發明,蒸鶴 官柱以及藉此得到之完整裝置可已是較小的,以降低成本 並改善建構的溶液性。 根據申請專利範圍第丨7項所定義的第十七發明,可避 $沈殿物的產生,其可能是由於特定季節之周圍溫度的改 ^所引起。特別在冬天時,低的周圍溫度條件所引起的超 級冷卻,可增加沈澱的產生。然而,本發明可克服這樣的According to the scope of the patent application, the separation temperature can be reduced by the decrease in pressure; Tenth invention ’Solvent is separated at a temperature lower than a certain temperature. It is separated at a specific temperature or special operation. * No special materials are required. Dry cracking can be used for a long time and stable operation. According to the scope of the patent application, u; =! Replace parts. Considering the optimum conditions of cold temperature, l m " month 'is liquefied under consideration. Military injuries can be defined by condensing equipment = as defined in item 12 of the scope of the patent application ^ ^ ,, ^ ^, ~ av A "π W The meaning of the twelfth =: No impurities will be mixed into the solvent. The thirteenth invention, as defined in the thirteenth invention, can be separated and re-extracted to improve the efficiency of regeneration. The dry% μ is based on the fourteenth invention defined in item 14 of the scope of the patent application. The solvent = wound can be recovered and regenerated from the used solvent. The defined fifteenth invention, the resin component contained in the used solvent, can be effectively removed first. ^ According to the sixteenth invention defined in item 16 of the scope of the patent application, the steamed crane official column and the complete device obtained therefrom are already smaller to reduce costs and improve the solution properties of the construction. According to the seventeenth invention defined in item 7 of the scope of the patent application, the production of $ Shen Dianwu can be avoided, which may be caused by the change of the surrounding temperature in a particular season. Especially in winter, super-cooling caused by low ambient temperature conditions can increase the generation of precipitation. However, the present invention can overcome such

2042-3900.pp.ptd2042-3900.pp.ptd

第26頁 514962 五、發明說明(22) 問題,並可獲得穩定品質的再生溶劑。 根據申請專利範圍第1 8項所定義的第十八發明,完整 的裝置可功能性地分開成多數單元,以改善運送及建構的 容易性。Page 26 514962 V. Description of the invention (22) The problem and a stable quality recycled solvent can be obtained. According to the eighteenth invention defined in item 18 of the scope of patent application, the complete device can be functionally divided into a plurality of units to improve the ease of transportation and construction.

2042-3900-PF.ptd 第27頁2042-3900-PF.ptd Page 27

Claims (1)

514962^514962 ^ 7月 y曰 修正本 六、申請專利範圍 1 · 一種 從含有 移除揮 精製溶 完全蒸發之 2 ·如申 放系統中冷 溶劑的氣體 回收成為用 3 ·如申 用過的溶劑 4.如申 用過的溶劑 成。 5 ·如申 樹脂成份移 6·如申 揮發性成份 氣體成份可 離。 7·如申 每個轉移裳 間將處理的 8·如申 用過溶劑之再生方法’包括· 樹脂成份之用過的溶劑中移除樹脂成份; 發性雜質;以及 劑;其中首先進行樹脂成份移除步驟,在溶劑 後,將再生的溶劑回收作為冷凝溶劑。 請募/利範圍第1項所述之方法,更包括在一排 凝排放氣體的步驟,該排放系統排放含有蒸發 ,其中,在冷凝步驟中所得到的冷凝液體,是 過的溶劑之一部份。 請專利範圍第1項或第2項所述之方法,其中該 包括一清除劑,其由一種或多種的溶劑所組 請專利範圍第1項或第2項所述之方法,其中該 包括一稀釋劑,其由一種或多種的溶劑所組 請專利範圍第1項或第2項所述之方法,其中該 除步驟包括一下降膜蒸發步驟。 μ 請專利範圍第1項或第2項所述之方法,其中在 =除步驟中的揮發性成份及氣體成份在該 分離之閾值溫度或閾值溫度以上的溫度而分" ^專利範圍第1項或第2項所述之方法,其中在 =上游提供一熱交換裝置,其用 :劑再循環、轉移或返回。 隹^之 或第2項所述之方法,其中在 ίΜΟΙΗΛΗ.')iwi “••…咖 ""'― 丨丨丨·· ---/ 丄 丄 修正 i號9mnQ獻 曰 六、申請專利範圍 樹脂成份移除步驟之前,爭& & ^ ^ ^ A Λ ,士 ^ ^ 更包括一氣體移除步驟。 9.如申請專利範圍第1項或第2項所述之方法,n P Ϊ精=劑,心到-主要進匕 J “斤”而回到該主要進料導管中,其中該分析裝置J 控讜處理溶劑的成份,並且控制該裝置之操作。、 —\0·如申請專利範圍第1項或第2項所述之方法,其 =由蒸發而分離該用過溶劑中的溶劑成份之分離溫 猎由壓力的降低而下降,其中該分離溫度是低 : 料可對抗腐蝕之閾值溫度。 逆稱材 Π•如申請專利範圍第1項或第2項所述之方法,其中 Ϊ Ϊ Ϊ性ΐ份中的溶劑之濃度,是在揮發性成份移除步驟 中調整,猎此在揮發性成份移除步驟中的出口溫度, 制在冷凝溫度的範圍内,並且是高於在冷凝步驟中的冷^ 溫度。 ^ 12·如申請專利範圍第1項或第2項所述之方法,其中 該溶劑是藉由在壓力下的供給氮氣,而從一槽及/或處理 溶劑槽中供應至後續步驟。 1 3 ·如申請專利範圍第1項或第2項所述之方法,其中 返回通路是在廢棄液體通路中提供,其中,在精製步驟中 之殘留的液體排出作為廢棄液體,以及其中該返回通路可 選擇性地用於使殘留物返回到樹脂成份移除步驟。 1 4· 一種將含有樹脂成份之用過溶劑再生之裝置,包 括· 樹脂成份移除裝置,用以移除樹脂成份;July y amended the sixth edition of the scope of the patent application1. A method that completely removes the solvent from the removal of refined solvents2. If the cold solvent gas in the application system is recovered 3 Used solvents. 5 · Rushen Resin composition shift 6 · Rushen Volatile content Gas components can be separated. 7. Rushen will transfer each transfer room. 8. Recycling method of used solvents. Including: Resin components are removed from used solvents. Hairy impurities; and agents; where resin components are first processed. In the removing step, after the solvent, the regenerated solvent is recovered as a condensing solvent. The method mentioned in item 1 of the claim / profit scope further includes a step of condensing and discharging the gas, and the exhaust system discharge includes evaporation, wherein the condensed liquid obtained in the condensation step is a part of the used solvent. Serving. The method described in item 1 or 2 of the patent scope, which includes a scavenger composed of one or more solvents. The method described in item 1 or 2 of the patent scope, wherein the method includes A diluent, which is composed of one or more solvents, and the method described in item 1 or 2 of the patent scope, wherein the removing step includes a falling film evaporation step. μ Please refer to the method described in item 1 or 2 of the patent scope, in which the volatile components and gas components in the step of dividing are divided at a temperature above or above the threshold temperature of the separation " ^ Patent Range No. 1 The method according to item 2 or item 2, wherein a heat exchange device is provided upstream of: the agent is recycled, transferred or returned.隹 ^ 之 or the method described in item 2, wherein in ίΜΟΙΗΛΗ. ') Iwi "••… Cafe " "' ― 丨 丨 丨 ·· --- / 丄 丄 Amendment No. 9mnQ Prior to the patent scope resin component removal step, the & & ^ ^ ^ A Λ, Shi ^ ^ also includes a gas removal step. 9. The method described in item 1 or 2 of the patent application scope, n P Ϊ essence = agent, the main feed J "jin" and return to the main feed conduit, where the analysis device J controls the components of the processing solvent and controls the operation of the device.,-\ 0 · The method as described in item 1 or 2 of the scope of the patent application, which means that the separation of the solvent components in the used solvent by evaporation is separated by a decrease in pressure, and the separation temperature is low: Threshold temperature for anti-corrosion. Inverse material Π • The method described in item 1 or 2 of the scope of patent application, wherein the concentration of the solvent in Ϊ Ϊ Ϊ ΐ is adjusted in the volatile component removal step. The temperature of the outlet during the volatile component removal step is controlled at the condensation temperature. The temperature is within the range of, and is higher than the cold temperature in the condensation step. ^ 12. The method as described in claim 1 or 2, wherein the solvent is supplied by nitrogen under pressure, and Supply from a tank and / or a processing solvent tank to the subsequent steps. 1 3 · The method as described in item 1 or 2 of the patent application scope, wherein the return path is provided in the waste liquid path, wherein, in the refining step The residual liquid in the liquid is discharged as waste liquid, and the return path can be selectively used to return the residue to the resin component removing step. 1 4 · A device for regenerating a used solvent containing a resin component, including · Resin component removing device for removing resin component; 第29頁 514962Page 514962 修正______ 一揮發性成份移除裝置,用以移除揮發性雜質;以及 一精製裝置’用以精製溶劑;其中該樹脂成份移除裝 置是在上游提供,在精製的溶劑已在下游蒸發之後,將再 生的溶劑回收作為冷凝溶劑。 、1 5 ·如申請專利範圍第1 4項所述之裝置,其中該樹脂 成份移除裝置包括一下降膜蒸發裝置。 ^ 16·如申請專利範圍第14項或第15項所述之裝置,其 中该揮發性成份移除裝置及精製裝置的一種或兩種,包括 一包裝的蒸顧管柱。 了·如申請專利範圍第14項或第15項所述之裝置,其 :提供一冷凝裝置以將揮發性成份冷凝,其已移除揮發性 姓份移除裝置’以及其中該冷凝裝置是保持溫暖,以便維 、 預疋的循環冷凍溫度範圍。 2·如申請專利範圍第14項或第15項所述之裝置,其 j溶劑再生裝置主要是由樹脂成份移除裝置、揮發性 ^除裝置及精製裝置所組成,以及其中該裝置是分割在 ^兩個裝置之間,以便先形成多數的單元,該 起組合形成該裝置。 19·如申請專利範圍第3項所述之方法,其中在揮發 份;的揮發性成份及氣體成份,是在該氣體成 之閣值溫度或閾值溫度以上的溫度而分離。 性杰如申請專利範圍第14項所述之裝置,其中該揮發 蒸餾管^:^ 2精製裝置的-種或兩種,包括-包裝X的 蔣w > 及&供一冷凝裝置以將揮發性成份冷凝,盆p — ----- 成伤移除裝置,以及該冷凝裝置是保持溫 曰 」多正 山 -^^J〇109865 六、申請專利範圍 暖,以便維掊一 ^ 21 \預疋的循環冷凍溫度範圍 其中該樹脂 其中該揮發 包括一包裝的 士八·如申清專利範圍第2 0項所述之裝晋 成份移除桊罟4 k 只丨4心衣置 裝置包括一下降膜蒸發裝置。 Μ # :如申凊專利範圍第1 4項所述之裂置 ,移除裝置及精製裝置的一種或兩種置 i除= 一冷凝裝置以將揮發性成份:凝心 置除裝置、揮發性成份移除裝置及精製裝 以U成=中該裝置是分割在至少兩個裝置之間, 便先形成夕數的單元,該單元可一起組合形成該裝置。 23·如申請專利範圍第22項所述之裝置,其中該樹脂 成份移除裝置包括一下降膜蒸發裝置。 24·如申請專利範圍第1 6項所述之裝置,其中該溶劑 再生裝置主要疋由樹脂成份移除裝置、揮發性成份移除裝 置及精製裝置所組成,以及其中該裝置是分割在至少兩個 裝置之間,以便先形成多數的單元,該單元可一起組合形 成該裝置。 ' ° 25·如申請專利範圍第4項所述之方法,其中在揮發性 成份移除步驟中的揮發性成份及氣體成份,是在該氣體成 份可分離之閾值溫度或閾值溫度以上的溫度而分離。Amend ______ a volatile component removing device to remove volatile impurities; and a refining device 'for refining the solvent; wherein the resin component removing device is provided upstream, after the refined solvent has evaporated downstream The recovered solvent is recovered as a condensing solvent. 15. The device according to item 14 of the scope of patent application, wherein the resin component removing device includes a falling film evaporation device. ^ 16. The device according to item 14 or item 15 of the scope of patent application, wherein one or both of the volatile component removing device and the refining device include a packaged steaming tube column. The device according to item 14 or item 15 of the scope of patent application, which includes: providing a condensing device to condense volatile components, removing the volatile surname removing device ', and wherein the condensing device is holding Warm, pre-chilled circulating freezing temperature range. 2. The device described in item 14 or 15 of the scope of patent application, the j solvent regeneration device is mainly composed of a resin component removal device, a volatile removal device and a purification device, and the device is divided in ^ Between the two devices, so as to form the majority of the units, the combination is formed to form the device. 19. The method according to item 3 of the scope of patent application, wherein the volatile components and gas components are separated at a temperature above the threshold temperature or threshold temperature of the gas. Xingjie is the device described in item 14 of the scope of patent application, in which the volatile distillation tube ^: ^ 2-one or two of the refining device, including-packaging X's Jiang w > and & a condensing device for Volatile components are condensed, basin p — ----- injury removal device, and the condensing device is kept warm "Duo Zheng Shan-^^ J〇109865 6. The scope of the patent application is warm, so as to maintain a ^ 21 \ The temperature range of the circulating freezing temperature in which the resin is included. The volatilization includes a package of taxi. The removal of the ingredients as described in item 20 of the patent application scope. 4k only. A falling film evaporation device. Μ #: As described in item 14 of the scope of the patent application, one or both of the removal device and the refining device are placed i divided = a condensation device to remove the volatile components: solidified removal device, volatile The component removing device and the refining device are divided into at least two devices, and then the number of units is formed first, and the units can be combined to form the device. 23. The device according to item 22 of the scope of patent application, wherein the resin component removing device comprises a falling film evaporation device. 24. The device according to item 16 of the scope of patent application, wherein the solvent regeneration device is mainly composed of a resin component removing device, a volatile component removing device, and a refining device, and wherein the device is divided into at least two Between the two devices so as to form a plurality of units first, the units can be combined together to form the device. '° 25. The method as described in item 4 of the scope of the patent application, wherein the volatile component and the gas component in the volatile component removal step are at a threshold temperature at which the gas component can be separated or a temperature above the threshold temperature. Separation. 第31頁Page 31
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CN113072447A (en) * 2021-03-29 2021-07-06 新中天环保股份有限公司 Method for recovering PGMEA from electronic PGMEA waste solvent

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JP3409028B2 (en) 2003-05-19
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CN1181520C (en) 2004-12-22
KR20010104641A (en) 2001-11-26
KR100665559B1 (en) 2007-01-10

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