JP2674516B2 - アクティブマトリクス基板およびその製造方法 - Google Patents

アクティブマトリクス基板およびその製造方法

Info

Publication number
JP2674516B2
JP2674516B2 JP19018994A JP19018994A JP2674516B2 JP 2674516 B2 JP2674516 B2 JP 2674516B2 JP 19018994 A JP19018994 A JP 19018994A JP 19018994 A JP19018994 A JP 19018994A JP 2674516 B2 JP2674516 B2 JP 2674516B2
Authority
JP
Japan
Prior art keywords
film
semiconductor layer
resistance semiconductor
electrode
high resistance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP19018994A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0836192A (ja
Inventor
道昭 坂本
進 大井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP19018994A priority Critical patent/JP2674516B2/ja
Priority to TW84107300A priority patent/TW270231B/zh
Publication of JPH0836192A publication Critical patent/JPH0836192A/ja
Application granted granted Critical
Publication of JP2674516B2 publication Critical patent/JP2674516B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Liquid Crystal (AREA)
  • Thin Film Transistor (AREA)
JP19018994A 1994-07-21 1994-07-21 アクティブマトリクス基板およびその製造方法 Expired - Fee Related JP2674516B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP19018994A JP2674516B2 (ja) 1994-07-21 1994-07-21 アクティブマトリクス基板およびその製造方法
TW84107300A TW270231B (cs) 1994-07-21 1995-07-14

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19018994A JP2674516B2 (ja) 1994-07-21 1994-07-21 アクティブマトリクス基板およびその製造方法

Publications (2)

Publication Number Publication Date
JPH0836192A JPH0836192A (ja) 1996-02-06
JP2674516B2 true JP2674516B2 (ja) 1997-11-12

Family

ID=16253938

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19018994A Expired - Fee Related JP2674516B2 (ja) 1994-07-21 1994-07-21 アクティブマトリクス基板およびその製造方法

Country Status (2)

Country Link
JP (1) JP2674516B2 (cs)
TW (1) TW270231B (cs)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100397225C (zh) * 2004-06-05 2008-06-25 Lg.菲利浦Lcd株式会社 一种液晶显示器件及其制造方法
CN100407035C (zh) * 2004-06-05 2008-07-30 乐金显示有限公司 液晶显示器件及其制造方法
CN100529932C (zh) * 2004-06-05 2009-08-19 乐金显示有限公司 液晶显示器件及其制造方法
CN100529933C (zh) * 2004-06-05 2009-08-19 乐金显示有限公司 透反射式液晶显示器件及其制造方法

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19990018395A (ko) * 1997-08-27 1999-03-15 윤종용 다결정 실리콘 박막 트랜지스터 액정 표시 소자의 제조 방법
KR101924473B1 (ko) * 2010-12-28 2018-12-03 엘지디스플레이 주식회사 박막 트랜지스터 어레이 기판 및 이의 제조 방법
JP6019330B2 (ja) * 2012-02-09 2016-11-02 株式会社Ｊｏｌｅｄ 薄膜トランジスタ、薄膜トランジスタの製造方法、表示装置および電子機器
JP2014170829A (ja) * 2013-03-04 2014-09-18 Sony Corp 半導体装置およびその製造方法、並びに表示装置の製造方法および電子機器の製造方法
CN105206567B (zh) * 2015-10-10 2018-04-10 深圳市华星光电技术有限公司 一种阵列基板及其制作方法
CN106298810B (zh) * 2016-09-23 2019-06-11 上海天马微电子有限公司 阵列基板制造方法、阵列基板、显示面板及显示装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2678044B2 (ja) * 1989-01-25 1997-11-17 松下電器産業株式会社 アクティブマトリクス基板の製造方法
JP2711003B2 (ja) * 1989-12-25 1998-02-10 三菱電機株式会社 マトリツクス型表示装置
JP2618520B2 (ja) * 1990-08-09 1997-06-11 シャープ株式会社 アクティブマトリクス液晶表示装置の製造方法
JPH05323378A (ja) * 1992-05-27 1993-12-07 Toshiba Corp 液晶表示装置用アレイ基板
JPH0682830A (ja) * 1992-08-31 1994-03-25 Dainippon Printing Co Ltd アクティブマトリックス液晶表示装置およびその製造方法
JP3071964B2 (ja) * 1992-10-09 2000-07-31 富士通株式会社 液晶表示装置の製造方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100397225C (zh) * 2004-06-05 2008-06-25 Lg.菲利浦Lcd株式会社 一种液晶显示器件及其制造方法
CN100407035C (zh) * 2004-06-05 2008-07-30 乐金显示有限公司 液晶显示器件及其制造方法
CN100529932C (zh) * 2004-06-05 2009-08-19 乐金显示有限公司 液晶显示器件及其制造方法
CN100529933C (zh) * 2004-06-05 2009-08-19 乐金显示有限公司 透反射式液晶显示器件及其制造方法

Also Published As

Publication number Publication date
TW270231B (cs) 1996-02-11
JPH0836192A (ja) 1996-02-06

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