JP2553857Y2 - 光洗浄装置 - Google Patents
光洗浄装置Info
- Publication number
- JP2553857Y2 JP2553857Y2 JP1990042955U JP4295590U JP2553857Y2 JP 2553857 Y2 JP2553857 Y2 JP 2553857Y2 JP 1990042955 U JP1990042955 U JP 1990042955U JP 4295590 U JP4295590 U JP 4295590U JP 2553857 Y2 JP2553857 Y2 JP 2553857Y2
- Authority
- JP
- Japan
- Prior art keywords
- transport
- substrate
- lamp
- light
- ultraviolet lamp
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004140 cleaning Methods 0.000 title claims description 32
- 239000000758 substrate Substances 0.000 claims description 52
- 238000012545 processing Methods 0.000 claims description 37
- 238000012546 transfer Methods 0.000 claims description 15
- 239000000463 material Substances 0.000 claims description 13
- 239000000126 substance Substances 0.000 claims description 8
- 230000003287 optical effect Effects 0.000 description 13
- 230000000694 effects Effects 0.000 description 5
- 239000011521 glass Substances 0.000 description 4
- 230000005855 radiation Effects 0.000 description 4
- 230000008016 vaporization Effects 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 238000005108 dry cleaning Methods 0.000 description 3
- 238000005192 partition Methods 0.000 description 3
- 239000011295 pitch Substances 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 230000007723 transport mechanism Effects 0.000 description 3
- 238000011109 contamination Methods 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000000087 stabilizing effect Effects 0.000 description 2
- 238000009834 vaporization Methods 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000000638 solvent extraction Methods 0.000 description 1
Landscapes
- Cleaning In General (AREA)
- ing And Chemical Polishing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1990042955U JP2553857Y2 (ja) | 1990-04-20 | 1990-04-20 | 光洗浄装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1990042955U JP2553857Y2 (ja) | 1990-04-20 | 1990-04-20 | 光洗浄装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH042023U JPH042023U (enrdf_load_stackoverflow) | 1992-01-09 |
| JP2553857Y2 true JP2553857Y2 (ja) | 1997-11-12 |
Family
ID=31554952
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1990042955U Expired - Lifetime JP2553857Y2 (ja) | 1990-04-20 | 1990-04-20 | 光洗浄装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2553857Y2 (enrdf_load_stackoverflow) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2894579B2 (ja) * | 1992-03-19 | 1999-05-24 | 松下電工株式会社 | 回路基板のボンディング前処理方法 |
| TW541569B (en) * | 2001-01-15 | 2003-07-11 | Japan Storage Battery Co Ltd | Photo treatment device |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62190730A (ja) * | 1986-02-17 | 1987-08-20 | Nec Corp | 半導体装置の洗浄装置 |
| JPS63204729A (ja) * | 1987-02-20 | 1988-08-24 | Fujitsu Ltd | 半導体基板の乾式洗浄方法 |
-
1990
- 1990-04-20 JP JP1990042955U patent/JP2553857Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH042023U (enrdf_load_stackoverflow) | 1992-01-09 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |