JP2540555Y2 - 洗浄槽 - Google Patents
洗浄槽Info
- Publication number
- JP2540555Y2 JP2540555Y2 JP1990121208U JP12120890U JP2540555Y2 JP 2540555 Y2 JP2540555 Y2 JP 2540555Y2 JP 1990121208 U JP1990121208 U JP 1990121208U JP 12120890 U JP12120890 U JP 12120890U JP 2540555 Y2 JP2540555 Y2 JP 2540555Y2
- Authority
- JP
- Japan
- Prior art keywords
- cleaning tank
- hole
- quartz
- tank
- cleaning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004140 cleaning Methods 0.000 title claims description 37
- 239000010453 quartz Substances 0.000 claims description 15
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 15
- 239000000126 substance Substances 0.000 claims description 13
- 230000007797 corrosion Effects 0.000 claims description 6
- 238000005260 corrosion Methods 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 5
- 238000005406 washing Methods 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 125000002066 L-histidyl group Chemical group [H]N1C([H])=NC(C([H])([H])[C@](C(=O)[*])([H])N([H])[H])=C1[H] 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 210000004243 sweat Anatomy 0.000 description 1
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1990121208U JP2540555Y2 (ja) | 1990-11-21 | 1990-11-21 | 洗浄槽 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1990121208U JP2540555Y2 (ja) | 1990-11-21 | 1990-11-21 | 洗浄槽 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0479423U JPH0479423U (enrdf_load_stackoverflow) | 1992-07-10 |
| JP2540555Y2 true JP2540555Y2 (ja) | 1997-07-09 |
Family
ID=31869079
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1990121208U Expired - Lifetime JP2540555Y2 (ja) | 1990-11-21 | 1990-11-21 | 洗浄槽 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2540555Y2 (enrdf_load_stackoverflow) |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5665642U (enrdf_load_stackoverflow) * | 1979-10-24 | 1981-06-01 | ||
| JPS6382723U (enrdf_load_stackoverflow) * | 1986-11-18 | 1988-05-31 | ||
| JPH0331174Y2 (enrdf_load_stackoverflow) * | 1987-04-27 | 1991-07-02 | ||
| JPH0195521A (ja) * | 1987-10-07 | 1989-04-13 | Hitachi Ltd | 洗浄方法および装置 |
-
1990
- 1990-11-21 JP JP1990121208U patent/JP2540555Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0479423U (enrdf_load_stackoverflow) | 1992-07-10 |
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