JP2540555Y2 - Cleaning tank - Google Patents

Cleaning tank

Info

Publication number
JP2540555Y2
JP2540555Y2 JP1990121208U JP12120890U JP2540555Y2 JP 2540555 Y2 JP2540555 Y2 JP 2540555Y2 JP 1990121208 U JP1990121208 U JP 1990121208U JP 12120890 U JP12120890 U JP 12120890U JP 2540555 Y2 JP2540555 Y2 JP 2540555Y2
Authority
JP
Japan
Prior art keywords
cleaning tank
hole
quartz
tank
cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1990121208U
Other languages
Japanese (ja)
Other versions
JPH0479423U (en
Inventor
篤泰 朝香
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kaijo Corp
Original Assignee
Kaijo Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kaijo Corp filed Critical Kaijo Corp
Priority to JP1990121208U priority Critical patent/JP2540555Y2/en
Publication of JPH0479423U publication Critical patent/JPH0479423U/ja
Application granted granted Critical
Publication of JP2540555Y2 publication Critical patent/JP2540555Y2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Description

【考案の詳細な説明】 [産業上の利用分野] 本考案は、石英からなる洗浄槽に係り、特に頻繁に移
動され、且つ大型な洗浄槽に関する。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a cleaning tank made of quartz, and more particularly, to a frequently moved and large cleaning tank.

[従来の技術] 従来、この種の石英からなる洗浄槽は、一部の薬品を
除きほとんどの薬品、薬液に腐食されず、また高温でも
使用できることから、種々の製造プロセスにて用いられ
る。特に半導体製造プロセスにあっては、ウェハーを薬
液中に浸けて洗浄する工程があり、この場合の洗浄槽と
して石英槽が一般的に使用されている。
[Related Art] Conventionally, a cleaning tank made of quartz of this kind is used in various manufacturing processes because it is not corroded by most chemicals and chemicals except for a part of chemicals and can be used even at high temperatures. Particularly in the semiconductor manufacturing process, there is a step of washing the wafer by immersing it in a chemical solution. In this case, a quartz tank is generally used as a washing tank.

第5図は、従来の石英からなる洗浄槽及びその取扱方
法を示す図であり、洗浄槽1は、長方体形状で上端10を
開放した容器であり、装置への組み込みあるいは交換時
等に図に示すように作業者が手で持ちあげるなどして移
動させている。
FIG. 5 is a diagram showing a conventional cleaning tank made of quartz and a method for handling the same. The cleaning tank 1 is a container having a rectangular parallelepiped shape and having an open upper end 10, and is used for installation in an apparatus or replacement. As shown in the figure, the worker lifts and moves it by hand.

[考案が解決しようとする課題] しかしながら、従来のシリコンウェハは直径6インチ
のものであるが、最近では直径8インチのものも現わ
れ、これに伴ないウェハキャリアの大型化、更に洗浄槽
の大型化が要求されるようになっている。
[Problem to be Solved by the Invention] However, although the conventional silicon wafer has a diameter of 6 inches, a wafer having a diameter of 8 inches has recently appeared. Is required.

石英によりなる洗浄槽は、比較的重量が大であるこ
と、また薬液に対する排気や、割れを考慮した二重槽構
造とされているため、それに伴う槽の大型化は取り扱い
が増々困難となり、従来のように洗浄槽1の上端縁を手
で把持するような作業方法では、手に付着した汗又は水
分などで洗浄槽を落下させ、破損する恐れがある。また
石英槽は、材料が高価であることや製作が困難であるこ
となどから全体として高価格となるため、破損を繰り返
せば、製造コストにも悪影響を与えることになりかねな
い。
The cleaning tank made of quartz has a relatively large weight, and has a double tank structure that takes into account the exhaust of chemicals and cracks. In the work method in which the upper edge of the cleaning tank 1 is gripped by hand as described above, there is a possibility that the cleaning tank may be dropped by sweat or moisture attached to the hand and may be damaged. In addition, since the quartz tank is expensive as a whole due to the high cost of the material and the difficulty in manufacturing, repeated damage may adversely affect the manufacturing cost.

そこで、本考案は、上記従来技術の欠点に鑑みてなさ
れたものであって、取扱が安易な石英洗浄槽の提供を目
的としている。
In view of the above, the present invention has been made in view of the above-mentioned drawbacks of the related art, and has as its object to provide a quartz washing tank that is easy to handle.

[課題を解決するための手段] 本考案は、重量が大である石英にて形成され、貯蔵し
た薬品にて被洗浄物を洗浄する洗浄槽であって、開放さ
れた上端近傍に孔が形成されて該孔の上部が把手部とな
され、石英又は耐食性に優れた材料にて形成されて該孔
を閉塞する閉塞部材を有するように構成したものであ
る。
[Means for Solving the Problems] The present invention is a cleaning tank for cleaning an object to be cleaned, which is formed of heavy quartz and stores stored chemicals, wherein a hole is formed near an open upper end. Then, the upper portion of the hole is formed as a handle portion, and is formed of quartz or a material having excellent corrosion resistance, and has a closing member for closing the hole.

[作用] この構成によれば、洗浄槽を装置に組み込んだり、交
換する際に作業者は上記孔に指をかけて把手部を把持す
る。そして、洗浄作業を行うべく洗浄槽内に薬液を注ぐ
際、上記閉塞部材を用いて上記孔が塞がれる。
[Operation] According to this configuration, when assembling the cleaning tank into the apparatus or replacing the cleaning tank, the operator puts his / her finger on the hole and holds the handle. Then, when pouring a chemical solution into the cleaning tank to perform the cleaning operation, the hole is closed using the closing member.

[実施例] 次に、本考案の実施例を図面を用いて説明する。Embodiment Next, an embodiment of the present invention will be described with reference to the drawings.

第1図及び第2図は、本考案の第1実施例を示す図で
ある。
1 and 2 are views showing a first embodiment of the present invention.

図において、石英からなる洗浄槽1は、上端1aが開放
された長方体形状であり、上端近傍の両側面には突片か
らなる把手2が一体に設けられている。この把手2は、
石英にて洗浄槽加工時に一体成形されても良いし、洗浄
槽形成の後に、ネジ止め、接着剤などの別部材にて固着
形成しても良い。但し、別部材である場合には、洗浄液
に対する耐腐触性につき十分考慮する必要がある。
In the figure, a cleaning tank 1 made of quartz has a rectangular shape with an upper end 1a opened, and handles 2 made of protruding pieces are integrally provided on both side surfaces near the upper end. This handle 2
The cleaning tank may be integrally formed at the time of processing the cleaning tank, or may be fixedly formed with another member such as a screw or an adhesive after forming the cleaning tank. However, if it is a separate member, it is necessary to sufficiently consider the corrosion resistance to the cleaning liquid.

また、第3図及び第4図には本考案の第2実施例が示
されている。
FIGS. 3 and 4 show a second embodiment of the present invention.

この実施例は、石英からなる長方体形状の洗浄槽1の
上端近傍の両側壁に孔1bを形成し、この孔1bに指をかけ
ることにより孔1b上部を把手部2とするものである。孔
1bによる把手部2は、該洗浄槽1の側面と面一であり、
前述の如く二重槽構造とした場合等、洗浄槽1の外部寸
法に余裕がない場合に有効である。なお、孔1bは洗浄槽
1を作業者が取り扱う場合にのみ開放し、それ以外は第
4図に示すように閉塞部材としてのプラグ3にて閉塞す
るのが望ましい。すなわち、洗浄槽1は薬液を貯留する
必要があることから、洗浄作業を行うべく薬液を注ぐ際
にはこのプラグ3によって孔1bを塞ぎ、所定の貯留容積
を確保するものである。このプラグ3は石英又は耐食性
に優れた材料にて形成される。
In this embodiment, holes 1b are formed on both side walls near the upper end of a rectangular cleaning tank 1 made of quartz, and a finger 2 is put on the holes 1b to make upper portions of the holes 1b handle portions 2. . Hole
The handle portion 2 by 1b is flush with the side surface of the washing tank 1,
This is effective when the external dimensions of the cleaning tank 1 are not sufficient, such as in the case of a double tank structure as described above. The hole 1b is desirably opened only when the operator handles the cleaning tank 1, and the rest is desirably closed with a plug 3 as a closing member as shown in FIG. That is, since the cleaning tank 1 needs to store a chemical solution, the plug 1 closes the hole 1b when pouring the chemical solution to perform the cleaning operation, thereby securing a predetermined storage volume. The plug 3 is formed of quartz or a material having excellent corrosion resistance.

作業者は、第1及び第2実施例に示される把手部2を
持って洗浄槽1の装置への組み込み、あるいは交換作業
を行なう。
The operator holds the handle portion 2 shown in the first and second embodiments, and installs or replaces the cleaning tank 1 into the apparatus.

[考案の効果] 以上のように、本考案によれば、把手部を用いること
によって取り扱い作業は安全且つ容易に行なうことがで
き、洗浄槽の破損も防止できる効果がある。
[Effects of the Invention] As described above, according to the present invention, the handling operation can be performed safely and easily by using the handle, and the cleaning tank can be prevented from being damaged.

また、本考案による洗浄槽においては、開放された上
端近傍に孔が形成され、該孔の上部が把手部となされて
いる。かかる把手部は洗浄槽の側面と面一であるから二
重槽構造とした場合等、洗浄槽の外部寸法に余裕がない
場合に有効であり、また、該孔に作業者が指を挿入する
ことによってしっかりと保持することが出来、それ故に
外槽に対する出し入れ作業を楽に且つ確実に行ない得
る。
In the cleaning tank according to the present invention, a hole is formed near the open upper end, and the upper part of the hole serves as a handle. Such a handle is flush with the side surface of the washing tank, so it is effective when the outer dimensions of the washing tank have no margin, such as in the case of a double tank structure, and an operator inserts a finger into the hole. This makes it possible to hold firmly, so that the work of taking in and out of the outer tank can be performed easily and reliably.

更に、本考案による洗浄槽においては、上記構成に加
え、上記孔を閉塞する閉塞部材を有している。すなわ
ち、洗浄槽は薬液を貯留する必要があることから、洗浄
作業を行なうべく薬液を洗浄槽内に注ぐ際には閉塞部材
によって孔を塞ぎ、所定の貯留容積を確保するものであ
る。
Further, the cleaning tank according to the present invention has a closing member for closing the hole in addition to the above configuration. That is, since the cleaning tank needs to store the chemical solution, when pouring the chemical solution into the cleaning tank to perform the cleaning operation, the hole is closed by the closing member to secure a predetermined storage volume.

加えて、上記閉塞部材については、石英又は薬液に対
する十分な耐食性を有する材料が採用されているので、
腐食が防止され、長期にわたる使用が可能である。
In addition, for the closing member, since quartz or a material having sufficient corrosion resistance to a chemical solution is adopted,
Corrosion is prevented and long-term use is possible.

【図面の簡単な説明】[Brief description of the drawings]

第1図は、本考案の第1実施例を示す斜視図、第2図
(a)は、同実施例の断面図、第2図(b)は、その側
面図、第3図は、本考案の第2実施例を示す斜視図、第
4図(a)は、同実施例の断面図、第4図(b)は、そ
の側面図、第5図は、従来の洗浄槽の形状及びその取扱
作業を説明する斜視図である。 1……洗浄槽、1a……上端、1b……孔、2……把手部、
3……プラグ。
FIG. 1 is a perspective view showing a first embodiment of the present invention, FIG. 2 (a) is a sectional view of the embodiment, FIG. 2 (b) is a side view thereof, and FIG. FIG. 4 (a) is a cross-sectional view of the same embodiment, FIG. 4 (b) is a side view thereof, and FIG. 5 is a diagram showing a conventional cleaning tank. It is a perspective view explaining the handling operation. 1 ... cleaning tank, 1a ... upper end, 1b ... hole, 2 ... handle part,
3. Plug.

Claims (1)

(57)【実用新案登録請求の範囲】(57) [Scope of request for utility model registration] 【請求項1】重量が大である石英にて形成され、貯蔵し
た薬品にて被洗浄物を洗浄する洗浄槽であって、 開放された上端近傍に孔が形成されて該孔の上部が把手
部となされ、 石英又は耐食性に優れた材料にて形成されて該孔を閉塞
する閉塞部材を有することを特徴とする洗浄槽。
1. A cleaning tank for cleaning an object to be cleaned, which is made of quartz having a large weight and stores stored chemicals, wherein a hole is formed near an open upper end, and an upper portion of the hole is a handle. A cleaning tank comprising a closing member formed of quartz or a material having excellent corrosion resistance and closing the hole.
JP1990121208U 1990-11-21 1990-11-21 Cleaning tank Expired - Lifetime JP2540555Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1990121208U JP2540555Y2 (en) 1990-11-21 1990-11-21 Cleaning tank

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1990121208U JP2540555Y2 (en) 1990-11-21 1990-11-21 Cleaning tank

Publications (2)

Publication Number Publication Date
JPH0479423U JPH0479423U (en) 1992-07-10
JP2540555Y2 true JP2540555Y2 (en) 1997-07-09

Family

ID=31869079

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1990121208U Expired - Lifetime JP2540555Y2 (en) 1990-11-21 1990-11-21 Cleaning tank

Country Status (1)

Country Link
JP (1) JP2540555Y2 (en)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5665642U (en) * 1979-10-24 1981-06-01
JPS6382723U (en) * 1986-11-18 1988-05-31
JPH0331174Y2 (en) * 1987-04-27 1991-07-02
JPH0195521A (en) * 1987-10-07 1989-04-13 Hitachi Ltd Cleaning and its equipment

Also Published As

Publication number Publication date
JPH0479423U (en) 1992-07-10

Similar Documents

Publication Publication Date Title
JP2591575B2 (en) Package for storage disk
US6086127A (en) Method of making a carrier for at least one wafer
TWI283038B (en) Thin plate storage container
JP2540555Y2 (en) Cleaning tank
JP3538204B2 (en) Thin plate support container
KR100234359B1 (en) Wafer cassette having the box function
US20220359236A1 (en) Space filling device for wet bench
JPH11255261A (en) Packing method of roll brush for cleaning substrate, packing body, and fitting method of roll brush for cleaning substrate
JP2509914Y2 (en) Cassette storage pod
JPH0735397Y2 (en) Semiconductor wafer storage box
JP4338467B2 (en) Large pellicle storage container
JPH07592Y2 (en) Floor inspection handle
JPH06387Y2 (en) Lens storage case
JPH0451482Y2 (en)
JPH0355547Y2 (en)
JPH07307380A (en) Carrier box
TWI564126B (en) Assembling tool pallet and its packing box
JP2601534Y2 (en) Cleaning barrel
JP3578955B2 (en) Wafer protection container
JPH078069Y2 (en) Tray set for chip cleaning
JPS6119106Y2 (en)
KR200156734Y1 (en) A box for semiconductor wafer custody
JPS6016544Y2 (en) Container for transporting lightweight parts
JPS6032Y2 (en) Lid holding device for bucket with lid
JPS6355431U (en)