JP2529563B2 - 真空蒸着法 - Google Patents

真空蒸着法

Info

Publication number
JP2529563B2
JP2529563B2 JP62021780A JP2178087A JP2529563B2 JP 2529563 B2 JP2529563 B2 JP 2529563B2 JP 62021780 A JP62021780 A JP 62021780A JP 2178087 A JP2178087 A JP 2178087A JP 2529563 B2 JP2529563 B2 JP 2529563B2
Authority
JP
Japan
Prior art keywords
base material
vapor deposition
thin film
deposition method
electron beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62021780A
Other languages
English (en)
Japanese (ja)
Other versions
JPS63190164A (ja
Inventor
直記 本多
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissan Motor Co Ltd
Original Assignee
Nissan Motor Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissan Motor Co Ltd filed Critical Nissan Motor Co Ltd
Priority to JP62021780A priority Critical patent/JP2529563B2/ja
Priority to DE19883803189 priority patent/DE3803189A1/de
Publication of JPS63190164A publication Critical patent/JPS63190164A/ja
Priority to US07/511,970 priority patent/US4976988A/en
Application granted granted Critical
Publication of JP2529563B2 publication Critical patent/JP2529563B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
JP62021780A 1987-02-03 1987-02-03 真空蒸着法 Expired - Lifetime JP2529563B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP62021780A JP2529563B2 (ja) 1987-02-03 1987-02-03 真空蒸着法
DE19883803189 DE3803189A1 (de) 1987-02-03 1988-02-03 Vakuumverdampfungsverfahren mit verwendung eines sublimierbaren quellenmaterials
US07/511,970 US4976988A (en) 1987-02-03 1990-04-17 Vacuum evaporation method for zinc sulfide

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62021780A JP2529563B2 (ja) 1987-02-03 1987-02-03 真空蒸着法

Publications (2)

Publication Number Publication Date
JPS63190164A JPS63190164A (ja) 1988-08-05
JP2529563B2 true JP2529563B2 (ja) 1996-08-28

Family

ID=12064574

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62021780A Expired - Lifetime JP2529563B2 (ja) 1987-02-03 1987-02-03 真空蒸着法

Country Status (2)

Country Link
JP (1) JP2529563B2 (enrdf_load_stackoverflow)
DE (1) DE3803189A1 (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19852326A1 (de) * 1998-11-12 1999-11-18 Siemens Ag Verfahren zum Herstellen eines mit einem dotierten Leuchtstoff beschichteten Substrats sowie Vorrichtung zum Bedampfen eines Substrats mit einem Beschichtungsstoff
KR100711488B1 (ko) 2005-12-24 2007-04-24 주식회사 포스코 알루미늄-마그네슘 합금 피막의 제조방법
JP5339683B2 (ja) * 2007-03-02 2013-11-13 キヤノン株式会社 蛍光体膜の多元真空蒸着法を用いた製造方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2762722A (en) * 1953-05-18 1956-09-11 Bausch & Lomb Method and apparatus for coating by thermal evaporation
US3094395A (en) * 1959-01-12 1963-06-18 Gen Dynamics Corp Method for evaporating subliming materials
GB918382A (en) * 1960-11-29 1963-02-13 Gen Electric Co Ltd Improvements in or relating to the formation of thin films
US3153137A (en) * 1961-10-13 1964-10-13 Union Carbide Corp Evaporation source
US3344768A (en) * 1965-08-30 1967-10-03 Burroughs Corp Powder evaporation apparatus
JPS50120966A (enrdf_load_stackoverflow) * 1974-03-07 1975-09-22
JPS6067666A (ja) * 1983-09-21 1985-04-18 Matsushita Electric Ind Co Ltd 薄膜の形成方法
JPS6134890A (ja) * 1984-07-27 1986-02-19 日本電信電話株式会社 電界発光薄膜形成方法

Also Published As

Publication number Publication date
DE3803189A1 (de) 1988-08-11
JPS63190164A (ja) 1988-08-05
DE3803189C2 (enrdf_load_stackoverflow) 1990-02-08

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