JPH0573827B2 - - Google Patents

Info

Publication number
JPH0573827B2
JPH0573827B2 JP58173181A JP17318183A JPH0573827B2 JP H0573827 B2 JPH0573827 B2 JP H0573827B2 JP 58173181 A JP58173181 A JP 58173181A JP 17318183 A JP17318183 A JP 17318183A JP H0573827 B2 JPH0573827 B2 JP H0573827B2
Authority
JP
Japan
Prior art keywords
auxiliary electrode
thin film
electron beam
potential
evaporation source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58173181A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6067666A (ja
Inventor
Masahiro Nishikawa
Takao Toda
Yosuke Fujita
Tomizo Matsuoka
Atsushi Abe
Koji Nitsuta
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP58173181A priority Critical patent/JPS6067666A/ja
Publication of JPS6067666A publication Critical patent/JPS6067666A/ja
Publication of JPH0573827B2 publication Critical patent/JPH0573827B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physical Vapour Deposition (AREA)
JP58173181A 1983-09-21 1983-09-21 薄膜の形成方法 Granted JPS6067666A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58173181A JPS6067666A (ja) 1983-09-21 1983-09-21 薄膜の形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58173181A JPS6067666A (ja) 1983-09-21 1983-09-21 薄膜の形成方法

Publications (2)

Publication Number Publication Date
JPS6067666A JPS6067666A (ja) 1985-04-18
JPH0573827B2 true JPH0573827B2 (enrdf_load_stackoverflow) 1993-10-15

Family

ID=15955588

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58173181A Granted JPS6067666A (ja) 1983-09-21 1983-09-21 薄膜の形成方法

Country Status (1)

Country Link
JP (1) JPS6067666A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4976988A (en) * 1987-02-03 1990-12-11 Nissan Motor Co., Ltd. Vacuum evaporation method for zinc sulfide
JP2529563B2 (ja) * 1987-02-03 1996-08-28 日産自動車株式会社 真空蒸着法
JP6720728B2 (ja) 2016-06-28 2020-07-08 ヤマハ株式会社 音色設定装置、電子楽器システムおよび音色設定方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5829657B2 (ja) * 1976-07-17 1983-06-24 三菱電機株式会社 フリツプフロツプ回路

Also Published As

Publication number Publication date
JPS6067666A (ja) 1985-04-18

Similar Documents

Publication Publication Date Title
JP2656080B2 (ja) 静電集塵装置
JP2004052113A (ja) 加熱容器とそれを利用した蒸着装置
KR20010017543A (ko) 전기 영동법을 이용한 카본나노튜브 필드 에미터의 제조 방법
JPH0227433B2 (enrdf_load_stackoverflow)
KR20170133566A (ko) 스퍼터링 장치 및 이를 이용한 스퍼터링 방법
TWI394854B (zh) 具最小化凝結效應之汽相沈積源
JPH0573827B2 (enrdf_load_stackoverflow)
JP2556364B2 (ja) 真空蒸着装置
JPH0440836B2 (enrdf_load_stackoverflow)
EP0776987A1 (de) Vakuumbeschichtungsanlage mit einem in der Vakuumkammer angeordneten Tiegel zur Aufnahme von zu verdampfendem Material
JP3808148B2 (ja) 複合スパッタリングカソード、そのカソードを用いたスパッタリング装置
JPH0583633B2 (enrdf_load_stackoverflow)
JP2529563B2 (ja) 真空蒸着法
JP2005029839A (ja) 蒸発容器、蒸発源および真空蒸着方法
JPH0610339B2 (ja) 薄膜形成装置
JP3330632B2 (ja) 薄膜蒸着装置
JPS60110871A (ja) 薄膜形成装置
JPH0364455A (ja) 電子銃式成膜装置
JPS6227564A (ja) イオンプレ−テイング装置
KR102148474B1 (ko) 스퍼터링 장치의 이물 제거장치 및 이를 이용한 이물제거 방법
KR101086481B1 (ko) 스퍼터
JP2003229263A (ja) 発光装置及び発光方法
JPS6320461A (ja) 薄膜形成装置
JPS62117203A (ja) 誘電体薄膜の形成方法
JPH0476203B2 (enrdf_load_stackoverflow)