JPS6067666A - 薄膜の形成方法 - Google Patents

薄膜の形成方法

Info

Publication number
JPS6067666A
JPS6067666A JP58173181A JP17318183A JPS6067666A JP S6067666 A JPS6067666 A JP S6067666A JP 58173181 A JP58173181 A JP 58173181A JP 17318183 A JP17318183 A JP 17318183A JP S6067666 A JPS6067666 A JP S6067666A
Authority
JP
Japan
Prior art keywords
thin film
auxiliary electrode
electron beam
evaporation source
present
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58173181A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0573827B2 (enrdf_load_stackoverflow
Inventor
Masahiro Nishikawa
雅博 西川
Takao Toda
任田 隆夫
Yosuke Fujita
洋介 藤田
Tomizo Matsuoka
富造 松岡
Atsushi Abe
阿部 惇
Koji Nitta
新田 恒治
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP58173181A priority Critical patent/JPS6067666A/ja
Publication of JPS6067666A publication Critical patent/JPS6067666A/ja
Publication of JPH0573827B2 publication Critical patent/JPH0573827B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/32Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/28Vacuum evaporation by wave energy or particle radiation
    • C23C14/30Vacuum evaporation by wave energy or particle radiation by electron bombardment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physical Vapour Deposition (AREA)
JP58173181A 1983-09-21 1983-09-21 薄膜の形成方法 Granted JPS6067666A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58173181A JPS6067666A (ja) 1983-09-21 1983-09-21 薄膜の形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58173181A JPS6067666A (ja) 1983-09-21 1983-09-21 薄膜の形成方法

Publications (2)

Publication Number Publication Date
JPS6067666A true JPS6067666A (ja) 1985-04-18
JPH0573827B2 JPH0573827B2 (enrdf_load_stackoverflow) 1993-10-15

Family

ID=15955588

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58173181A Granted JPS6067666A (ja) 1983-09-21 1983-09-21 薄膜の形成方法

Country Status (1)

Country Link
JP (1) JPS6067666A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63190164A (ja) * 1987-02-03 1988-08-05 Nissan Motor Co Ltd 真空蒸着法
US4976988A (en) * 1987-02-03 1990-12-11 Nissan Motor Co., Ltd. Vacuum evaporation method for zinc sulfide
DE112017003226T5 (de) 2016-06-28 2019-03-21 Yamaha Corp. Toneinstellungsvorrichtung, elektronisches Musikinstrumentensystem und Toneinstellungsverfahren

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5310953A (en) * 1976-07-17 1978-01-31 Mitsubishi Electric Corp Filp-flop circuit

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5310953A (en) * 1976-07-17 1978-01-31 Mitsubishi Electric Corp Filp-flop circuit

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63190164A (ja) * 1987-02-03 1988-08-05 Nissan Motor Co Ltd 真空蒸着法
US4976988A (en) * 1987-02-03 1990-12-11 Nissan Motor Co., Ltd. Vacuum evaporation method for zinc sulfide
DE112017003226T5 (de) 2016-06-28 2019-03-21 Yamaha Corp. Toneinstellungsvorrichtung, elektronisches Musikinstrumentensystem und Toneinstellungsverfahren

Also Published As

Publication number Publication date
JPH0573827B2 (enrdf_load_stackoverflow) 1993-10-15

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