JPS6067666A - 薄膜の形成方法 - Google Patents
薄膜の形成方法Info
- Publication number
- JPS6067666A JPS6067666A JP58173181A JP17318183A JPS6067666A JP S6067666 A JPS6067666 A JP S6067666A JP 58173181 A JP58173181 A JP 58173181A JP 17318183 A JP17318183 A JP 17318183A JP S6067666 A JPS6067666 A JP S6067666A
- Authority
- JP
- Japan
- Prior art keywords
- auxiliary electrode
- thin film
- electron beam
- evaporation source
- vapor deposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58173181A JPS6067666A (ja) | 1983-09-21 | 1983-09-21 | 薄膜の形成方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58173181A JPS6067666A (ja) | 1983-09-21 | 1983-09-21 | 薄膜の形成方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6067666A true JPS6067666A (ja) | 1985-04-18 |
JPH0573827B2 JPH0573827B2 (enrdf_load_stackoverflow) | 1993-10-15 |
Family
ID=15955588
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58173181A Granted JPS6067666A (ja) | 1983-09-21 | 1983-09-21 | 薄膜の形成方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6067666A (enrdf_load_stackoverflow) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63190164A (ja) * | 1987-02-03 | 1988-08-05 | Nissan Motor Co Ltd | 真空蒸着法 |
US4976988A (en) * | 1987-02-03 | 1990-12-11 | Nissan Motor Co., Ltd. | Vacuum evaporation method for zinc sulfide |
DE112017003226T5 (de) | 2016-06-28 | 2019-03-21 | Yamaha Corp. | Toneinstellungsvorrichtung, elektronisches Musikinstrumentensystem und Toneinstellungsverfahren |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5310953A (en) * | 1976-07-17 | 1978-01-31 | Mitsubishi Electric Corp | Filp-flop circuit |
-
1983
- 1983-09-21 JP JP58173181A patent/JPS6067666A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5310953A (en) * | 1976-07-17 | 1978-01-31 | Mitsubishi Electric Corp | Filp-flop circuit |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63190164A (ja) * | 1987-02-03 | 1988-08-05 | Nissan Motor Co Ltd | 真空蒸着法 |
US4976988A (en) * | 1987-02-03 | 1990-12-11 | Nissan Motor Co., Ltd. | Vacuum evaporation method for zinc sulfide |
DE112017003226T5 (de) | 2016-06-28 | 2019-03-21 | Yamaha Corp. | Toneinstellungsvorrichtung, elektronisches Musikinstrumentensystem und Toneinstellungsverfahren |
Also Published As
Publication number | Publication date |
---|---|
JPH0573827B2 (enrdf_load_stackoverflow) | 1993-10-15 |
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