JP2025031927A5 - - Google Patents

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Publication number
JP2025031927A5
JP2025031927A5 JP2024229061A JP2024229061A JP2025031927A5 JP 2025031927 A5 JP2025031927 A5 JP 2025031927A5 JP 2024229061 A JP2024229061 A JP 2024229061A JP 2024229061 A JP2024229061 A JP 2024229061A JP 2025031927 A5 JP2025031927 A5 JP 2025031927A5
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JP
Japan
Prior art keywords
heating element
conductive heating
sic
producing
sic crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2024229061A
Other languages
English (en)
Japanese (ja)
Other versions
JP2025031927A (ja
Filing date
Publication date
Priority claimed from JP2022179659A external-priority patent/JP7655888B2/ja
Application filed filed Critical
Publication of JP2025031927A publication Critical patent/JP2025031927A/ja
Publication of JP2025031927A5 publication Critical patent/JP2025031927A5/ja
Pending legal-status Critical Current

Links

JP2024229061A 2021-11-11 2024-12-25 高純度のSiC結晶体の製造方法 Pending JP2025031927A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR10-2021-0155113 2021-11-11
KR20210155113 2021-11-11
JP2022179659A JP7655888B2 (ja) 2021-11-11 2022-11-09 高純度のSiC結晶体の製造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2022179659A Division JP7655888B2 (ja) 2021-11-11 2022-11-09 高純度のSiC結晶体の製造方法

Publications (2)

Publication Number Publication Date
JP2025031927A JP2025031927A (ja) 2025-03-07
JP2025031927A5 true JP2025031927A5 (https=) 2026-03-19

Family

ID=84044930

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2022179659A Active JP7655888B2 (ja) 2021-11-11 2022-11-09 高純度のSiC結晶体の製造方法
JP2024229061A Pending JP2025031927A (ja) 2021-11-11 2024-12-25 高純度のSiC結晶体の製造方法

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP2022179659A Active JP7655888B2 (ja) 2021-11-11 2022-11-09 高純度のSiC結晶体の製造方法

Country Status (6)

Country Link
US (1) US12338544B2 (https=)
EP (1) EP4190748A1 (https=)
JP (2) JP7655888B2 (https=)
KR (2) KR102525767B1 (https=)
CN (1) CN116103752A (https=)
TW (1) TWI901915B (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN119118131B (zh) * 2024-11-13 2025-05-30 苏州清研半导体科技有限公司 一种高纯碳化硅粉料的合成方法

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL251143A (https=) * 1959-05-04
BE629139A (https=) 1962-03-06
US4315968A (en) * 1980-02-06 1982-02-16 Avco Corporation Silicon coated silicon carbide filaments and method
US4702900A (en) 1985-04-08 1987-10-27 Bridgestone Corporation Method of producing silicon carbide
JPS61295372A (ja) * 1985-06-25 1986-12-26 Toagosei Chem Ind Co Ltd 炭化珪素膜を有する物品の製造法
JPS63123806A (ja) * 1986-11-11 1988-05-27 Mitsubishi Metal Corp 多結晶シリコンの製造方法
US5863325A (en) 1995-05-31 1999-01-26 Bridgestone Corporation Process for producing high purity silicon carbide powder for preparation of a silicon carbide single crystal and single crystal
SE9502288D0 (sv) 1995-06-26 1995-06-26 Abb Research Ltd A device and a method for epitaxially growing objects by CVD
JP3524679B2 (ja) * 1996-06-21 2004-05-10 東芝セラミックス株式会社 高純度CVD−SiC質の半導体熱処理用部材及びその製造方法
JP2002256435A (ja) 2001-03-02 2002-09-11 Kyocera Corp 炭化珪素基板及びその製造方法並びに磁気ヘッド用基板及び磁気ヘッドスライダ
JP3661034B2 (ja) * 2001-11-15 2005-06-15 弘 中山 膜形成方法、膜、素子、アルキルシリコン化合物、及び膜形成装置
ITMI20031196A1 (it) * 2003-06-13 2004-12-14 Lpe Spa Sistema per crescere cristalli di carburo di silicio
JP2005317670A (ja) * 2004-04-27 2005-11-10 Japan Science & Technology Agency (100)配向した立方晶炭化珪素結晶膜の作製方法
DE102005046703A1 (de) * 2005-09-29 2007-04-05 Wacker Chemie Ag Verfahren und Vorrichtung zur Hydrierung von Chlorsilanen
US8409351B2 (en) * 2007-08-08 2013-04-02 Sic Systems, Inc. Production of bulk silicon carbide with hot-filament chemical vapor deposition
KR101637567B1 (ko) 2009-08-26 2016-07-08 엘지이노텍 주식회사 고순도 탄화규소 분체 제조 방법 및 시스템
KR101678624B1 (ko) * 2015-09-14 2016-11-23 한국과학기술연구원 초고순도 탄화규소 분말의 제조방법
TWI791486B (zh) * 2017-02-20 2023-02-11 日商德山股份有限公司 多晶矽的製造方法
KR102269878B1 (ko) * 2019-10-24 2021-06-30 하나머티리얼즈(주) 탄화 규소 분말 및 단결정 탄화 규소의 제조 방법
WO2022123083A2 (en) 2020-12-11 2022-06-16 Zadient Technologies SAS Method and device for producing a sic solid material

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