JP2024514139A5 - - Google Patents
Info
- Publication number
- JP2024514139A5 JP2024514139A5 JP2023562486A JP2023562486A JP2024514139A5 JP 2024514139 A5 JP2024514139 A5 JP 2024514139A5 JP 2023562486 A JP2023562486 A JP 2023562486A JP 2023562486 A JP2023562486 A JP 2023562486A JP 2024514139 A5 JP2024514139 A5 JP 2024514139A5
- Authority
- JP
- Japan
- Prior art keywords
- wall
- isolator
- approximately
- processing chamber
- angle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US17/228,996 US12562355B2 (en) | 2021-04-13 | 2021-04-13 | Isolator for processing chambers |
| US17/228,996 | 2021-04-13 | ||
| PCT/US2022/021844 WO2022221025A1 (en) | 2021-04-13 | 2022-03-25 | Improved isolator for processing chambers |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2024514139A JP2024514139A (ja) | 2024-03-28 |
| JP2024514139A5 true JP2024514139A5 (https=) | 2025-04-02 |
Family
ID=83509476
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023562486A Pending JP2024514139A (ja) | 2021-04-13 | 2022-03-25 | 処理チャンバ用の改良されたアイソレータ |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US12562355B2 (https=) |
| JP (1) | JP2024514139A (https=) |
| KR (1) | KR20230169094A (https=) |
| CN (1) | CN116940707A (https=) |
| WO (1) | WO2022221025A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20230033603A (ko) * | 2021-09-01 | 2023-03-08 | 에이에스엠 아이피 홀딩 비.브이. | 위치 설정 장치를 포함하는 가스 분배 어셈블리 |
| CN116031123A (zh) * | 2022-12-31 | 2023-04-28 | 北京凯世通半导体有限公司 | 一种对离子注入机源腔内部进行防护的装置 |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW323387B (https=) * | 1995-06-07 | 1997-12-21 | Tokyo Electron Co Ltd | |
| JP3192370B2 (ja) | 1995-06-08 | 2001-07-23 | 東京エレクトロン株式会社 | プラズマ処理装置 |
| US5993594A (en) | 1996-09-30 | 1999-11-30 | Lam Research Corporation | Particle controlling method and apparatus for a plasma processing chamber |
| US6106625A (en) | 1997-12-02 | 2000-08-22 | Applied Materials, Inc. | Reactor useful for chemical vapor deposition of titanium nitride |
| US6063441A (en) | 1997-12-02 | 2000-05-16 | Applied Materials, Inc. | Processing chamber and method for confining plasma |
| US5997649A (en) | 1998-04-09 | 1999-12-07 | Tokyo Electron Limited | Stacked showerhead assembly for delivering gases and RF power to a reaction chamber |
| US6159299A (en) * | 1999-02-09 | 2000-12-12 | Applied Materials, Inc. | Wafer pedestal with a purge ring |
| WO2003065424A2 (en) * | 2002-01-25 | 2003-08-07 | Applied Materials, Inc. | Apparatus for cyclical deposition of thin films |
| US20050211167A1 (en) | 2002-06-10 | 2005-09-29 | Tokyo Electron Limited | Processing device and processing method |
| US9127362B2 (en) | 2005-10-31 | 2015-09-08 | Applied Materials, Inc. | Process kit and target for substrate processing chamber |
| US20090084317A1 (en) | 2007-09-28 | 2009-04-02 | Applied Materials, Inc. | Atomic layer deposition chamber and components |
| WO2011143062A2 (en) | 2010-05-12 | 2011-11-17 | Applied Materials, Inc. | Confined process volume pecvd chamber |
| KR102438139B1 (ko) * | 2014-12-22 | 2022-08-29 | 어플라이드 머티어리얼스, 인코포레이티드 | 높은 처리량의 프로세싱 챔버를 위한 프로세스 키트 |
| WO2016171815A1 (en) * | 2015-04-24 | 2016-10-27 | Applied Materials, Inc. | Process kit including flow isolator ring |
| US10312076B2 (en) | 2017-03-10 | 2019-06-04 | Applied Materials, Inc. | Application of bottom purge to increase clean efficiency |
| JP7612620B2 (ja) | 2019-07-04 | 2025-01-14 | アプライド マテリアルズ インコーポレイテッド | 基板処理チャンバのためのアイソレータ装置及び方法 |
-
2021
- 2021-04-13 US US17/228,996 patent/US12562355B2/en active Active
-
2022
- 2022-03-25 CN CN202280014221.7A patent/CN116940707A/zh active Pending
- 2022-03-25 KR KR1020237032081A patent/KR20230169094A/ko active Pending
- 2022-03-25 WO PCT/US2022/021844 patent/WO2022221025A1/en not_active Ceased
- 2022-03-25 JP JP2023562486A patent/JP2024514139A/ja active Pending
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