JP2024157941A - 炭化珪素半導体装置 - Google Patents
炭化珪素半導体装置 Download PDFInfo
- Publication number
- JP2024157941A JP2024157941A JP2023072621A JP2023072621A JP2024157941A JP 2024157941 A JP2024157941 A JP 2024157941A JP 2023072621 A JP2023072621 A JP 2023072621A JP 2023072621 A JP2023072621 A JP 2023072621A JP 2024157941 A JP2024157941 A JP 2024157941A
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- JP
- Japan
- Prior art keywords
- layer
- region
- cell region
- jfet
- gate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Classifications
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D12/00—Bipolar devices controlled by the field effect, e.g. insulated-gate bipolar transistors [IGBT]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/01—Manufacture or treatment
- H10D30/021—Manufacture or treatment of FETs having insulated gates [IGFET]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
- H10D62/81—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials of structures exhibiting quantum-confinement effects, e.g. single quantum wells; of structures having periodic or quasi-periodic potential variation
Landscapes
- Junction Field-Effect Transistors (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2023072621A JP2024157941A (ja) | 2023-04-26 | 2023-04-26 | 炭化珪素半導体装置 |
| PCT/JP2024/016352 WO2024225407A1 (ja) | 2023-04-26 | 2024-04-25 | 炭化珪素半導体装置 |
| CN202480026118.3A CN121003031A (zh) | 2023-04-26 | 2024-04-25 | 碳化硅半导体装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2023072621A JP2024157941A (ja) | 2023-04-26 | 2023-04-26 | 炭化珪素半導体装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2024157941A true JP2024157941A (ja) | 2024-11-08 |
| JP2024157941A5 JP2024157941A5 (enExample) | 2025-04-01 |
Family
ID=93256764
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023072621A Pending JP2024157941A (ja) | 2023-04-26 | 2023-04-26 | 炭化珪素半導体装置 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP2024157941A (enExample) |
| CN (1) | CN121003031A (enExample) |
| WO (1) | WO2024225407A1 (enExample) |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6969662B2 (ja) * | 2018-02-14 | 2021-11-24 | 富士電機株式会社 | 半導体装置 |
| JP7635524B2 (ja) * | 2020-09-08 | 2025-02-26 | 富士電機株式会社 | 半導体装置および半導体装置の製造方法 |
| JP7647239B2 (ja) * | 2021-03-30 | 2025-03-18 | 富士電機株式会社 | 半導体装置 |
| JP7593225B2 (ja) * | 2021-05-14 | 2024-12-03 | 株式会社デンソー | 炭化珪素半導体装置 |
| JP7643179B2 (ja) * | 2021-05-24 | 2025-03-11 | 富士電機株式会社 | 炭化珪素半導体装置 |
-
2023
- 2023-04-26 JP JP2023072621A patent/JP2024157941A/ja active Pending
-
2024
- 2024-04-25 CN CN202480026118.3A patent/CN121003031A/zh active Pending
- 2024-04-25 WO PCT/JP2024/016352 patent/WO2024225407A1/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| CN121003031A (zh) | 2025-11-21 |
| WO2024225407A1 (ja) | 2024-10-31 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20250324 |
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| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20250324 |