JP2024048269A5 - - Google Patents
Info
- Publication number
- JP2024048269A5 JP2024048269A5 JP2022154209A JP2022154209A JP2024048269A5 JP 2024048269 A5 JP2024048269 A5 JP 2024048269A5 JP 2022154209 A JP2022154209 A JP 2022154209A JP 2022154209 A JP2022154209 A JP 2022154209A JP 2024048269 A5 JP2024048269 A5 JP 2024048269A5
- Authority
- JP
- Japan
- Prior art keywords
- oxide semiconductor
- film
- manufacturing
- semiconductor device
- semiconductor layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022154209A JP2024048269A (ja) | 2022-09-27 | 2022-09-27 | 半導体装置の製造方法 |
| TW112133415A TWI865007B (zh) | 2022-09-27 | 2023-09-04 | 半導體裝置之製造方法 |
| KR1020230124710A KR102733354B1 (ko) | 2022-09-27 | 2023-09-19 | 반도체 장치의 제조 방법 |
| CN202311249308.5A CN117790311A (zh) | 2022-09-27 | 2023-09-26 | 半导体器件的制造方法 |
| US18/474,389 US20240105819A1 (en) | 2022-09-27 | 2023-09-26 | Method for manufacturing semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022154209A JP2024048269A (ja) | 2022-09-27 | 2022-09-27 | 半導体装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2024048269A JP2024048269A (ja) | 2024-04-08 |
| JP2024048269A5 true JP2024048269A5 (cg-RX-API-DMAC7.html) | 2025-09-22 |
Family
ID=90359934
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022154209A Pending JP2024048269A (ja) | 2022-09-27 | 2022-09-27 | 半導体装置の製造方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20240105819A1 (cg-RX-API-DMAC7.html) |
| JP (1) | JP2024048269A (cg-RX-API-DMAC7.html) |
| KR (1) | KR102733354B1 (cg-RX-API-DMAC7.html) |
| CN (1) | CN117790311A (cg-RX-API-DMAC7.html) |
| TW (1) | TWI865007B (cg-RX-API-DMAC7.html) |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8871565B2 (en) | 2010-09-13 | 2014-10-28 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing semiconductor device |
| JP2014027263A (ja) * | 2012-06-15 | 2014-02-06 | Semiconductor Energy Lab Co Ltd | 半導体装置およびその作製方法 |
| EP2880690B1 (en) | 2012-08-03 | 2019-02-27 | Semiconductor Energy Laboratory Co. Ltd. | Semiconductor device with oxide semiconductor stacked film |
| TWI761605B (zh) | 2012-09-14 | 2022-04-21 | 日商半導體能源研究所股份有限公司 | 半導體裝置及其製造方法 |
| KR102220279B1 (ko) | 2012-10-19 | 2021-02-24 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 산화물 반도체막을 포함하는 다층막 및 반도체 장치의 제작 방법 |
| US9190527B2 (en) * | 2013-02-13 | 2015-11-17 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and manufacturing method of semiconductor device |
| US10304859B2 (en) * | 2013-04-12 | 2019-05-28 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device having an oxide film on an oxide semiconductor film |
| US9425217B2 (en) | 2013-09-23 | 2016-08-23 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device |
| JP6283273B2 (ja) * | 2014-07-01 | 2018-02-21 | 株式会社神戸製鋼所 | 薄膜トランジスタ評価用の積層構造体の評価方法 |
| CN107683531B (zh) * | 2015-05-22 | 2022-04-29 | 株式会社半导体能源研究所 | 半导体装置以及包括该半导体装置的显示装置 |
| JPWO2017125796A1 (ja) * | 2016-01-18 | 2018-11-15 | 株式会社半導体エネルギー研究所 | 金属酸化物膜、半導体装置、及び表示装置 |
| CN109121438B (zh) | 2016-02-12 | 2022-02-18 | 株式会社半导体能源研究所 | 半导体装置以及包括该半导体装置的显示装置 |
| CN109311756B (zh) * | 2016-06-17 | 2022-07-22 | 出光兴产株式会社 | 氧化物烧结体以及溅射靶 |
| US10923350B2 (en) * | 2016-08-31 | 2021-02-16 | Semiconductor Energy Laboratory Co., Ltd. | Manufacturing method of semiconductor device |
| JP7263013B2 (ja) * | 2019-01-10 | 2023-04-24 | 株式会社ジャパンディスプレイ | 配線構造体、半導体装置、及び表示装置 |
| WO2020174305A1 (ja) * | 2019-02-26 | 2020-09-03 | 株式会社半導体エネルギー研究所 | 表示装置、表示モジュール、電子機器、及びテレビジョン装置 |
| KR102760217B1 (ko) * | 2020-06-26 | 2025-01-31 | 삼성디스플레이 주식회사 | 박막트랜지스터 기판 및 이를 구비한 디스플레이 장치 |
| KR20220094735A (ko) * | 2020-12-29 | 2022-07-06 | 에이디알씨 주식회사 | 결정성 산화물 반도체 박막 및 그 형성 방법, 박막 트랜지스터 및 그 제조 방법, 표시 패널 및 전자 장치 |
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2022
- 2022-09-27 JP JP2022154209A patent/JP2024048269A/ja active Pending
-
2023
- 2023-09-04 TW TW112133415A patent/TWI865007B/zh active
- 2023-09-19 KR KR1020230124710A patent/KR102733354B1/ko active Active
- 2023-09-26 CN CN202311249308.5A patent/CN117790311A/zh active Pending
- 2023-09-26 US US18/474,389 patent/US20240105819A1/en active Pending