JP2024032620A - 基板保持装置、基板保持方法及びリソグラフィ装置 - Google Patents
基板保持装置、基板保持方法及びリソグラフィ装置 Download PDFInfo
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- JP2024032620A JP2024032620A JP2022136369A JP2022136369A JP2024032620A JP 2024032620 A JP2024032620 A JP 2024032620A JP 2022136369 A JP2022136369 A JP 2022136369A JP 2022136369 A JP2022136369 A JP 2022136369A JP 2024032620 A JP2024032620 A JP 2024032620A
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- 238000004519 manufacturing process Methods 0.000 claims description 13
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- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
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- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
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Application Number | Priority Date | Filing Date | Title |
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JP2022136369A JP2024032620A (ja) | 2022-08-29 | 2022-08-29 | 基板保持装置、基板保持方法及びリソグラフィ装置 |
CN202311078585.4A CN117631468A (zh) | 2022-08-29 | 2023-08-24 | 基板保持装置、基板保持方法以及光刻装置 |
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JP2022136369A JP2024032620A (ja) | 2022-08-29 | 2022-08-29 | 基板保持装置、基板保持方法及びリソグラフィ装置 |
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JP2024032620A true JP2024032620A (ja) | 2024-03-12 |
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JP2022136369A Pending JP2024032620A (ja) | 2022-08-29 | 2022-08-29 | 基板保持装置、基板保持方法及びリソグラフィ装置 |
Country Status (2)
Country | Link |
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JP (1) | JP2024032620A (zh) |
CN (1) | CN117631468A (zh) |
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2022
- 2022-08-29 JP JP2022136369A patent/JP2024032620A/ja active Pending
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- 2023-08-24 CN CN202311078585.4A patent/CN117631468A/zh active Pending
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CN117631468A (zh) | 2024-03-01 |
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