JP2024010749A - 基板保持装置、基板製造装置、および基板製造方法 - Google Patents

基板保持装置、基板製造装置、および基板製造方法 Download PDF

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Publication number
JP2024010749A
JP2024010749A JP2022112217A JP2022112217A JP2024010749A JP 2024010749 A JP2024010749 A JP 2024010749A JP 2022112217 A JP2022112217 A JP 2022112217A JP 2022112217 A JP2022112217 A JP 2022112217A JP 2024010749 A JP2024010749 A JP 2024010749A
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JP
Japan
Prior art keywords
substrate
holding
fluid
holding roller
roller
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2022112217A
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English (en)
Japanese (ja)
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JP2024010749A5 (https=
Inventor
正行 佐竹
Masayuki Satake
正行 中西
Masayuki Nakanishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ebara Corp
Original Assignee
Ebara Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ebara Corp filed Critical Ebara Corp
Priority to JP2022112217A priority Critical patent/JP2024010749A/ja
Priority to KR1020257004036A priority patent/KR20250036850A/ko
Priority to CN202380052721.4A priority patent/CN119522473A/zh
Priority to PCT/JP2023/022255 priority patent/WO2024014223A1/ja
Priority to TW112125609A priority patent/TW202403935A/zh
Publication of JP2024010749A publication Critical patent/JP2024010749A/ja
Publication of JP2024010749A5 publication Critical patent/JP2024010749A5/ja
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0414—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0448—Apparatus for applying a liquid, a resin, an ink or the like
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/76—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches
    • H10P72/7604—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support
    • H10P72/7618—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating carrousel
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/76—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches
    • H10P72/7604—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support
    • H10P72/7624—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the mechanical construction of the susceptor, stage or support

Landscapes

  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2022112217A 2022-07-13 2022-07-13 基板保持装置、基板製造装置、および基板製造方法 Pending JP2024010749A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2022112217A JP2024010749A (ja) 2022-07-13 2022-07-13 基板保持装置、基板製造装置、および基板製造方法
KR1020257004036A KR20250036850A (ko) 2022-07-13 2023-06-15 기판 보유 지지 장치, 기판 제조 장치 및 기판 제조 방법
CN202380052721.4A CN119522473A (zh) 2022-07-13 2023-06-15 基板保持装置、基板制造装置及基板制造方法
PCT/JP2023/022255 WO2024014223A1 (ja) 2022-07-13 2023-06-15 基板保持装置、基板製造装置、および基板製造方法
TW112125609A TW202403935A (zh) 2022-07-13 2023-07-10 基板保持裝置、基板製造裝置、及基板製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2022112217A JP2024010749A (ja) 2022-07-13 2022-07-13 基板保持装置、基板製造装置、および基板製造方法

Publications (2)

Publication Number Publication Date
JP2024010749A true JP2024010749A (ja) 2024-01-25
JP2024010749A5 JP2024010749A5 (https=) 2025-10-24

Family

ID=89536422

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022112217A Pending JP2024010749A (ja) 2022-07-13 2022-07-13 基板保持装置、基板製造装置、および基板製造方法

Country Status (5)

Country Link
JP (1) JP2024010749A (https=)
KR (1) KR20250036850A (https=)
CN (1) CN119522473A (https=)
TW (1) TW202403935A (https=)
WO (1) WO2024014223A1 (https=)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3944368B2 (ja) * 2001-09-05 2007-07-11 株式会社荏原製作所 基板処理装置及び基板処理方法
JP2015126033A (ja) * 2013-12-25 2015-07-06 株式会社ディスコ 洗浄装置および加工装置
JP2019165152A (ja) * 2018-03-20 2019-09-26 エイブリック株式会社 半導体装置及び半導体装置の製造方法及び半導体集積回路装置の製造方法
TWI837277B (zh) * 2019-01-24 2024-04-01 日商東京威力科創股份有限公司 加工裝置及加工方法
JP7491774B2 (ja) * 2020-08-24 2024-05-28 株式会社荏原製作所 基板保持回転機構、基板処理装置
JP7535891B2 (ja) 2020-08-27 2024-08-19 株式会社荏原製作所 基板処理方法、および基板処理装置

Also Published As

Publication number Publication date
KR20250036850A (ko) 2025-03-14
TW202403935A (zh) 2024-01-16
CN119522473A (zh) 2025-02-25
WO2024014223A1 (ja) 2024-01-18

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