JP2023540297A5 - - Google Patents
Info
- Publication number
- JP2023540297A5 JP2023540297A5 JP2023514448A JP2023514448A JP2023540297A5 JP 2023540297 A5 JP2023540297 A5 JP 2023540297A5 JP 2023514448 A JP2023514448 A JP 2023514448A JP 2023514448 A JP2023514448 A JP 2023514448A JP 2023540297 A5 JP2023540297 A5 JP 2023540297A5
- Authority
- JP
- Japan
- Prior art keywords
- reticle
- carrier
- active
- rotating plate
- carrier base
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202063073937P | 2020-09-03 | 2020-09-03 | |
| US63/073,937 | 2020-09-03 | ||
| US17/446,035 US11774866B2 (en) | 2020-09-03 | 2021-08-26 | Active reticle carrier for in situ stage correction |
| US17/446,035 | 2021-08-26 | ||
| PCT/US2021/048570 WO2022051310A1 (en) | 2020-09-03 | 2021-09-01 | Active reticle carrier for in situ stage correction |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2023540297A JP2023540297A (ja) | 2023-09-22 |
| JP2023540297A5 true JP2023540297A5 (https=) | 2024-06-20 |
| JP7592154B2 JP7592154B2 (ja) | 2024-11-29 |
Family
ID=80356565
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023514448A Active JP7592154B2 (ja) | 2020-09-03 | 2021-09-01 | 原位置ステージ補正のためのアクティブレチクルキャリア |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US11774866B2 (https=) |
| EP (1) | EP4200669A4 (https=) |
| JP (1) | JP7592154B2 (https=) |
| KR (1) | KR102725415B1 (https=) |
| CN (1) | CN116057467B (https=) |
| WO (1) | WO2022051310A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI878825B (zh) * | 2023-03-10 | 2025-04-01 | 微程式資訊股份有限公司 | 可模擬光罩之感測總成 |
| US20250108972A1 (en) * | 2023-09-28 | 2025-04-03 | Entegris, Inc. | Large format reticle container |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60195948A (ja) * | 1984-03-19 | 1985-10-04 | Hitachi Ltd | 検査装置 |
| US5608773A (en) * | 1993-11-30 | 1997-03-04 | Canon Kabushiki Kaisha | Mask holding device, and an exposure apparatus and a device manufacturing method using the device |
| JPH098103A (ja) * | 1995-06-19 | 1997-01-10 | Nikon Corp | 投影露光装置及び投影露光方法 |
| JPH10270535A (ja) * | 1997-03-25 | 1998-10-09 | Nikon Corp | 移動ステージ装置、及び該ステージ装置を用いた回路デバイス製造方法 |
| JPH11288878A (ja) * | 1998-04-03 | 1999-10-19 | Canon Inc | マスク搬送装置およびマスク搬送方法、ならびに該マスク搬送装置を用いた露光装置 |
| JPH11307425A (ja) * | 1998-04-22 | 1999-11-05 | Nikon Corp | マスクの受け渡し方法、及び該方法を使用する露光装置 |
| JP2000147747A (ja) | 1998-11-16 | 2000-05-26 | Seiko Epson Corp | マスク検査装置 |
| JP4717112B2 (ja) * | 2005-06-13 | 2011-07-06 | エーエスエムエル ネザーランズ ビー.ブイ. | 偏光アナライザ、偏光センサおよびリソグラフィ装置の偏光特性を判定するための方法 |
| EP2418545B1 (en) | 2010-08-12 | 2018-10-10 | Applied Materials, Inc. | Mask handling module |
| US10090179B2 (en) | 2011-06-28 | 2018-10-02 | Brooks Automation, Inc. | Semiconductor stocker systems and methods |
| US9851643B2 (en) | 2012-03-27 | 2017-12-26 | Kla-Tencor Corporation | Apparatus and methods for reticle handling in an EUV reticle inspection tool |
| US20150131071A1 (en) * | 2013-11-08 | 2015-05-14 | Samsung Electronics Co., Ltd. | Semiconductor device manufacturing apparatus |
| JP2016170310A (ja) * | 2015-03-13 | 2016-09-23 | 株式会社荏原製作所 | レチクル搬送装置、検査装置およびレチクル搬送方法 |
| WO2018111227A1 (en) | 2016-12-12 | 2018-06-21 | Intel Corporation | Systems, apparatuses, and methods for performing reticle inspections |
| CN109426082A (zh) | 2017-08-21 | 2019-03-05 | 上海微电子装备(集团)股份有限公司 | 一种掩模版的传输系统以及传输方法 |
| US10663871B2 (en) * | 2018-07-30 | 2020-05-26 | Taiwan Semiconductor Manufacturing Co., Ltd. | Reticle stage and method for using the same |
| US10976674B2 (en) * | 2018-08-17 | 2021-04-13 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method for detecting EUV pellicle rupture |
-
2021
- 2021-08-26 US US17/446,035 patent/US11774866B2/en active Active
- 2021-09-01 JP JP2023514448A patent/JP7592154B2/ja active Active
- 2021-09-01 WO PCT/US2021/048570 patent/WO2022051310A1/en not_active Ceased
- 2021-09-01 CN CN202180053904.9A patent/CN116057467B/zh active Active
- 2021-09-01 EP EP21865005.9A patent/EP4200669A4/en active Pending
- 2021-09-01 KR KR1020237009897A patent/KR102725415B1/ko active Active
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