JP2023540297A5 - - Google Patents

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Publication number
JP2023540297A5
JP2023540297A5 JP2023514448A JP2023514448A JP2023540297A5 JP 2023540297 A5 JP2023540297 A5 JP 2023540297A5 JP 2023514448 A JP2023514448 A JP 2023514448A JP 2023514448 A JP2023514448 A JP 2023514448A JP 2023540297 A5 JP2023540297 A5 JP 2023540297A5
Authority
JP
Japan
Prior art keywords
reticle
carrier
active
rotating plate
carrier base
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2023514448A
Other languages
English (en)
Japanese (ja)
Other versions
JP7592154B2 (ja
JP2023540297A (ja
Filing date
Publication date
Priority claimed from US17/446,035 external-priority patent/US11774866B2/en
Application filed filed Critical
Publication of JP2023540297A publication Critical patent/JP2023540297A/ja
Publication of JP2023540297A5 publication Critical patent/JP2023540297A5/ja
Application granted granted Critical
Publication of JP7592154B2 publication Critical patent/JP7592154B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2023514448A 2020-09-03 2021-09-01 原位置ステージ補正のためのアクティブレチクルキャリア Active JP7592154B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US202063073937P 2020-09-03 2020-09-03
US63/073,937 2020-09-03
US17/446,035 US11774866B2 (en) 2020-09-03 2021-08-26 Active reticle carrier for in situ stage correction
US17/446,035 2021-08-26
PCT/US2021/048570 WO2022051310A1 (en) 2020-09-03 2021-09-01 Active reticle carrier for in situ stage correction

Publications (3)

Publication Number Publication Date
JP2023540297A JP2023540297A (ja) 2023-09-22
JP2023540297A5 true JP2023540297A5 (https=) 2024-06-20
JP7592154B2 JP7592154B2 (ja) 2024-11-29

Family

ID=80356565

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023514448A Active JP7592154B2 (ja) 2020-09-03 2021-09-01 原位置ステージ補正のためのアクティブレチクルキャリア

Country Status (6)

Country Link
US (1) US11774866B2 (https=)
EP (1) EP4200669A4 (https=)
JP (1) JP7592154B2 (https=)
KR (1) KR102725415B1 (https=)
CN (1) CN116057467B (https=)
WO (1) WO2022051310A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI878825B (zh) * 2023-03-10 2025-04-01 微程式資訊股份有限公司 可模擬光罩之感測總成
US20250108972A1 (en) * 2023-09-28 2025-04-03 Entegris, Inc. Large format reticle container

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60195948A (ja) * 1984-03-19 1985-10-04 Hitachi Ltd 検査装置
US5608773A (en) * 1993-11-30 1997-03-04 Canon Kabushiki Kaisha Mask holding device, and an exposure apparatus and a device manufacturing method using the device
JPH098103A (ja) * 1995-06-19 1997-01-10 Nikon Corp 投影露光装置及び投影露光方法
JPH10270535A (ja) * 1997-03-25 1998-10-09 Nikon Corp 移動ステージ装置、及び該ステージ装置を用いた回路デバイス製造方法
JPH11288878A (ja) * 1998-04-03 1999-10-19 Canon Inc マスク搬送装置およびマスク搬送方法、ならびに該マスク搬送装置を用いた露光装置
JPH11307425A (ja) * 1998-04-22 1999-11-05 Nikon Corp マスクの受け渡し方法、及び該方法を使用する露光装置
JP2000147747A (ja) 1998-11-16 2000-05-26 Seiko Epson Corp マスク検査装置
JP4717112B2 (ja) * 2005-06-13 2011-07-06 エーエスエムエル ネザーランズ ビー.ブイ. 偏光アナライザ、偏光センサおよびリソグラフィ装置の偏光特性を判定するための方法
EP2418545B1 (en) 2010-08-12 2018-10-10 Applied Materials, Inc. Mask handling module
US10090179B2 (en) 2011-06-28 2018-10-02 Brooks Automation, Inc. Semiconductor stocker systems and methods
US9851643B2 (en) 2012-03-27 2017-12-26 Kla-Tencor Corporation Apparatus and methods for reticle handling in an EUV reticle inspection tool
US20150131071A1 (en) * 2013-11-08 2015-05-14 Samsung Electronics Co., Ltd. Semiconductor device manufacturing apparatus
JP2016170310A (ja) * 2015-03-13 2016-09-23 株式会社荏原製作所 レチクル搬送装置、検査装置およびレチクル搬送方法
WO2018111227A1 (en) 2016-12-12 2018-06-21 Intel Corporation Systems, apparatuses, and methods for performing reticle inspections
CN109426082A (zh) 2017-08-21 2019-03-05 上海微电子装备(集团)股份有限公司 一种掩模版的传输系统以及传输方法
US10663871B2 (en) * 2018-07-30 2020-05-26 Taiwan Semiconductor Manufacturing Co., Ltd. Reticle stage and method for using the same
US10976674B2 (en) * 2018-08-17 2021-04-13 Taiwan Semiconductor Manufacturing Co., Ltd. Method for detecting EUV pellicle rupture

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