JP2023538027A5 - - Google Patents

Info

Publication number
JP2023538027A5
JP2023538027A5 JP2023511554A JP2023511554A JP2023538027A5 JP 2023538027 A5 JP2023538027 A5 JP 2023538027A5 JP 2023511554 A JP2023511554 A JP 2023511554A JP 2023511554 A JP2023511554 A JP 2023511554A JP 2023538027 A5 JP2023538027 A5 JP 2023538027A5
Authority
JP
Japan
Prior art keywords
heating
substrate
area
temperature
assembly
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023511554A
Other languages
English (en)
Japanese (ja)
Other versions
JP2023538027A (ja
Filing date
Publication date
Priority claimed from US16/998,872 external-priority patent/US11905589B2/en
Application filed filed Critical
Publication of JP2023538027A publication Critical patent/JP2023538027A/ja
Publication of JP2023538027A5 publication Critical patent/JP2023538027A5/ja
Pending legal-status Critical Current

Links

JP2023511554A 2020-08-20 2021-08-09 少なくとも１つの加熱アセンブリを有する材料堆積装置並びに基板を予加熱及び／又は後加熱するための方法 Pending JP2023538027A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US16/998,872 US11905589B2 (en) 2020-08-20 2020-08-20 Material deposition apparatus having at least one heating assembly and method for pre- and/or post-heating a substrate
US16/998,872 2020-08-20
PCT/US2021/045261 WO2022039966A1 (en) 2020-08-20 2021-08-09 Material deposition apparatus having at least one heating assembly and method for pre-and/or post-heating a substrate

Publications (2)

Publication Number Publication Date
JP2023538027A JP2023538027A (ja) 2023-09-06
JP2023538027A5 true JP2023538027A5 (enExample) 2024-08-15

Family

ID=80270537

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023511554A Pending JP2023538027A (ja) 2020-08-20 2021-08-09 少なくとも１つの加熱アセンブリを有する材料堆積装置並びに基板を予加熱及び／又は後加熱するための方法

Country Status (6)

Country Link
US (1) US11905589B2 (enExample)
EP (1) EP4200460A4 (enExample)
JP (1) JP2023538027A (enExample)
KR (1) KR20230054403A (enExample)
TW (1) TW202225427A (enExample)
WO (1) WO2022039966A1 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FI130187B (fi) * 2020-02-24 2023-04-03 Pulsedeon Oy Menetelmä litiumia sisältävän materiaalikerroksen tai monikerrosrakenteen valmistamiseksi laserablaatiopinnoitusta käyttäen
KR20250025700A (ko) * 2022-07-14 2025-02-24 양저우 나노포어 이너베이티브 머티리얼즈 테크날로지 엘티디 구리 복합 집전체 및 이의 제조방법과 용도
KR20260089947A (ko) * 2023-10-20 2026-06-16 엘리베이티드 머티어리얼스 저머니 게엠베하 롤-투-롤(r2r) pvd 코팅 시스템에서 웹과 로토-스태틱 드럼 사이의 향상된 열 전달 계수(htc)

Family Cites Families (20)

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JPS4627644B1 (enExample) * 1968-04-10 1971-08-11
US4615070A (en) * 1984-08-27 1986-10-07 Tennant Company Sweeper with speed control for brush and vacuum fan
JPH0293068A (ja) * 1988-09-29 1990-04-03 Kawasaki Steel Corp 連続ｐｖｄ装置
MY143286A (en) 1996-05-21 2011-04-15 Panasonic Corp Thin film, method and apparatus for forming the same, and electronic component incorporating the same
JPH10226877A (ja) 1997-02-19 1998-08-25 Toshiba Corp 薄膜の作製方法及びその装置
JP3861457B2 (ja) 1998-05-08 2006-12-20 東レ株式会社 金属蒸着製品の製造方法および装置
JP4336869B2 (ja) 2001-11-27 2009-09-30 日本電気株式会社 真空成膜装置、真空成膜方法および電池用電極の製造方法
US7339139B2 (en) * 2003-10-03 2008-03-04 Darly Custom Technology, Inc. Multi-layered radiant thermal evaporator and method of use
JP2008081820A (ja) * 2006-09-28 2008-04-10 Sumitomo Electric Ind Ltd 成膜装置
CN101573471A (zh) * 2006-12-29 2009-11-04 3M创新有限公司 固化含有金属烷氧化物的膜的方法
CN101932748B (zh) * 2008-02-08 2012-02-22 松下电器产业株式会社 蒸镀膜的形成方法
US20100291308A1 (en) * 2009-05-14 2010-11-18 Veeco Instruments Inc. Web Substrate Deposition System
US20120282401A1 (en) 2011-05-05 2012-11-08 Etansi Inc. Method of forming a partial deposition layer and apparatus of forming a partial deposition layer
WO2013123997A1 (en) * 2012-02-24 2013-08-29 Applied Materials, Inc. In-situ annealing in roll to roll sputter web coater and method of operating thereof
US20140024172A1 (en) * 2012-07-20 2014-01-23 Primestar Solar, Inc. Vapor deposition apparatus for continuous deposition and treatment of a thin film layer on a substrate
US9634175B2 (en) * 2013-01-09 2017-04-25 Ascent Solar Technologies, Inc. Systems and methods for thermally managing high-temperature processes on temperature sensitive substrates
EP2762607B1 (en) * 2013-01-31 2018-07-25 Applied Materials, Inc. Deposition source with adjustable electrode
EP2762609B1 (en) * 2013-01-31 2019-04-17 Applied Materials, Inc. Apparatus and method for depositing at least two layers on a substrate
EP2883980B1 (en) * 2013-12-10 2017-02-08 Applied Materials, Inc. Vacuum processing apparatus with substrate spreading device and method for operating same
US10273574B2 (en) * 2016-03-18 2019-04-30 Honda Motor Co., Ltd. Method for continuous production of high quality graphene

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