JP2023535850A - ＦＴｒＰＳＡによるＨＦ／ＨＣｌ含有エッチング排ガスの分離と回収循環再利用方法 - Google Patents
ＦＴｒＰＳＡによるＨＦ／ＨＣｌ含有エッチング排ガスの分離と回収循環再利用方法 Download PDFInfo
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- JP2023535850A JP2023535850A JP2022512788A JP2022512788A JP2023535850A JP 2023535850 A JP2023535850 A JP 2023535850A JP 2022512788 A JP2022512788 A JP 2022512788A JP 2022512788 A JP2022512788 A JP 2022512788A JP 2023535850 A JP2023535850 A JP 2023535850A
- Authority
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- Prior art keywords
- gas
- hcl
- adsorption
- rectification
- chlorosilane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 219
- 238000005530 etching Methods 0.000 title claims abstract description 59
- 238000004064 recycling Methods 0.000 title claims abstract description 27
- 238000000926 separation method Methods 0.000 title claims description 13
- 238000011084 recovery Methods 0.000 title claims description 11
- 239000007789 gas Substances 0.000 claims abstract description 378
- 238000001179 sorption measurement Methods 0.000 claims abstract description 229
- 230000008569 process Effects 0.000 claims abstract description 169
- 238000010521 absorption reaction Methods 0.000 claims abstract description 134
- 238000009833 condensation Methods 0.000 claims abstract description 88
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 claims abstract description 87
- 239000005046 Chlorosilane Substances 0.000 claims abstract description 86
- 230000005494 condensation Effects 0.000 claims abstract description 77
- 239000007921 spray Substances 0.000 claims abstract description 72
- 238000000746 purification Methods 0.000 claims abstract description 55
- 239000002994 raw material Substances 0.000 claims abstract description 34
- 238000001312 dry etching Methods 0.000 claims abstract description 31
- 238000001704 evaporation Methods 0.000 claims abstract description 23
- 230000008020 evaporation Effects 0.000 claims abstract description 23
- 238000007906 compression Methods 0.000 claims abstract description 19
- 230000006835 compression Effects 0.000 claims abstract description 19
- 230000007613 environmental effect Effects 0.000 claims abstract description 7
- 238000011049 filling Methods 0.000 claims abstract description 5
- 239000007788 liquid Substances 0.000 claims description 63
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 52
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 49
- 229910001868 water Inorganic materials 0.000 claims description 42
- 238000003795 desorption Methods 0.000 claims description 40
- 239000001257 hydrogen Substances 0.000 claims description 38
- 229910052739 hydrogen Inorganic materials 0.000 claims description 38
- 239000002250 absorbent Substances 0.000 claims description 28
- 230000002745 absorbent Effects 0.000 claims description 28
- 239000012071 phase Substances 0.000 claims description 20
- 239000004480 active ingredient Substances 0.000 claims description 19
- 239000002737 fuel gas Substances 0.000 claims description 19
- 239000002253 acid Substances 0.000 claims description 18
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 claims description 17
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 17
- 230000002378 acidificating effect Effects 0.000 claims description 15
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical group C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims description 15
- 239000002245 particle Substances 0.000 claims description 15
- 229910000077 silane Inorganic materials 0.000 claims description 15
- 238000005406 washing Methods 0.000 claims description 15
- 239000000126 substance Substances 0.000 claims description 14
- 239000000460 chlorine Substances 0.000 claims description 13
- 239000012530 fluid Substances 0.000 claims description 13
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 12
- 239000011737 fluorine Substances 0.000 claims description 12
- 229910052731 fluorine Inorganic materials 0.000 claims description 12
- 238000001471 micro-filtration Methods 0.000 claims description 12
- 229910052801 chlorine Inorganic materials 0.000 claims description 11
- 239000002912 waste gas Substances 0.000 claims description 10
- 239000008367 deionised water Substances 0.000 claims description 9
- 229910021641 deionized water Inorganic materials 0.000 claims description 9
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 8
- 239000003546 flue gas Substances 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 239000000243 solution Substances 0.000 claims description 8
- 239000007864 aqueous solution Substances 0.000 claims description 7
- 239000000428 dust Substances 0.000 claims description 7
- 229910052751 metal Inorganic materials 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 6
- 238000007670 refining Methods 0.000 claims description 6
- 239000004071 soot Substances 0.000 claims description 6
- 238000004140 cleaning Methods 0.000 claims description 5
- 229910021645 metal ion Inorganic materials 0.000 claims description 5
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 4
- BSYQEPMUPCBSBK-UHFFFAOYSA-N [F].[SiH4] Chemical compound [F].[SiH4] BSYQEPMUPCBSBK-UHFFFAOYSA-N 0.000 claims description 4
- HICCMIMHFYBSJX-UHFFFAOYSA-N [SiH4].[Cl] Chemical compound [SiH4].[Cl] HICCMIMHFYBSJX-UHFFFAOYSA-N 0.000 claims description 4
- 230000002441 reversible effect Effects 0.000 claims description 4
- 238000013022 venting Methods 0.000 claims description 4
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 claims description 3
- 238000009835 boiling Methods 0.000 claims description 3
- 239000003795 chemical substances by application Substances 0.000 claims description 3
- 238000007599 discharging Methods 0.000 claims description 3
- 238000004821 distillation Methods 0.000 claims description 3
- 238000001035 drying Methods 0.000 claims description 3
- 239000012528 membrane Substances 0.000 claims description 3
- 238000012545 processing Methods 0.000 claims description 3
- 238000010992 reflux Methods 0.000 claims description 3
- 238000012546 transfer Methods 0.000 claims description 3
- 239000012808 vapor phase Substances 0.000 claims description 3
- 239000004615 ingredient Substances 0.000 claims description 2
- 239000000463 material Substances 0.000 claims description 2
- 229910052763 palladium Inorganic materials 0.000 claims description 2
- 239000002699 waste material Substances 0.000 claims description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 1
- 239000012855 volatile organic compound Substances 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 abstract description 6
- 238000005516 engineering process Methods 0.000 abstract description 5
- 238000010586 diagram Methods 0.000 abstract 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 125
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 124
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 120
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 119
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 119
- 239000003463 adsorbent Substances 0.000 description 14
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 12
- 238000006243 chemical reaction Methods 0.000 description 11
- 229910002091 carbon monoxide Inorganic materials 0.000 description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- 235000012431 wafers Nutrition 0.000 description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 description 6
- 229910002092 carbon dioxide Inorganic materials 0.000 description 6
- 239000000356 contaminant Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- -1 fluoride ions Chemical class 0.000 description 6
- 238000006386 neutralization reaction Methods 0.000 description 6
- 239000010703 silicon Substances 0.000 description 6
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 5
- 125000004122 cyclic group Chemical group 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 4
- 238000001020 plasma etching Methods 0.000 description 4
- 229910010271 silicon carbide Inorganic materials 0.000 description 4
- 231100000331 toxic Toxicity 0.000 description 4
- 230000002588 toxic effect Effects 0.000 description 4
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 3
- 239000000443 aerosol Substances 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- 239000003637 basic solution Substances 0.000 description 3
- 239000001569 carbon dioxide Substances 0.000 description 3
- 239000012159 carrier gas Substances 0.000 description 3
- 238000002485 combustion reaction Methods 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- 230000001590 oxidative effect Effects 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 239000005049 silicon tetrachloride Substances 0.000 description 3
- 239000002002 slurry Substances 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 229910018503 SF6 Inorganic materials 0.000 description 2
- 229910003902 SiCl 4 Inorganic materials 0.000 description 2
- 229910004014 SiF4 Inorganic materials 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000009841 combustion method Methods 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 238000009616 inductively coupled plasma Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 238000005086 pumping Methods 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- SFZCNBIFKDRMGX-UHFFFAOYSA-N sulfur hexafluoride Chemical compound FS(F)(F)(F)(F)F SFZCNBIFKDRMGX-UHFFFAOYSA-N 0.000 description 2
- OBTWBSRJZRCYQV-UHFFFAOYSA-N sulfuryl difluoride Chemical compound FS(F)(=O)=O OBTWBSRJZRCYQV-UHFFFAOYSA-N 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 2
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- BSYNRYMUTXBXSQ-UHFFFAOYSA-N Aspirin Chemical compound CC(=O)OC1=CC=CC=C1C(O)=O BSYNRYMUTXBXSQ-UHFFFAOYSA-N 0.000 description 1
- 229910004261 CaF 2 Inorganic materials 0.000 description 1
- YZCKVEUIGOORGS-OUBTZVSYSA-N Deuterium Chemical compound [2H] YZCKVEUIGOORGS-OUBTZVSYSA-N 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 229910003691 SiBr Inorganic materials 0.000 description 1
- 229910003910 SiCl4 Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 239000005935 Sulfuryl fluoride Substances 0.000 description 1
- UCUJUFDOQOJLBE-UHFFFAOYSA-N [Cl].[Ca] Chemical compound [Cl].[Ca] UCUJUFDOQOJLBE-UHFFFAOYSA-N 0.000 description 1
- LHTZXEQBTGVDPG-UHFFFAOYSA-J [F-].[F-].[F-].[F-].[Si+4](=O)=O Chemical compound [F-].[F-].[F-].[F-].[Si+4](=O)=O LHTZXEQBTGVDPG-UHFFFAOYSA-J 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
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- 229910021529 ammonia Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910052728 basic metal Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 description 1
- 229910001634 calcium fluoride Inorganic materials 0.000 description 1
- 239000000920 calcium hydroxide Substances 0.000 description 1
- 229910001861 calcium hydroxide Inorganic materials 0.000 description 1
- 239000000378 calcium silicate Substances 0.000 description 1
- 229910052918 calcium silicate Inorganic materials 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
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- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 150000002013 dioxins Chemical class 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 238000005108 dry cleaning Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 239000010436 fluorite Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910001512 metal fluoride Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002808 molecular sieve Substances 0.000 description 1
- QKCGXXHCELUCKW-UHFFFAOYSA-N n-[4-[4-(dinaphthalen-2-ylamino)phenyl]phenyl]-n-naphthalen-2-ylnaphthalen-2-amine Chemical compound C1=CC=CC2=CC(N(C=3C=CC(=CC=3)C=3C=CC(=CC=3)N(C=3C=C4C=CC=CC4=CC=3)C=3C=C4C=CC=CC4=CC=3)C3=CC4=CC=CC=C4C=C3)=CC=C21 QKCGXXHCELUCKW-UHFFFAOYSA-N 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229910000069 nitrogen hydride Inorganic materials 0.000 description 1
- GVGCUCJTUSOZKP-UHFFFAOYSA-N nitrogen trifluoride Chemical compound FN(F)F GVGCUCJTUSOZKP-UHFFFAOYSA-N 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
- 230000003000 nontoxic effect Effects 0.000 description 1
- 150000002916 oxazoles Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000002085 persistent effect Effects 0.000 description 1
- 238000000053 physical method Methods 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000008929 regeneration Effects 0.000 description 1
- 238000011069 regeneration method Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- AIFMYMZGQVTROK-UHFFFAOYSA-N silicon tetrabromide Chemical compound Br[Si](Br)(Br)Br AIFMYMZGQVTROK-UHFFFAOYSA-N 0.000 description 1
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 1
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 229960000909 sulfur hexafluoride Drugs 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 239000003440 toxic substance Substances 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B7/00—Halogens; Halogen acids
- C01B7/01—Chlorine; Hydrogen chloride
- C01B7/07—Purification ; Separation
- C01B7/0706—Purification ; Separation of hydrogen chloride
- C01B7/0712—Purification ; Separation of hydrogen chloride by distillation
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B3/00—Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen
- C01B3/50—Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification
- C01B3/56—Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification by contacting with solids; Regeneration of used solids
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B7/00—Halogens; Halogen acids
- C01B7/01—Chlorine; Hydrogen chloride
- C01B7/07—Purification ; Separation
- C01B7/0706—Purification ; Separation of hydrogen chloride
- C01B7/0718—Purification ; Separation of hydrogen chloride by adsorption
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B7/00—Halogens; Halogen acids
- C01B7/19—Fluorine; Hydrogen fluoride
- C01B7/191—Hydrogen fluoride
- C01B7/195—Separation; Purification
- C01B7/196—Separation; Purification by distillation
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B7/00—Halogens; Halogen acids
- C01B7/19—Fluorine; Hydrogen fluoride
- C01B7/191—Hydrogen fluoride
- C01B7/195—Separation; Purification
- C01B7/197—Separation; Purification by adsorption
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Treating Waste Gases (AREA)
- Gas Separation By Absorption (AREA)
- Drying Of Semiconductors (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011485842.2A CN112707373B (zh) | 2020-12-16 | 2020-12-16 | 一种含HF/HCl蚀刻尾气FTrPSA分离与回收循环再利用方法 |
| CN202011485842.2 | 2020-12-16 | ||
| PCT/CN2021/094254 WO2022127019A1 (zh) | 2020-12-16 | 2021-05-18 | 一种含HF/HCl蚀刻尾气FTrPSA分离与回收循环再利用方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2023535850A true JP2023535850A (ja) | 2023-08-22 |
| JPWO2022127019A5 JPWO2022127019A5 (de) | 2024-03-01 |
| JP7541763B2 JP7541763B2 (ja) | 2024-08-29 |
Family
ID=75543422
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022512788A Active JP7541763B2 (ja) | 2020-12-16 | 2021-05-18 | ＦＴｒＰＳＡによるＨＦ／ＨＣｌ含有エッチング排ガスの分離と回収循環再利用方法 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP7541763B2 (de) |
| CN (1) | CN112707373B (de) |
| WO (1) | WO2022127019A1 (de) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112707373B (zh) * | 2020-12-16 | 2022-06-10 | 浙江天采云集科技股份有限公司 | 一种含HF/HCl蚀刻尾气FTrPSA分离与回收循环再利用方法 |
| CN113860257B (zh) * | 2021-11-04 | 2022-04-22 | 浙江容跃环保科技有限公司 | 玻璃薄化废酸液再生回收的方法及系统 |
| CN115231524B (zh) * | 2022-07-12 | 2024-03-12 | 浙江省天正设计工程有限公司 | 一种氟化工生产中含氟化氢尾气的分离纯化方法和装置 |
| CN115650240A (zh) * | 2022-09-08 | 2023-01-31 | 洛阳中硅高科技有限公司 | 一氯硅烷的制备方法 |
Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09267016A (ja) * | 1996-01-29 | 1997-10-14 | Toyo Eng Corp | 改良された圧力スイング吸着法 |
| CN105854516A (zh) * | 2016-03-31 | 2016-08-17 | 四川天采科技有限责任公司 | 一种炼厂干气同时回收h2和c2及以上组分的全温程变压吸附方法 |
| JP2017043523A (ja) * | 2015-08-28 | 2017-03-02 | 信越化学工業株式会社 | 水素ガス回収システムおよび水素ガスの分離回収方法 |
| CN108658042A (zh) * | 2018-05-29 | 2018-10-16 | 四川天采科技有限责任公司 | 一种led-mocvd制程尾气全温程变压吸附全组分回收再利用方法 |
| CN108744882A (zh) * | 2018-05-29 | 2018-11-06 | 浙江天采云集科技股份有限公司 | 一种led-mocvd制程废气全温程变压吸附提氨再利用的方法 |
| US20180318750A1 (en) * | 2016-03-31 | 2018-11-08 | Sichuan Techairs Co., Ltd. | Method for Gas Separation, Purification and Clarification by FTrPSA |
| CN109092010A (zh) * | 2018-05-29 | 2018-12-28 | 浙江天采云集科技股份有限公司 | 一种led-mocvd制程废气全温程变压吸附提氢再利用的方法 |
| US20200070090A1 (en) * | 2018-09-03 | 2020-03-05 | South China Institute Of Environmental Science. Mee | Waste gas purification system and method |
| CN211799895U (zh) * | 2020-03-17 | 2020-10-30 | 大连海奥膜技术有限公司 | 一种分离含有氯化氢和氢气混合气体的工艺系统 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7790130B2 (en) * | 2007-08-31 | 2010-09-07 | Uop Llc | Wide mesoporous alumina composites having trimodal pore structure |
| CN108715436B (zh) * | 2018-05-29 | 2019-11-08 | 四川天采科技有限责任公司 | 半导体制程常压废氢气全温程变压吸附提纯再利用的方法 |
| CN112591711B (zh) * | 2020-12-16 | 2022-05-20 | 浙江天采云集科技股份有限公司 | 一种HF/HCl混合气体高纯度高收率的FTrPSA分离与净化提取方法 |
| CN112707373B (zh) * | 2020-12-16 | 2022-06-10 | 浙江天采云集科技股份有限公司 | 一种含HF/HCl蚀刻尾气FTrPSA分离与回收循环再利用方法 |
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- 2021-05-18 JP JP2022512788A patent/JP7541763B2/ja active Active
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Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09267016A (ja) * | 1996-01-29 | 1997-10-14 | Toyo Eng Corp | 改良された圧力スイング吸着法 |
| JP2017043523A (ja) * | 2015-08-28 | 2017-03-02 | 信越化学工業株式会社 | 水素ガス回収システムおよび水素ガスの分離回収方法 |
| CN105854516A (zh) * | 2016-03-31 | 2016-08-17 | 四川天采科技有限责任公司 | 一种炼厂干气同时回收h2和c2及以上组分的全温程变压吸附方法 |
| US20180318750A1 (en) * | 2016-03-31 | 2018-11-08 | Sichuan Techairs Co., Ltd. | Method for Gas Separation, Purification and Clarification by FTrPSA |
| CN108658042A (zh) * | 2018-05-29 | 2018-10-16 | 四川天采科技有限责任公司 | 一种led-mocvd制程尾气全温程变压吸附全组分回收再利用方法 |
| CN108744882A (zh) * | 2018-05-29 | 2018-11-06 | 浙江天采云集科技股份有限公司 | 一种led-mocvd制程废气全温程变压吸附提氨再利用的方法 |
| CN109092010A (zh) * | 2018-05-29 | 2018-12-28 | 浙江天采云集科技股份有限公司 | 一种led-mocvd制程废气全温程变压吸附提氢再利用的方法 |
| US20200070090A1 (en) * | 2018-09-03 | 2020-03-05 | South China Institute Of Environmental Science. Mee | Waste gas purification system and method |
| CN211799895U (zh) * | 2020-03-17 | 2020-10-30 | 大连海奥膜技术有限公司 | 一种分离含有氯化氢和氢气混合气体的工艺系统 |
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| CN112707373A (zh) | 2021-04-27 |
| WO2022127019A1 (zh) | 2022-06-23 |
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