JP2023509943A5 - - Google Patents

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Publication number
JP2023509943A5
JP2023509943A5 JP2022540837A JP2022540837A JP2023509943A5 JP 2023509943 A5 JP2023509943 A5 JP 2023509943A5 JP 2022540837 A JP2022540837 A JP 2022540837A JP 2022540837 A JP2022540837 A JP 2022540837A JP 2023509943 A5 JP2023509943 A5 JP 2023509943A5
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JP
Japan
Prior art keywords
chamber
inner chamber
reaction chamber
plasma
substrate processing
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2022540837A
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English (en)
Japanese (ja)
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JP2023509943A (ja
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Publication date
Priority claimed from FI20205023A external-priority patent/FI129609B/en
Application filed filed Critical
Publication of JP2023509943A publication Critical patent/JP2023509943A/ja
Publication of JP2023509943A5 publication Critical patent/JP2023509943A5/ja
Pending legal-status Critical Current

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JP2022540837A 2020-01-10 2020-12-21 基板処理装置及び方法 Pending JP2023509943A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FI20205023 2020-01-10
FI20205023A FI129609B (en) 2020-01-10 2020-01-10 Substrate processing apparatus
PCT/FI2020/050861 WO2021140270A1 (en) 2020-01-10 2020-12-21 Substrate processing apparatus and method

Publications (2)

Publication Number Publication Date
JP2023509943A JP2023509943A (ja) 2023-03-10
JP2023509943A5 true JP2023509943A5 (https=) 2023-11-06

Family

ID=74003816

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022540837A Pending JP2023509943A (ja) 2020-01-10 2020-12-21 基板処理装置及び方法

Country Status (10)

Country Link
US (2) US11004707B1 (https=)
EP (1) EP4087955A1 (https=)
JP (1) JP2023509943A (https=)
KR (1) KR20220143019A (https=)
CN (1) CN113106419A (https=)
CA (1) CA3165295A1 (https=)
FI (1) FI129609B (https=)
IL (1) IL294524B2 (https=)
TW (1) TWI886187B (https=)
WO (1) WO2021140270A1 (https=)

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CN117467976B (zh) * 2023-10-31 2024-05-17 北京北方华创微电子装备有限公司 用于气相沉积工艺腔室的上衬环、下衬环、进气衬体和内衬
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