JP2023126759A5 - - Google Patents

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Publication number
JP2023126759A5
JP2023126759A5 JP2023092916A JP2023092916A JP2023126759A5 JP 2023126759 A5 JP2023126759 A5 JP 2023126759A5 JP 2023092916 A JP2023092916 A JP 2023092916A JP 2023092916 A JP2023092916 A JP 2023092916A JP 2023126759 A5 JP2023126759 A5 JP 2023126759A5
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JP
Japan
Prior art keywords
photolithography system
during
data
stabilization
substrates
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Pending
Application number
JP2023092916A
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English (en)
Japanese (ja)
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JP2023126759A (ja
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Publication date
Priority claimed from US16/277,805 external-priority patent/US10996572B2/en
Application filed filed Critical
Publication of JP2023126759A publication Critical patent/JP2023126759A/ja
Priority to JP2025116329A priority Critical patent/JP2025165943A/ja
Publication of JP2023126759A5 publication Critical patent/JP2023126759A5/ja
Pending legal-status Critical Current

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JP2023092916A 2019-02-15 2023-06-06 デジタルリソグラフィツールのためのモデルベース動的位置補正 Pending JP2023126759A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2025116329A JP2025165943A (ja) 2019-02-15 2025-07-10 デジタルリソグラフィツールのためのモデルベース動的位置補正

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US16/277,805 US10996572B2 (en) 2019-02-15 2019-02-15 Model based dynamic positional correction for digital lithography tools
US16/277,805 2019-02-15
JP2021547456A JP7292397B2 (ja) 2019-02-15 2020-01-16 デジタルリソグラフィツールのためのモデルベース動的位置補正
PCT/US2020/013861 WO2020167408A1 (en) 2019-02-15 2020-01-16 Model based dynamic positional correction for digital lithography tools

Related Parent Applications (1)

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JP2021547456A Division JP7292397B2 (ja) 2019-02-15 2020-01-16 デジタルリソグラフィツールのためのモデルベース動的位置補正

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JP2025116329A Division JP2025165943A (ja) 2019-02-15 2025-07-10 デジタルリソグラフィツールのためのモデルベース動的位置補正

Publications (2)

Publication Number Publication Date
JP2023126759A JP2023126759A (ja) 2023-09-12
JP2023126759A5 true JP2023126759A5 (https=) 2025-07-29

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ID=72040798

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Application Number Title Priority Date Filing Date
JP2021547456A Active JP7292397B2 (ja) 2019-02-15 2020-01-16 デジタルリソグラフィツールのためのモデルベース動的位置補正
JP2023092916A Pending JP2023126759A (ja) 2019-02-15 2023-06-06 デジタルリソグラフィツールのためのモデルベース動的位置補正
JP2025116329A Pending JP2025165943A (ja) 2019-02-15 2025-07-10 デジタルリソグラフィツールのためのモデルベース動的位置補正

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JP2021547456A Active JP7292397B2 (ja) 2019-02-15 2020-01-16 デジタルリソグラフィツールのためのモデルベース動的位置補正

Family Applications After (1)

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JP2025116329A Pending JP2025165943A (ja) 2019-02-15 2025-07-10 デジタルリソグラフィツールのためのモデルベース動的位置補正

Country Status (6)

Country Link
US (2) US10996572B2 (https=)
JP (3) JP7292397B2 (https=)
KR (2) KR102717090B1 (https=)
CN (2) CN113544594B (https=)
TW (2) TWI789191B (https=)
WO (1) WO2020167408A1 (https=)

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US11481922B2 (en) * 2020-04-07 2022-10-25 Kla Corporation Online navigational drift correction for metrology measurements
CN116540489A (zh) * 2023-04-23 2023-08-04 上海华力集成电路制造有限公司 针对光刻中光罩热效应的修正方法

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