JP2022541409A5 - - Google Patents

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Publication number
JP2022541409A5
JP2022541409A5 JP2022500956A JP2022500956A JP2022541409A5 JP 2022541409 A5 JP2022541409 A5 JP 2022541409A5 JP 2022500956 A JP2022500956 A JP 2022500956A JP 2022500956 A JP2022500956 A JP 2022500956A JP 2022541409 A5 JP2022541409 A5 JP 2022541409A5
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JP
Japan
Prior art keywords
patterning
mandrels
subset
width
stack
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JP2022500956A
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English (en)
Japanese (ja)
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JP2022541409A (ja
JP7515564B2 (ja
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Priority claimed from US16/514,235 external-priority patent/US11257681B2/en
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Publication of JP2022541409A publication Critical patent/JP2022541409A/ja
Publication of JP2022541409A5 publication Critical patent/JP2022541409A5/ja
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Publication of JP7515564B2 publication Critical patent/JP7515564B2/ja
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JP2022500956A 2019-07-17 2020-07-03 ナノシートの直接印刷および自己整合ダブル・パターニング Active JP7515564B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US16/514,235 US11257681B2 (en) 2019-07-17 2019-07-17 Using a same mask for direct print and self-aligned double patterning of nanosheets
US16/514,235 2019-07-17
PCT/IB2020/056290 WO2021009606A1 (en) 2019-07-17 2020-07-03 Direct print and self-aligned double patterning of nanosheets

Publications (3)

Publication Number Publication Date
JP2022541409A JP2022541409A (ja) 2022-09-26
JP2022541409A5 true JP2022541409A5 (https=) 2022-12-13
JP7515564B2 JP7515564B2 (ja) 2024-07-12

Family

ID=74210237

Family Applications (1)

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JP2022500956A Active JP7515564B2 (ja) 2019-07-17 2020-07-03 ナノシートの直接印刷および自己整合ダブル・パターニング

Country Status (6)

Country Link
US (2) US11257681B2 (https=)
JP (1) JP7515564B2 (https=)
CN (1) CN114175211B (https=)
DE (1) DE112020002857T5 (https=)
GB (1) GB2600338B (https=)
WO (1) WO2021009606A1 (https=)

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