JP2022526625A5 - - Google Patents

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Publication number
JP2022526625A5
JP2022526625A5 JP2021559425A JP2021559425A JP2022526625A5 JP 2022526625 A5 JP2022526625 A5 JP 2022526625A5 JP 2021559425 A JP2021559425 A JP 2021559425A JP 2021559425 A JP2021559425 A JP 2021559425A JP 2022526625 A5 JP2022526625 A5 JP 2022526625A5
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JP
Japan
Prior art keywords
product
reticle
samples
measurement data
simulated
Prior art date
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Granted
Application number
JP2021559425A
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English (en)
Japanese (ja)
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JP2022526625A (ja
JP7369788B2 (ja
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Priority claimed from US16/824,327 external-priority patent/US10990019B2/en
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Publication of JP2022526625A publication Critical patent/JP2022526625A/ja
Publication of JP2022526625A5 publication Critical patent/JP2022526625A5/ja
Application granted granted Critical
Publication of JP7369788B2 publication Critical patent/JP7369788B2/ja
Active legal-status Critical Current
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JP2021559425A 2019-04-09 2020-04-07 確率的レチクル欠陥処理 Active JP7369788B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201962831524P 2019-04-09 2019-04-09
US62/831,524 2019-04-09
US16/824,327 2020-03-19
US16/824,327 US10990019B2 (en) 2019-04-09 2020-03-19 Stochastic reticle defect dispositioning
PCT/US2020/026971 WO2020210177A1 (en) 2019-04-09 2020-04-07 Stochastic reticle defect dispositioning

Publications (3)

Publication Number Publication Date
JP2022526625A JP2022526625A (ja) 2022-05-25
JP2022526625A5 true JP2022526625A5 (enExample) 2023-04-03
JP7369788B2 JP7369788B2 (ja) 2023-10-26

Family

ID=72747403

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021559425A Active JP7369788B2 (ja) 2019-04-09 2020-04-07 確率的レチクル欠陥処理

Country Status (5)

Country Link
US (1) US10990019B2 (enExample)
JP (1) JP7369788B2 (enExample)
KR (1) KR102616536B1 (enExample)
TW (1) TWI818169B (enExample)
WO (1) WO2020210177A1 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10176966B1 (en) 2017-04-13 2019-01-08 Fractilia, Llc Edge detection system
US12142454B2 (en) 2017-04-13 2024-11-12 Fractilla, LLC Detection of probabilistic process windows
US10522322B2 (en) 2017-04-13 2019-12-31 Fractilia, Llc System and method for generating and analyzing roughness measurements
US11380516B2 (en) 2017-04-13 2022-07-05 Fractilia, Llc System and method for generating and analyzing roughness measurements and their use for process monitoring and control
CA3226512A1 (en) * 2021-08-11 2023-02-16 Fuming Wang Mask defect detection
US12306531B2 (en) * 2021-08-20 2025-05-20 Samsung Electronics Co., Ltd. Lithography and method of fabricating semiconductor device using the same
US11966156B2 (en) * 2022-08-16 2024-04-23 Kla Corporation Lithography mask repair by simulation of photoresist thickness evolution

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US6699627B2 (en) * 2000-12-08 2004-03-02 Adlai Smith Reference wafer and process for manufacturing same
US6734971B2 (en) * 2000-12-08 2004-05-11 Lael Instruments Method and apparatus for self-referenced wafer stage positional error mapping
JP2004296592A (ja) * 2003-03-26 2004-10-21 Dainippon Screen Mfg Co Ltd 欠陥分類装置、欠陥分類方法およびプログラム
JP2005258080A (ja) * 2004-03-11 2005-09-22 Matsushita Electric Ind Co Ltd レイアウトデータ検証方法、マスクパターン検証方法および回路動作検証方法
US7729529B2 (en) * 2004-12-07 2010-06-01 Kla-Tencor Technologies Corp. Computer-implemented methods for detecting and/or sorting defects in a design pattern of a reticle
CN102662309B (zh) * 2005-09-09 2014-10-01 Asml荷兰有限公司 采用独立掩模误差模型的掩模验证系统和方法
US8555210B2 (en) * 2011-04-29 2013-10-08 Micron Technology, Inc. Systems and methods for stochastic models of mask process variability
NL2009982A (en) 2012-01-10 2013-07-15 Asml Netherlands Bv Source mask optimization to reduce stochastic effects.
US8718353B2 (en) * 2012-03-08 2014-05-06 Kla-Tencor Corporation Reticle defect inspection with systematic defect filter
US9576861B2 (en) 2012-11-20 2017-02-21 Kla-Tencor Corporation Method and system for universal target based inspection and metrology
US10101670B2 (en) * 2013-03-27 2018-10-16 Kla-Tencor Corporation Statistical model-based metrology
US8910092B1 (en) * 2013-11-13 2014-12-09 Taiwan Semiconductor Manufacturing Co., Ltd. Model based simulation method with fast bias contour for lithography process check
US9087176B1 (en) * 2014-03-06 2015-07-21 Kla-Tencor Corporation Statistical overlay error prediction for feed forward and feedback correction of overlay errors, root cause analysis and process control
KR102735948B1 (ko) * 2015-08-10 2024-11-28 케이엘에이 코포레이션 웨이퍼-레벨 결함 인쇄성을 예측하기 위한 장치 및 방법들
KR102395198B1 (ko) 2015-09-22 2022-05-06 삼성전자주식회사 마스크 패턴의 보정 방법 및 이를 이용하는 레티클의 제조 방법
KR102262427B1 (ko) * 2016-12-02 2021-06-09 에이에스엠엘 네델란즈 비.브이. 확률적 변동을 추산하는 모델
US10901325B2 (en) * 2017-02-28 2021-01-26 Kla-Tencor Corporation Determining the impacts of stochastic behavior on overlay metrology data
US10474042B2 (en) 2017-03-22 2019-11-12 Kla-Tencor Corporation Stochastically-aware metrology and fabrication
US10656532B2 (en) * 2017-04-13 2020-05-19 Fractilia, Llc Edge detection system and its use for optical proximity correction
CN110869854B (zh) 2017-07-12 2022-06-10 Asml荷兰有限公司 缺陷预测
DE102018202637B4 (de) * 2018-02-21 2021-09-23 Carl Zeiss Smt Gmbh Verfahren zur Bestimmung einer Fokuslage einer Lithographie-Maske und Metrologiesystem zur Durchführung eines derartigen Verfahrens

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