JP2022514180A5 - - Google Patents
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- Publication number
- JP2022514180A5 JP2022514180A5 JP2021524017A JP2021524017A JP2022514180A5 JP 2022514180 A5 JP2022514180 A5 JP 2022514180A5 JP 2021524017 A JP2021524017 A JP 2021524017A JP 2021524017 A JP2021524017 A JP 2021524017A JP 2022514180 A5 JP2022514180 A5 JP 2022514180A5
- Authority
- JP
- Japan
- Prior art keywords
- stage
- measurement system
- light source
- sample holder
- sample
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201862756964P | 2018-11-07 | 2018-11-07 | |
| US62/756,964 | 2018-11-07 | ||
| US201862772887P | 2018-11-29 | 2018-11-29 | |
| US62/772,887 | 2018-11-29 | ||
| PCT/US2019/058313 WO2020096794A1 (en) | 2018-11-07 | 2019-10-28 | Methods and apparatus for waveguide metrology |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2022514180A JP2022514180A (ja) | 2022-02-10 |
| JP2022514180A5 true JP2022514180A5 (https=) | 2022-11-08 |
| JP7786946B2 JP7786946B2 (ja) | 2025-12-16 |
Family
ID=70459610
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021524017A Active JP7786946B2 (ja) | 2018-11-07 | 2019-10-28 | 導波計測のための方法及び装置 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US11029206B2 (https=) |
| EP (1) | EP3877739A4 (https=) |
| JP (1) | JP7786946B2 (https=) |
| KR (1) | KR102848264B1 (https=) |
| CN (1) | CN112997058B (https=) |
| TW (1) | TWI841622B (https=) |
| WO (1) | WO2020096794A1 (https=) |
Families Citing this family (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10676325B1 (en) | 2018-02-27 | 2020-06-09 | Willie Dell | Hoist track adaptor |
| IL293582B2 (en) * | 2019-12-09 | 2026-03-01 | Oliveira Egalon Claudio | System and method for side illumination of waveguides |
| CN111856651B (zh) * | 2020-09-02 | 2025-05-09 | 舜宇奥来微纳光电信息技术(上海)有限公司 | 光波导 |
| US11748875B2 (en) * | 2020-10-15 | 2023-09-05 | Applied Materials, Inc. | See-through metrology systems, apparatus, and methods for optical devices |
| JP7801335B2 (ja) * | 2020-11-24 | 2026-01-16 | アプライド マテリアルズ インコーポレイテッド | 拡張現実感計測学ツールのための照明システム |
| CN116615676A (zh) * | 2020-11-24 | 2023-08-18 | 应用材料公司 | 光学装置计量系统与相关方法 |
| US12165341B2 (en) * | 2020-11-24 | 2024-12-10 | Applied Materials, Inc. | Optical resolution measurement method for optical devices |
| DE102021200231A1 (de) * | 2021-01-13 | 2022-07-14 | Robert Bosch Gesellschaft mit beschränkter Haftung | Verfahren zum Ermitteln einer Beugungscharakteristik eines Hologrammelements für eine Datenbrille |
| CN113218627B (zh) * | 2021-03-26 | 2022-10-14 | 歌尔股份有限公司 | 光栅衍射效率测试装置及方法 |
| EP4330740A4 (en) * | 2021-04-30 | 2025-03-12 | Magic Leap, Inc. | Waveguide with thin illumination layer and manufacturing method |
| KR20240035921A (ko) * | 2021-08-13 | 2024-03-18 | 어플라이드 머티어리얼스, 인코포레이티드 | 도파관 결합기들 및 메타표면들을 위한 풀-필드 계측 툴 |
| CN113884180B (zh) * | 2021-09-29 | 2024-03-12 | 歌尔光学科技有限公司 | 衍射光波导的测试系统、方法及装置 |
| US20230251161A1 (en) * | 2022-02-10 | 2023-08-10 | Applied Materials, Inc. | High-precision and high-throughput measurement of percentage light loss of optical devices |
| US20250231085A1 (en) * | 2022-04-11 | 2025-07-17 | Goertek Optical Technology Co., Ltd. | Waveguide measurement device |
| US20230375410A1 (en) * | 2022-05-20 | 2023-11-23 | Facebook Technologies, Llc | Apparatuses and systems for optical element measurements |
| CN115266032B (zh) * | 2022-07-11 | 2025-10-10 | 杭州驭光光电科技有限公司 | 一种波导片检测系统 |
| WO2024059310A1 (en) * | 2022-09-15 | 2024-03-21 | Applied Materials, Inc. | Methods to measure light loss and efficiency of diffraction gratings on optical substrates |
| CN115931303B (zh) * | 2022-10-26 | 2023-11-17 | 江西凤凰光学科技有限公司 | 一种多色衍射光波导的测试方法 |
| DE102022132453B4 (de) | 2022-12-07 | 2026-04-09 | Trioptics Gmbh | Vorrichtung und Verfahren zum Bestimmen einer Abbildungsqualität zumindest einer Abbildung für einen Prüfling |
| KR20240127754A (ko) * | 2023-02-16 | 2024-08-23 | 삼성전자주식회사 | 광학 계측 설비 |
| CN117367751B (zh) * | 2023-10-19 | 2024-05-10 | 中聚科技股份有限公司 | 超脉冲掺铥激光器的性能检测方法及装置 |
| FI131851B1 (en) * | 2024-01-24 | 2026-01-09 | Dispelix Oy | Optical measurement arrangement |
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| US5493393A (en) * | 1989-03-17 | 1996-02-20 | The Boeing Company | Planar waveguide spectrograph |
| JPH0454438A (ja) * | 1990-06-21 | 1992-02-21 | Jasco Corp | 透過・反射光測定装置 |
| JPH0477633A (ja) * | 1990-07-19 | 1992-03-11 | Suga Shikenki Kk | 測色計 |
| JPH0579947A (ja) * | 1991-09-19 | 1993-03-30 | Fujitsu Ltd | ホログラム特性評価方法及びその装置 |
| US5233405A (en) * | 1991-11-06 | 1993-08-03 | Hewlett-Packard Company | Optical spectrum analyzer having double-pass monochromator |
| JPH07218384A (ja) * | 1994-02-07 | 1995-08-18 | Fujitsu Ltd | 空間周波数測定装置 |
| US5570207A (en) * | 1994-06-28 | 1996-10-29 | Chang; Mao-Chi | Holographic image identification system |
| IL116583A (en) | 1995-12-27 | 2001-06-14 | Ruschin Shlomo | Spectral analyzer and directional indicator |
| ATE254291T1 (de) * | 1998-04-02 | 2003-11-15 | Elop Electrooptics Ind Ltd | Optische holographische vorrichtungen |
| JP4882139B2 (ja) * | 2000-07-19 | 2012-02-22 | 大日本印刷株式会社 | ホログラム評価装置 |
| JP4627596B2 (ja) * | 2001-01-25 | 2011-02-09 | 大日本印刷株式会社 | 光反射体検査装置とその使用方法、光反射体検査方法 |
| US6781701B1 (en) * | 2001-04-10 | 2004-08-24 | Intel Corporation | Method and apparatus for measuring optical phase and amplitude |
| US6731380B2 (en) * | 2001-06-18 | 2004-05-04 | Applied Optics Center Of Delaware, Inc. | Method and apparatus for simultaneous measurement of the refractive index and thickness of thin films |
| KR100502560B1 (ko) * | 2002-07-25 | 2005-07-20 | 주식회사 솔루션닉스 | 광학식 마커를 이용한 3차원 측정 데이터 자동 정렬장치및 그 방법 |
| JP2005257320A (ja) * | 2004-03-09 | 2005-09-22 | Tokyo Univ Of Pharmacy & Life Science | 分光電気化学セル及びこれを用いた光導波路分光電気化学測定法 |
| US7254290B1 (en) | 2004-05-10 | 2007-08-07 | Lockheed Martin Corporation | Enhanced waveguide metrology gauge collimator |
| US7791727B2 (en) | 2004-08-16 | 2010-09-07 | Asml Netherlands B.V. | Method and apparatus for angular-resolved spectroscopic lithography characterization |
| CN101449134B (zh) * | 2006-05-01 | 2011-08-03 | 海因兹仪器公司 | 光学元件中线性和圆形双衰减的测量 |
| JP4976113B2 (ja) | 2006-11-29 | 2012-07-18 | 三井化学株式会社 | 光導波路の検査方法および検査装置 |
| JP2010139483A (ja) | 2008-12-15 | 2010-06-24 | Synergy Optosystems Co Ltd | 光導波路の検査システム及び検査方法 |
| WO2010140998A1 (en) * | 2009-06-02 | 2010-12-09 | Vladimir Yankov | Optical integrated nanospectrometer and method of manufacturing thereof |
| JP5467875B2 (ja) | 2010-01-18 | 2014-04-09 | シナジーオプトシステムズ株式会社 | 光導波路の検査装置 |
| JP2013142640A (ja) * | 2012-01-11 | 2013-07-22 | Sumitomo Bakelite Co Ltd | 光導波路評価装置および光導波路評価方法 |
| KR20130091390A (ko) | 2012-02-08 | 2013-08-19 | 주식회사 제씨콤 | 평판형 광도파로의 각도검사장치 |
| WO2013188602A1 (en) * | 2012-06-13 | 2013-12-19 | Kla-Tencor Corporation | Optical surface scanning systems and methods |
| JP2014194473A (ja) | 2013-03-28 | 2014-10-09 | Hitachi Chemical Co Ltd | 光導波路及び光導波路の検査方法 |
| US9846122B2 (en) | 2013-11-26 | 2017-12-19 | Nanometrics Incorporated | Optical metrology system for spectral imaging of a sample |
| JP2015215237A (ja) | 2014-05-09 | 2015-12-03 | 日立化成株式会社 | 光導波路の検査方法 |
| GB2529003B (en) * | 2014-08-03 | 2020-08-26 | Wave Optics Ltd | Optical device |
| JP6468418B2 (ja) * | 2014-10-30 | 2019-02-13 | 大日本印刷株式会社 | 反射型体積ホログラムを含むセキュリティ媒体の真贋判定装置、反射型体積ホログラムを含むセキュリティ媒体の真贋判定方法、及び反射型体積ホログラムを含むセキュリティ媒体 |
| JP6331196B2 (ja) | 2015-01-05 | 2018-05-30 | シナジーオプトシステムズ株式会社 | 光学素子、照射光学系、集光光学系および光導波路検査装置 |
| US9372347B1 (en) * | 2015-02-09 | 2016-06-21 | Microsoft Technology Licensing, Llc | Display system |
| US20160265974A1 (en) * | 2015-03-09 | 2016-09-15 | Corning Incorporated | Glass waveguide spectrophotometer |
| WO2017165403A1 (en) * | 2016-03-21 | 2017-09-28 | Nueon Inc. | Porous mesh spectrometry methods and apparatus |
| JP6730125B2 (ja) * | 2016-08-01 | 2020-07-29 | 株式会社ディスコ | 計測装置 |
| AU2017350941B2 (en) * | 2016-10-28 | 2022-07-28 | Magic Leap, Inc. | Method and system for large field of view display with scanning reflector |
| JP2018146437A (ja) | 2017-03-07 | 2018-09-20 | 日東電工株式会社 | 光導波路の検査方法およびそれを用いた光導波路の製法 |
| US11092427B2 (en) * | 2018-09-25 | 2021-08-17 | The Charles Stark Draper Laboratory, Inc. | Metrology and profilometry using light field generator |
| JP7702880B2 (ja) * | 2019-04-15 | 2025-07-04 | アプライド マテリアルズ インコーポレイテッド | 測定システム及び光の回折方法 |
-
2019
- 2019-10-28 JP JP2021524017A patent/JP7786946B2/ja active Active
- 2019-10-28 CN CN201980073431.1A patent/CN112997058B/zh active Active
- 2019-10-28 WO PCT/US2019/058313 patent/WO2020096794A1/en not_active Ceased
- 2019-10-28 KR KR1020217016944A patent/KR102848264B1/ko active Active
- 2019-10-28 EP EP19881654.8A patent/EP3877739A4/en active Pending
- 2019-10-31 US US16/670,976 patent/US11029206B2/en active Active
- 2019-11-06 TW TW108140205A patent/TWI841622B/zh active
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