|
US3758201A
(en)
|
1971-07-15 |
1973-09-11 |
American Optical Corp |
Optical system for improved eye refraction
|
|
US5286313A
(en)
|
1991-10-31 |
1994-02-15 |
Surface Combustion, Inc. |
Process control system using polarizing interferometer
|
|
US5426506A
(en)
|
1993-03-22 |
1995-06-20 |
The University Of Chicago |
Optical method and apparatus for detection of surface and near-subsurface defects in dense ceramics
|
|
DE69528866T2
(de)
|
1994-08-12 |
2003-03-27 |
Matsushita Electric Industrial Co., Ltd. |
Optischer Sensor
|
|
US6288780B1
(en)
|
1995-06-06 |
2001-09-11 |
Kla-Tencor Technologies Corp. |
High throughput brightfield/darkfield wafer inspection system using advanced optical techniques
|
|
JP3370487B2
(ja)
*
|
1995-07-25 |
2003-01-27 |
ペンタックス株式会社 |
情報読取装置
|
|
DE19535392A1
(de)
|
1995-09-23 |
1997-03-27 |
Zeiss Carl Fa |
Radial polarisationsdrehende optische Anordnung und Mikrolithographie-Projektionsbelichtungsanlage damit
|
|
FR2758890B1
(fr)
|
1997-01-29 |
1999-02-26 |
Thomson Multimedia Sa |
Dispositif optique de polarisation
|
|
US6034776A
(en)
|
1997-04-16 |
2000-03-07 |
The United States Of America As Represented By The Secretary Of Commerce |
Microroughness-blind optical scattering instrument
|
|
US6281993B1
(en)
*
|
1998-03-30 |
2001-08-28 |
International Business Machines Corporation |
Phase shifting element for optical information processing storing systems
|
|
US20080198456A1
(en)
|
1998-07-31 |
2008-08-21 |
Colorlink, Inc. |
Laminated retarder stack
|
|
JP3610837B2
(ja)
|
1998-09-18 |
2005-01-19 |
株式会社日立製作所 |
試料表面の観察方法及びその装置並びに欠陥検査方法及びその装置
|
|
JP3640059B2
(ja)
|
1999-02-12 |
2005-04-20 |
パイオニア株式会社 |
収差補正装置及びこれを用いた光学装置
|
|
WO2002025708A2
(en)
|
2000-09-20 |
2002-03-28 |
Kla-Tencor-Inc. |
Methods and systems for semiconductor fabrication processes
|
|
US6891627B1
(en)
|
2000-09-20 |
2005-05-10 |
Kla-Tencor Technologies Corp. |
Methods and systems for determining a critical dimension and overlay of a specimen
|
|
DE10124474A1
(de)
|
2001-05-19 |
2002-11-21 |
Zeiss Carl |
Mikrolithographisches Belichtungsverfahren sowie Projektionsobjektiv zur Durchführung des Verfahrens
|
|
WO2003075207A2
(en)
|
2002-03-01 |
2003-09-12 |
Planar Systems, Inc. |
Reflection resistant touch screens
|
|
US6924893B2
(en)
|
2002-05-13 |
2005-08-02 |
Marine Biological Laboratory |
Enhancing polarized light microscopy
|
|
JP4223769B2
(ja)
|
2002-08-30 |
2009-02-12 |
富士通株式会社 |
測定装置
|
|
JP3878107B2
(ja)
*
|
2002-11-06 |
2007-02-07 |
株式会社日立ハイテクノロジーズ |
欠陥検査方法及びその装置
|
|
JP4530267B2
(ja)
*
|
2003-08-30 |
2010-08-25 |
シャープ株式会社 |
マルチプルビューディスプレイ
|
|
TWI569308B
(zh)
|
2003-10-28 |
2017-02-01 |
尼康股份有限公司 |
照明光學裝置、曝光裝置、曝光方法以及元件製造 方法
|
|
KR101230757B1
(ko)
|
2004-01-16 |
2013-02-06 |
칼 짜이스 에스엠티 게엠베하 |
편광변조 광학소자
|
|
US8270077B2
(en)
*
|
2004-01-16 |
2012-09-18 |
Carl Zeiss Smt Gmbh |
Polarization-modulating optical element
|
|
US7271874B2
(en)
|
2004-11-02 |
2007-09-18 |
Asml Holding N.V. |
Method and apparatus for variable polarization control in a lithography system
|
|
US7728965B2
(en)
*
|
2005-06-06 |
2010-06-01 |
Kla-Tencor Technologies Corp. |
Systems and methods for inspecting an edge of a specimen
|
|
US20100182582A1
(en)
|
2005-06-13 |
2010-07-22 |
Asml Netherlands B.V, |
Passive reticle tool, a lithographic apparatus and a method of patterning a device in a lithography tool
|
|
US7317512B2
(en)
|
2005-07-11 |
2008-01-08 |
Asml Netherlands B.V. |
Different polarization in cross-section of a radiation beam in a lithographic apparatus and device manufacturing method
|
|
DE102006031807A1
(de)
|
2005-07-12 |
2007-01-18 |
Carl Zeiss Smt Ag |
Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage, sowie Depolarisator
|
|
US20090115989A1
(en)
|
2005-11-10 |
2009-05-07 |
Hirohisa Tanaka |
Lighting optical system, exposure system, and exposure method
|
|
US7714997B2
(en)
*
|
2006-11-07 |
2010-05-11 |
Hitachi High-Technologies Corporation |
Apparatus for inspecting defects
|
|
US20090015761A1
(en)
|
2007-05-04 |
2009-01-15 |
Itronix Corporation |
Combination transparent touch panel liquid crystal display stack and methods of manufacturing same
|
|
JP2009053132A
(ja)
|
2007-08-29 |
2009-03-12 |
Hitachi High-Technologies Corp |
欠陥検査方法および欠陥検査装置
|
|
JP4971932B2
(ja)
|
2007-10-01 |
2012-07-11 |
キヤノン株式会社 |
照明光学系、露光装置、デバイス製造方法および偏光制御ユニット
|
|
DE102009015393B3
(de)
|
2009-03-20 |
2010-09-02 |
Carl Zeiss Smt Ag |
Messverfahren und Messsystem zur Messung der Doppelbrechung
|
|
WO2010130673A1
(en)
|
2009-05-15 |
2010-11-18 |
Asml Netherlands B.V. |
Inspection method for lithography
|
|
US9176072B2
(en)
*
|
2009-07-22 |
2015-11-03 |
Kla-Tencor Corporation |
Dark field inspection system with ring illumination
|
|
JP5216752B2
(ja)
*
|
2009-11-18 |
2013-06-19 |
株式会社日立ハイテクノロジーズ |
欠陥検出方法及び欠陥検出装置並びにこれを備えた欠陥観察装置
|
|
EP2369413B1
(en)
|
2010-03-22 |
2021-04-07 |
ASML Netherlands BV |
Illumination system and lithographic apparatus
|
|
DE102011013613A1
(de)
*
|
2010-10-01 |
2012-04-05 |
Carl Zeiss Microimaging Gmbh |
Mikroskop und Mikroskopierverfahren
|
|
EP2652776B1
(en)
|
2010-12-16 |
2019-08-07 |
KLA-Tencor Corporation |
Wafer inspection
|
|
US9255894B2
(en)
*
|
2012-11-09 |
2016-02-09 |
Kla-Tencor Corporation |
System and method for detecting cracks in a wafer
|
|
KR101740430B1
(ko)
*
|
2013-03-20 |
2017-05-26 |
에이에스엠엘 네델란즈 비.브이. |
마이크로구조체의 비대칭을 측정하는 방법 및 장치, 위치 측정 방법, 위치 측정 장치, 리소그래피 장치 및 디바이스 제조 방법
|
|
US9995850B2
(en)
*
|
2013-06-06 |
2018-06-12 |
Kla-Tencor Corporation |
System, method and apparatus for polarization control
|
|
KR101643357B1
(ko)
|
2013-08-26 |
2016-07-27 |
가부시키가이샤 뉴플레어 테크놀로지 |
촬상 장치, 검사 장치 및 검사 방법
|
|
CN103431845B
(zh)
*
|
2013-08-28 |
2015-08-05 |
北京信息科技大学 |
基于径向偏振光束的光学相干层析成像方法及装置
|
|
JP6273162B2
(ja)
*
|
2014-03-25 |
2018-01-31 |
株式会社日立ハイテクノロジーズ |
欠陥検査方法及びその装置
|
|
JP2015206642A
(ja)
*
|
2014-04-18 |
2015-11-19 |
株式会社日立ハイテクノロジーズ |
欠陥観察方法及びその装置
|
|
FR3020684B1
(fr)
*
|
2014-04-30 |
2017-05-19 |
Horiba Jobin Yvon Sas |
Systeme et procede de spectrometrie de decharge luminescente et de mesure in situ de la profondeur de gravure d'un echantillon
|
|
JP6369860B2
(ja)
|
2014-07-15 |
2018-08-08 |
株式会社日立ハイテクノロジーズ |
欠陥観察方法及びその装置
|
|
US9891177B2
(en)
|
2014-10-03 |
2018-02-13 |
Kla-Tencor Corporation |
TDI sensor in a darkfield system
|
|
US10341640B2
(en)
|
2015-04-10 |
2019-07-02 |
The Board Of Trustees Of The Leland Stanford Junior University |
Multi-wavelength phase mask
|
|
US10067072B2
(en)
*
|
2015-07-10 |
2018-09-04 |
Kla-Tencor Corporation |
Methods and apparatus for speckle suppression in laser dark-field systems
|
|
JP2019510202A
(ja)
*
|
2016-01-13 |
2019-04-11 |
ネックスジェン・パートナーズ・アイピー・リミテッド・ |
多重パラメータ分光法のためのシステム及び方法
|
|
US10018560B2
(en)
*
|
2016-02-02 |
2018-07-10 |
Kla-Tencor Corporation |
System and method for hyperspectral imaging metrology
|
|
US9874526B2
(en)
*
|
2016-03-28 |
2018-01-23 |
Kla-Tencor Corporation |
Methods and apparatus for polarized wafer inspection
|
|
FR3054152B1
(fr)
*
|
2016-07-25 |
2018-11-09 |
Amplitude Systemes |
Appareil et procede de decoupe de materiau par faisceau laser allonge non diffractif
|
|
JP6759053B2
(ja)
|
2016-10-26 |
2020-09-23 |
株式会社ニューフレアテクノロジー |
偏光イメージ取得装置、パターン検査装置、偏光イメージ取得方法、及びパターン検査方法
|
|
US10234402B2
(en)
*
|
2017-01-05 |
2019-03-19 |
Kla-Tencor Corporation |
Systems and methods for defect material classification
|
|
CN108680544B
(zh)
*
|
2018-04-23 |
2021-04-06 |
浙江大学 |
一种结构化照明的光切片荧光显微成像方法和装置
|
|
US10942135B2
(en)
|
2018-11-14 |
2021-03-09 |
Kla Corporation |
Radial polarizer for particle detection
|
|
US11879853B2
(en)
*
|
2021-02-19 |
2024-01-23 |
Kla Corporation |
Continuous degenerate elliptical retarder for sensitive particle detection
|