JP7438424B2 - 粒子検出のためのシステム及び方法 - Google Patents
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- G01N21/88—Investigating the presence of flaws or contamination
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- G01N21/88—Investigating the presence of flaws or contamination
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- G—PHYSICS
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- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
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- H01L22/10—Measuring as part of the manufacturing process
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- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
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Description
本出願は、米国特許法第119条(e)に基づいて、Jenn-Kuen Leong、Daniel Kavaldjiev、John Fielden、およびGuoheng Zhaoを発明者とする、2018年11月14日に出願された米国仮特許出願第62/767,246号、発明の名称「PARTICLE DETECTION WITH IMPROVED RESOLUTION ON WAFER INSPECTION SYSTEM」の優先権を主張するものであり、同仮出願の全文は参照することにより本明細書に組み込まれるものとする。
Claims (8)
- 照明ビームを生成するように構成された照明源と、
照明方向に沿って軸外角度で前記照明ビームをサンプルに向けるように構成された1つまたは複数の照明光学系と、
検出器と、
前記照明ビームに応答して前記サンプルから集光された光に基づいて前記検出器上に前記サンプルの暗視野画像を生成するように構成された1つまたは複数の集光光学系と、
前記1つまたは複数の集光光学系の瞳面に位置するラジアル偏光子であって、前記瞳面における前記サンプルからの前記照明ビームの鏡面反射の位置に対応する前記瞳面の基準位置と一致するように、その頂点が前記瞳面において位置合わせされており、前記頂点に関して放射状に偏光されたラジアル偏光を除去し、前記頂点に関して接線方向に偏光された光を通過するように構成されるラジアル偏光子と、
前記1つまたは複数の集光光学系の瞳面に位置する位相マスクであって、前記瞳面の集光範囲の2つ以上の領域において光に別々の位相シフトをもたらして、前記サンプル上の1つまたは複数の粒子から散乱された光の点拡がり関数を再形成するように構成される位相マスクと、を備えるシステムであって、
前記集光範囲が、前記1つまたは複数の集光光学系の開口数に対応し、
前記位相マスクが、
前記集光範囲の第1の4分の1と、前記第1の4分の1に隣接する、前記集光範囲の第2の4分の1とをカバーする第1の半波長板であって、前記瞳面において前記サンプル上の前記照明ビームの入射面における角度に対応する方向に沿ってπ遅延をもたらすように方向付けられた第1の半波長板と、
前記集光範囲の前記第2の4分の1と、前記第2の4分の1に隣接する、前記集光範囲の第3の4分の1とをカバーする第2の半波長板であって、前記瞳面において前記入射面に直交する角度に対応する方向に沿ってπ遅延をもたらすように方向付けられた第2の半波長板と、を含む、システム。 - 前記照明ビームは、前記サンプルにおいてp偏光である、請求項1に記載のシステム。
- 前記位相マスクの第2のセグメントが、前記集光範囲の第4の4分の1をカバーする開口を含む、請求項2に記載のシステム。
- 前記集光範囲の2つ以上の領域は、前記照明方向に沿って分割された、第1の2分の1集光領域と、第2の2分の1集光領域を含む、請求項1に記載のシステム。
- 前記第1の半波長板の光軸は、前記照明方向に沿って方向付けられる、請求項1に記載のシステム。
- 前記第1の半波長板と前記第2の半波長板の少なくとも1つは、前記第1の半波長板と前記第2の半波長板を通過する光の間の光路の差を少なくとも部分的に補償するように傾斜している、請求項1に記載のシステム。
- 前記位相マスクが、前記集光範囲の第4の4分の1をカバーする、伝搬方向に沿って光学的に均質な材料から形成された補償板をさらに含む、請求項1に記載のシステム。
- 照明方向に沿って斜めの角度でp偏光照明ビームでサンプルを照明するステップと、
前記照明ビームに応答して、1つまたは複数の集光光学系を用いて暗視野モードで前記サンプルからの光を集光するステップと、
前記1つまたは複数の集光光学系の瞳面に位置するラジアル偏光子を通して前記サンプルからの光を伝搬するステップであって、前記ラジアル偏光子が、前記瞳面における前記サンプルからの前記照明ビームの鏡面反射の位置に対応する前記瞳面の基準位置と一致するように、その頂点が前記瞳面において位置合わせされており、前記頂点に関して放射状に偏光されたラジアル偏光を除去し、前記頂点に関して接線方向に偏光された光を通過するように構成されるステップと、
前記瞳面に位置する位相マスクを通して前記サンプルからの光を伝搬するステップであって、前記位相マスクは、前記瞳面の集光範囲の2つ以上の領域において光に別々の位相シフトをもたらして、前記サンプル上の1つまたは複数の粒子から散乱された光の点拡がり関数を再形成するように構成され、前記集光範囲が、前記1つまたは複数の集光光学系の開口数に対応するステップと、
前記照明ビームに応答して、前記ラジアル偏光子および前記位相マスクを通って伝播する光に基づいて前記サンプルの暗視野画像を生成するステップであって、前記サンプルの前記暗視野画像が、前記サンプルの表面上の1つまたは複数の粒子によって散乱された光に基づくステップと、
を含む方法。
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US62/767,246 | 2018-11-14 | ||
US16/577,089 | 2019-09-20 | ||
US16/577,089 US10942135B2 (en) | 2018-11-14 | 2019-09-20 | Radial polarizer for particle detection |
PCT/US2019/061059 WO2020102266A1 (en) | 2018-11-14 | 2019-11-13 | Radial polarizer for particle detection |
JP2021526292A JP7254177B2 (ja) | 2018-11-14 | 2019-11-13 | 粒子検出のためのラジアル偏光子 |
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US10942135B2 (en) | 2018-11-14 | 2021-03-09 | Kla Corporation | Radial polarizer for particle detection |
US20210239893A1 (en) * | 2020-01-30 | 2021-08-05 | Lawrence Livermore National Security, Llc | Polarization manipulation of free-space electromagnetic radiation fields |
US11474437B2 (en) | 2020-04-28 | 2022-10-18 | Applied Materials Israel Ltd. | Increasing signal-to-noise ratio in optical imaging of defects on unpatterned wafers |
US11525777B2 (en) * | 2020-04-28 | 2022-12-13 | Applied Materials Israel Ltd. | Optimizing signal-to-noise ratio in optical imaging of defects on unpatterned wafers |
US11264200B1 (en) * | 2020-09-23 | 2022-03-01 | Fei Company | Lamella alignment based on a reconstructed volume |
US11879853B2 (en) | 2021-02-19 | 2024-01-23 | Kla Corporation | Continuous degenerate elliptical retarder for sensitive particle detection |
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