JP2022502676A5 - - Google Patents

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Publication number
JP2022502676A5
JP2022502676A5 JP2021535488A JP2021535488A JP2022502676A5 JP 2022502676 A5 JP2022502676 A5 JP 2022502676A5 JP 2021535488 A JP2021535488 A JP 2021535488A JP 2021535488 A JP2021535488 A JP 2021535488A JP 2022502676 A5 JP2022502676 A5 JP 2022502676A5
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JP
Japan
Prior art keywords
illumination
defect
inspection system
shear
specimen
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JP2021535488A
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English (en)
Japanese (ja)
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JP7219818B2 (ja
JP2022502676A (ja
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Priority claimed from US16/551,155 external-priority patent/US11017520B2/en
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Publication of JP2022502676A publication Critical patent/JP2022502676A/ja
Publication of JP2022502676A5 publication Critical patent/JP2022502676A5/ja
Application granted granted Critical
Publication of JP7219818B2 publication Critical patent/JP7219818B2/ja
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JP2021535488A 2018-09-04 2019-08-29 多波長インタフェロメトリによる欠陥分類 Active JP7219818B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201862726782P 2018-09-04 2018-09-04
US62/726,782 2018-09-04
US16/551,155 US11017520B2 (en) 2018-09-04 2019-08-26 Multi-wavelength interferometry for defect classification
US16/551,155 2019-08-26
PCT/US2019/048680 WO2020051046A1 (en) 2018-09-04 2019-08-29 Multi-wavelength interferometry for defect classification

Publications (3)

Publication Number Publication Date
JP2022502676A JP2022502676A (ja) 2022-01-11
JP2022502676A5 true JP2022502676A5 (https=) 2022-08-30
JP7219818B2 JP7219818B2 (ja) 2023-02-08

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ID=69639402

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021535488A Active JP7219818B2 (ja) 2018-09-04 2019-08-29 多波長インタフェロメトリによる欠陥分類

Country Status (6)

Country Link
US (1) US11017520B2 (https=)
JP (1) JP7219818B2 (https=)
KR (1) KR102545425B1 (https=)
CN (2) CN112654859B (https=)
TW (1) TWI804677B (https=)
WO (1) WO2020051046A1 (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11017520B2 (en) * 2018-09-04 2021-05-25 Kla Corporation Multi-wavelength interferometry for defect classification
US11713959B2 (en) * 2021-03-17 2023-08-01 Kla Corporation Overlay metrology using spectroscopic phase
US20250012732A1 (en) * 2022-01-12 2025-01-09 Hitachi High-Tech Corporation Surface inspection apparatus
CN115718068B (zh) * 2022-10-21 2025-07-04 华南师范大学 一种动态定量微分干涉相衬显微成像系统及方法
US20250060324A1 (en) * 2023-08-14 2025-02-20 Tokyo Electron Limited Hybrid x-ray and optical metrology and navigation

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JP3047646B2 (ja) * 1991-10-31 2000-05-29 株式会社日立製作所 欠陥検出方法及びその装置
US5710631A (en) * 1995-04-11 1998-01-20 International Business Machines Corporation Apparatus and method for storing interferometric images of scanned defects and for subsequent static analysis of such defects
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US6171764B1 (en) * 1998-08-22 2001-01-09 Chia-Lin Ku Method for reducing intensity of reflected rays encountered during process of photolithography
US6999183B2 (en) * 1998-11-18 2006-02-14 Kla-Tencor Corporation Detection system for nanometer scale topographic measurements of reflective surfaces
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JP4543141B2 (ja) 1999-07-13 2010-09-15 レーザーテック株式会社 欠陥検査装置
US6674522B2 (en) * 2001-05-04 2004-01-06 Kla-Tencor Technologies Corporation Efficient phase defect detection system and method
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JP4716148B1 (ja) 2010-03-30 2011-07-06 レーザーテック株式会社 検査装置並びに欠陥分類方法及び欠陥検出方法
JP4674382B1 (ja) 2010-04-07 2011-04-20 レーザーテック株式会社 検査装置及び欠陥検査方法
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US10234402B2 (en) * 2017-01-05 2019-03-19 Kla-Tencor Corporation Systems and methods for defect material classification
US11017520B2 (en) * 2018-09-04 2021-05-25 Kla Corporation Multi-wavelength interferometry for defect classification

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